Abstract: The present invention relates generally to the field of chemical/mechanical polishing of substrates. In particular the invention relates to methods of producing improved membranes for use in chemical/mechanical polishing systems. The present invention provides a method of improving the properties of a flexible membrane for use in chemical/mechanical polishing, the method including subjecting the membrane to elevated temperatures.

Abstract: A perforated plate for use in a wafer-handling chuck has a pattern of through holes by which a vacuum is applied to a membrane to form suctions cups that secure a wafer to the chuck. Grooves in a generally planar upper surface of the plate interconnect the through holes. The grooves ensure the maintenance of the vacuum, and the consequent formation of the membrane suction cups, at each through hole, even when the grooved surface of the plate is in close face-to-face contact with another planar surface in the chuck. In one embodiment, the through holes in the perforated plate lie on concentric circles and the grooves interconnect radially-outward through holes to the next closest one or pair or radially-inward through holes.