Patents by Inventor Choong-shin Lee

Choong-shin Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for calibrating marking position in chip scale marker
    Patent number: 6808117
    Abstract: A method and apparatus for calibrating a marking position in a chip scale marker are provided. The method includes: (a) placing a screen which is equivalent in shape to the wafer on a wafer holder for holding the wafer; (b) irradiating a laser beam at a predetermined target point on the screen, and measuring the position of the laser beam by a camera being moved above the target point; (c) transmitting the measured position information to a controller; (d) repeating steps (b) and (c) at a plurality of predetermined points; (e) comparing the transmitted position information with the target point; and (f) calibrating the position of the laser beam irradiated on the wafer by adjusting mirrors of the galvano scanner in the event that a deviation between the position information and the target point falls beyond a predetermined value.
    Type: Grant
    Filed: May 6, 2002
    Date of Patent: October 26, 2004
    Assignee: EO Technics Co., Ltd.
    Inventors: You-hie Han, Choong-shin Lee, Yang-ghi Min, Byoung-min Ahn, Hyeyg-jeon Chang
  • Method and apparatus for calibrating marking position in chip scale marker
    Publication number: 20030102292
    Abstract: A method and apparatus for calibrating a marking position in a chip scale marker are provided. The method includes: (a) placing a screen which is equivalent in shape to the wafer on a wafer holder for holding the wafer; (b) irradiating a laser beam at a predetermined target point on the screen, and measuring the position of the laser beam by a camera being moved above the target point; (c) transmitting the measured position information to a controller; (d) repeating steps (b) and (c) at a plurality of predetermined points; (e) comparing the transmitted position information with the target point; and (f) calibrating the position of the laser beam irradiated on the wafer by adjusting mirrors of the galvano scanner in the event that a deviation between the position information and the target point falls beyond a predetermined value.
    Type: Application
    Filed: May 6, 2002
    Publication date: June 5, 2003
    Applicant: EO Technics Co., Ltd.
    Inventors: You-hie Han, Choong-shin Lee, Yang-ghi Min, Byoung-min Ahn, Hyeyg-jeon Chang