Abstract: A display panel is provided. In a display region configured to display an image, the display panel includes a base substrate; thin film transistors and display elements on the base substrate; an encapsulating layer encapsulating the display elements; and a touch electrode layer including mesh electrodes on a side of the encapsulating layer away from the base substrate. The encapsulating layer includes at least an organic encapsulating sub-layer having a first thickness in at least a sub-region of the transition region, and a second thickness in the display region, the first thickness being smaller than the second thickness. Mesh electrode lines of the mesh electrodes have a first line width in at least the sub-region of the transition region, and a second line width in the display region, the first line width being greater than the second line width.

Abstract: A display panel is provided. In a display region configured to display an image, the display panel includes a base substrate; thin film transistors and display elements on the base substrate; an encapsulating layer encapsulating the display elements; and a touch electrode layer including mesh electrodes on a side of the encapsulating layer away from the base substrate. The encapsulating layer includes at least an organic encapsulating sub-layer having a first thickness in at least a sub-region of the transition region, and a second thickness in the display region, the first thickness being smaller than the second thickness. Mesh electrode lines of the mesh electrodes have a first line width in at least the sub-region of the transition region, and a second line width in the display region, the first line width being greater than the second line width.

Abstract: A touch display substrate and a manufacturing method thereof, and a touch display apparatus are provided, the touch display substrate includes a base substrate, and a touch structure layer and a display structure layer disposed on the base substrate; wherein the touch structure layer is provided to implement touch control, the display structure layer is provided to implement display, the touch structure layer is located on a side, close to the base substrate, of the display structure layer.

Abstract: A touch display substrate and a manufacturing method thereof, and a touch display apparatus are provided, the touch display substrate includes a base substrate, and a touch structure layer and a display structure layer disposed on the base substrate; wherein the touch structure layer is provided to implement touch control, the display structure layer is provided to implement display, the touch structure layer is located on a side, close to the base substrate, of the display structure layer.

Abstract: A coating apparatus, a method of recycling a coating liquid by utilization of the same and a method for cleaning the same are provided. The coating apparatus includes a supply device, a coater device and a recycling device. The supply device includes a liquid inlet, a liquid outlet and a coating liquid supply unit connected with the liquid inlet. The coater device includes a coating liquid nozzle including a receiving opening connected with the liquid outlet of the supply device, a coating opening and an exhaust opening. The recycling device includes a recycled liquid outlet and at least one recycling inlet including a supply process recycling inlet which is connected with the exhaust opening of the coating liquid nozzle, and the recycled liquid outlet is connected with the liquid inlet of the supply device.

Abstract: The present disclosure provides a method for processing a photoresist component, including steps of: placing a photoresist component to be processed on a heating device comprising a plurality of heating components; and controlling, based on a heating parameter, each of the plurality of heating components associated with the heating parameter to heat the photoresist component to be processed. The heating parameter is determined based on a photoresist component parameter of the photoresist component to be processed and a process parameter of forming the photoresist component. The present disclosure further provides a device for processing a photoresist component.

Abstract: The present disclosure provides a method for processing a photoresist component, including steps of: placing a photoresist component to be processed on a heating device comprising a plurality of heating components; and controlling, based on a heating parameter, each of the plurality of heating components associated with the heating parameter to heat the photoresist component to be processed. The heating parameter is determined based on a photoresist component parameter of the photoresist component to be processed and a process parameter of forming the photoresist component. The present disclosure further provides a device for processing a photoresist component.

Abstract: A coating apparatus, a method of recycling a coating liquid by utilization of the same and a method for cleaning the same are provided. The coating apparatus includes a supply device, a coater device and a recycling device. The supply device includes a liquid inlet, a liquid outlet and a coating liquid supply unit connected with the liquid inlet. The coater device includes a coating liquid nozzle including a receiving opening connected with the liquid outlet of the supply device, a coating opening and an exhaust opening. The recycling device includes a recycled liquid outlet and at least one recycling inlet including a supply process recycling inlet which is connected with the exhaust opening of the coating liquid nozzle, and the recycled liquid outlet is connected with the liquid inlet of the supply device.

Abstract: A fixture for conveying a mask plate comprising: a conveying bracket; and a fixation structure that is arranged on the conveying bracket and configured to fix the mask plate to be conveyed. The fixture has the following advantageous effects: it is able to prevent the hands from being in direct contact with the mask plate, thereby reducing the risk of conveyance damage of the mask plate which improves the operation efficiency.

Abstract: The present disclosure provides a wire buffer device. The wire buffer device comprises: a frame; and multiple of support layers provided to the frame and arranged in layers. Each of the support layers includes multiple sections of wires that support a substrate. The multiple sections of wires are in the form of at least one integrated wire. The wire buffer device further includes at least one transmission structure. Said at least one transmission structure drives each of said at least one integrated wire to perform a reciprocating motion so that at least a part of each of said at least one integrated wire moves into or moves out from the frame. For the wire buffer device, work operability is improved, and secondary contamination to the device is avoided.

Abstract: The present disclosure provides a fixture for conveying a mask plate, the fixture for conveying a mask plate includes: a conveying bracket; and a fixation structure that is arranged on the conveying bracket and configured to fix the mask plate to be conveyed. The advantageous effects according to the present disclosure are as follows: it is able to prevent the hands from being in direct contact with the mask plate, thereby to reduce the risk of conveyance damage of the mask plate and improve the operation efficiency.

Abstract: The present disclosure provides a wire buffer device. The wire buffer device comprises: a frame; and multiple of support layers provided to the frame and arranged in layers. Each of the support layers includes multiple sections of wires that support a substrate. The multiple sections of wires are in the form of at least one integrated wire. The wire buffer device further includes at least one transmission structure. Said at least one transmission structure drives each of said at least one integrated wire to perform a reciprocating motion so that at least a part of each of said at least one integrated wire moves into or moves out from the frame. For the wire buffer device, work operability is improved, and secondary contamination to the device is avoided.

Abstract: A color filter and a manufacturing method thereof are provided, in which a stacked structure composed of several color film layers having different colors is formed in a non-transmitting partitioning region of the color filter in such a way that the stacked structure can prevent light from passing through the color filter via the partitioning region.

Abstract: A color filter and a manufacturing method thereof are provided, in which a stacked structure composed of several color film layers having different colors is formed in a non-transmitting partitioning region of the color filter in such a way that the stacked structure can prevent light from passing through the color filter via the partitioning region.