Patents by Inventor Chong Wong

Chong Wong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230386072
    Abstract: Techniques related to 3D pose estimation from a 2D input image are discussed. Such techniques include incrementally adjusting an initial 3D pose generated by applying a lifting network to a detected 2D pose in the 2D input image by projecting each current 3D pose estimate to a 2D pose projection, applying a residual regressor to features based on the 2D pose projection and the detected 2D pose, and combining a 3D pose increment from the residual regressor to the current 3D pose estimate.
    Type: Application
    Filed: December 1, 2020
    Publication date: November 30, 2023
    Applicant: Intel Corporation
    Inventors: Anbang YAO, Yangyuxuan KANG, Shandong WANG, Ming LU, Yurong CHEN, Wenjian SHAO, Yikai WANG, Haojun XU, Chao YU, Chong WONG
  • Patent number: 9213322
    Abstract: Methods for providing run to run process control using a dynamic tuner are provided. Once such method includes receiving a data point for a process output parameter, determining whether the data point is within a desired range for the process output parameter, setting, when the data point is within the desired range, a dynamic lambda value equal to a preselected base lambda value, setting, when the data point is not within the desired range, the dynamic lambda value equal to a value based on the preselected base lambda value, a degree of difference between the data point and a target for the process output parameter, and a scale factor, calculating an exponentially weighted moving average using the dynamic lambda value, and adjusting the process control parameter in accordance with the exponentially weighted moving average.
    Type: Grant
    Filed: August 16, 2012
    Date of Patent: December 15, 2015
    Assignee: Western Digital (Fremont), LLC
    Inventors: Jian-Huei Feng, Ming Jiang, Clayton R. Newman, Yeak-Chong Wong
  • Patent number: 9110465
    Abstract: Methods for providing asymmetric control of process parameters are described. One such method includes receiving a data point for the process parameter relative to the wafer, selecting a first value for a process weighting factor when the data point is consistent with a first criteria, selecting a second value for the process weighting factor when the data point is consistent with a second criteria, where the second value is not equal to the first value, calculating an exponential weighted moving average of the process parameter based on the data point and the process weighting factor, updating the process parameter with the exponential weighted moving average, and using the updated process parameter to control the process and thereby treat the wafer. The methods can use one or more weighting factor switch limits to define different areas of risk associated with a target for the process parameter.
    Type: Grant
    Filed: May 4, 2011
    Date of Patent: August 18, 2015
    Assignee: Western Digital (Fremont), LLC
    Inventors: Jian-Huei Feng, Ming Jiang, Clayton R. Newman, Yeak-Chong Wong
  • Patent number: 8631388
    Abstract: Techniques for developing a graphical editor using an incremental development approach. Externally-stored descriptors are used to specify information on which a graphical editor engine operates to create a graphical editor. Developers can thus redefine the look and feel of the graphical editor by modifying these descriptors, effectively re-configuring the elements of visual models without changing the code of the graphical editor engine. Visual models for modeling a domain can be created and used, without first requiring the domain model to be defined.
    Type: Grant
    Filed: October 24, 2011
    Date of Patent: January 14, 2014
    Assignee: International Business Machines Corporation
    Inventors: Jinchao Huang, Thuc Nguyen, Koi Chong Wong
  • Publication number: 20120054717
    Abstract: Techniques for developing a graphical editor using an incremental development approach. Externally-stored descriptors are used to specify information on which a graphical editor engine operates to create a graphical editor. Developers can thus redefine the look and feel of the graphical editor by modifying these descriptors, effectively re-configuring the elements of visual models without changing the code of the graphical editor engine. Visual models for modeling a domain can be created and used, without first requiring the domain model to be defined.
    Type: Application
    Filed: October 24, 2011
    Publication date: March 1, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Jinchao Huang, Thuc Nguyen, Koi Chong Wong
  • Patent number: 8117594
    Abstract: Techniques for developing a graphical editor using an incremental development approach. Externally-stored descriptors are used to specify information on which a graphical editor engine operates to create a graphical editor. Developers can thus redefine the look and feel of the graphical editor by modifying these descriptors, effectively re-configuring the elements of visual models without changing the code of the graphical editor engine. Visual models for modeling a domain can be created and used, without first requiring the domain model to be defined.
    Type: Grant
    Filed: November 21, 2008
    Date of Patent: February 14, 2012
    Assignee: International Business Machines Corporation
    Inventors: Jinchao Huang, Thuc Nguyen, Koi Chong Wong
  • Publication number: 20110284578
    Abstract: An oil and flavoring pot includes a pot body having a measuring cup and a handle. A liquid squeezing structure is disposed on a pot lid, and capacity value and a residue recycling structure is formed on a cup wall. The liquid squeezing structure could press the flavoring into the measuring cup by one time or sequence times, and the operation could stop at any time. The amount of the flavoring could be read at any time. When the amount reaches to target, the operation of the liquid squeezing structure could be stopped and the target amount of flavoring is obtained, therefore facilitating to control and know the feeding amount. After use, the residue liquid flows to the groove along wall of the spout, and flows into the measuring cup through the cup slot, therefore keep the pot body clean. Furthermore, the pot is conveniently operated by a single hand.
    Type: Application
    Filed: May 18, 2011
    Publication date: November 24, 2011
    Inventor: DAI-CHONG WONG
  • Publication number: 20110147420
    Abstract: A container comprises a housing having a feeding opening and an outlet and severing to receive grained or powered material, characterized in that the housing also includes a storing room; a sliding block; a feeding room; wherein the storing room includes a feeding opening disposed on an upper end thereof, and a first hole mounted on a lower end thereof; the sliding block includes a store chamber, and the feeding room includes a second hole fixed on an upper end thereof and an outlet secured on a side thereof; wherein the sliding block is defined between the storing room and the feeding room, and upper and a lower ends of the store chamber of the sliding block are in communication with the storing room or the feeding room.
    Type: Application
    Filed: September 29, 2009
    Publication date: June 23, 2011
    Inventor: Dai Chong Wong
  • Patent number: 7914657
    Abstract: Embodiments of the present invention pertain to controlling thickness of wafers during electroplating process. Information pertaining to an old current used during an electroplating process of a previous wafer is received. Information pertaining to the thickness of the previous wafer is received. A new current is automatically determined. The new current is to be used during an electroplating process for a new wafer. The new current is determined based on the information pertaining to the old current and the information pertaining to the thickness of the previous wafer.
    Type: Grant
    Filed: December 1, 2005
    Date of Patent: March 29, 2011
    Assignee: Hitachi Global Storage Technologies, Netherlands B.V.
    Inventors: Wai B. Fu, Hieu Lam, Shahram Y. Mehdizadeh, Yeak-Chong Wong
  • Publication number: 20110047216
    Abstract: A method, system and product is provided for the implementation of business to business event handling mechanisms for use in coarse grain components allowing communication of event information among providers and interested subscribers across a network. Provision of a flexible method for resolution of business event model dependencies allows a business component to define its own business event model independently and further may also allow changes to that model. This provision may be used to allow a client without an event handling server to place a dependency on another business component for the provision of event handling services. Further, using a web services architecture network implementation for communications, provides the capability of a business event handling system as a web service.
    Type: Application
    Filed: November 4, 2010
    Publication date: February 24, 2011
    Applicant: International Business Machines Corporation
    Inventors: Pablo Daniel Irassar, Raymond Lee-Man Kong, Koi Chong Wong
  • Patent number: 7895285
    Abstract: A method, system and product is provided for the implementation of business to business event handling mechanisms for use in coarse grain components allowing communication of event information among providers and interested subscribers across a network. Provision of a flexible method for resolution of business event model dependencies allows a business component to define its own business event model independently and further may also allow changes to that model. This provision may be used to allow a client without an event handling server to place a dependency on another business component for the provision of event handling services. Further, using a web services architecture network implementation for communications, provides the capability of a business event handling system as a web service.
    Type: Grant
    Filed: November 10, 2008
    Date of Patent: February 22, 2011
    Assignee: International Business Machines Corporation
    Inventors: Pablo Daniel Irassar, Raymond Lee-Man Kong, Koi Chong Wong
  • Patent number: 7809459
    Abstract: An advanced process control (APC) system. The APC system comprises a database for receiving process data from a measurement tool for a plurality of process runs and for storing the process data. A lambda tuner determines a tuned-lambda value corresponding to a process-capability-index value based on upper and lower process control limits and statistics derived from the process data. A process-run controller updates a recipe value based on the received process data and the tuned-lambda value.
    Type: Grant
    Filed: December 31, 2007
    Date of Patent: October 5, 2010
    Assignee: Hitachi Global Technologies Netherlands B.V.
    Inventors: Toshihiro Morisawa, Andrew C. Walker, Yeak-Chong Wong
  • Patent number: 7722436
    Abstract: During planarization of wafers, the thickness of a layer of a wafer is measured at a number of locations, after the wafer has been planarized by chemical mechanical polishing. The thickness measurements are used to automatically determine, from a center to edge profile model to which the measurements are fit, a parameter that controls chemical mechanical polishing, called “backside pressure.” Backside pressure is determined in some embodiments by a logic test based on the center-to-edge profile model, coefficient of determination R-square of the model, and current value of backside pressure. Note that a “backside pressure” set point is adjusted only if the fit of the measurements to the model is good, e.g. as indicated by R-square being greater than a predetermined limit. Next, the backside pressure that has been determined from the model is used in planarizing a subsequent wafer.
    Type: Grant
    Filed: August 1, 2007
    Date of Patent: May 25, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hung-Chin Guthrie, Ming Jiang, Yeak-Chong Wong
  • Publication number: 20090171638
    Abstract: An advanced process control (APC) system. The APC system comprises a database for receiving process data from a measurement tool for a plurality of process runs and for storing the process data. A lambda tuner determines a tuned-lambda value corresponding to a process-capability-index value based on upper and lower process control limits and statistics derived from the process data. A process-run controller updates a recipe value based on the received process data and the tuned-lambda value.
    Type: Application
    Filed: December 31, 2007
    Publication date: July 2, 2009
    Inventors: Toshihiro Morisawa, Andrew C. Walker, Yeak-Chong Wong
  • Patent number: 7506306
    Abstract: Techniques for developing a graphical editor using an incremental development approach. Externally-stored descriptors are used to specify information on which a graphical editor engine operates to create a graphical editor. Developers can thus redefine the look and feel of the graphical editor by modifying these descriptors, effectively re-configuring the elements of visual models without changing the code of the graphical editor engine. Visual models for modeling a domain can be created and used, without first requiring the domain model to be defined.
    Type: Grant
    Filed: May 24, 2005
    Date of Patent: March 17, 2009
    Assignee: International Business Machines Corporation
    Inventors: Jinchao Huang, Thuc Nguyen, Koi Chong Wong
  • Publication number: 20090070737
    Abstract: Techniques for developing a graphical editor using an incremental development approach. Externally-stored descriptors are used to specify information on which a graphical editor engine operates to create a graphical editor. Developers can thus redefine the look and feel of the graphical editor by modifying these descriptors, effectively re-configuring the elements of visual models without changing the code of the graphical editor engine. Visual models for modeling a domain can be created and used, without first requiring the domain model to be defined.
    Type: Application
    Filed: November 21, 2008
    Publication date: March 12, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Jinchao Huang, Thuc Nguyen, Koi Chong Wong
  • Publication number: 20090055505
    Abstract: A method, system and product is provided for the implementation of business to business event handling mechanisms for use in coarse grain components allowing communication of event information among providers and interested subscribers across a network. Provision of a flexible method for resolution of business event model dependencies allows a business component to define its own business event model independently and further may also allow changes to that model. This provision may be used to allow a client without an event handling server to place a dependency on another business component for the provision of event handling services. Further, using a web services architecture network implementation for communications, provides the capability of a business event handling system as a web service.
    Type: Application
    Filed: November 10, 2008
    Publication date: February 26, 2009
    Applicant: International Business Machines Corporation
    Inventors: Pablo Daniel Irassar, Raymond Lee-Man Kong, Koi Chong Wong
  • Patent number: 7478401
    Abstract: A method for the implementation of business to business event handling mechanisms for use in coarse grain components allowing communication of event information among providers and interested subscribers across a network. Provision of a flexible method for resolution of business event model dependencies allows a business component to define its own business event model independently and further may also allow changes to that model. This provision may be used to allow a client without an event handling server to place a dependency on another business component for the provision of event handling services. Further, using a web services architecture network implementation for communications, provides the capability of a business event handling system as a web service.
    Type: Grant
    Filed: January 30, 2004
    Date of Patent: January 13, 2009
    Assignee: International Business Machines Corporation
    Inventors: Pablo Daniel Irassar, Raymond Lee-Man Kong, Koi Chong Wong
  • Patent number: 7395203
    Abstract: A system and method for inputting Chinese characters using Pinyin without requiring the entry of a delimiter key between Pinyin entries in a reduced keyboard is disclosed. The system searches for all possible single or multiple Pinyin spellings based on the entered Latin alphabets. Once the user has completed the inputting of the Pinyin spellings for desired Chinese phrase or characters, all possible matching phrases or characters are displayed on screen and off-screen due to screen size. The user then scrolls through a list of matching phrases or characters and selects the desired one by clicking.
    Type: Grant
    Filed: July 30, 2003
    Date of Patent: July 1, 2008
    Assignee: Tegic Communications, Inc.
    Inventors: Jianchao Wu, Jenny Huang-Yu Lai, Lian He, Pim van Meurs, Keng Chong Wong, Lu Zhang
  • Publication number: 20080020676
    Abstract: During planarization of wafers, the thickness of a layer of a wafer is measured at a number of locations, after the wafer has been planarized by chemical mechanical polishing. The thickness measurements are used to automatically determine, from a center to edge profile model to which the measurements are fit, a parameter that controls chemical mechanical polishing, called “backside pressure.” Backside pressure is determined in some embodiments by a logic test based on the center-to-edge profile model, coefficient of determination R-square of the model, and current value of backside pressure. Note that a “backside pressure” set point is adjusted only if the fit of the measurements to the model is good, e.g. as indicated by R-square being greater than a predetermined limit. Next, the backside pressure that has been determined from the model is used in planarizing a subsequent wafer.
    Type: Application
    Filed: August 1, 2007
    Publication date: January 24, 2008
    Inventors: Hung-Chin Guthrie, Ming Jiang, Yeak-Chong Wong