Patents by Inventor Chorng-Jye Huang

Chorng-Jye Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10693030
    Abstract: A solar cell includes a photoelectric conversion layer, a doped layer, a first passivation layer, a first TCO layer, a front electrode and a back electrode. The doped layer is disposed on the front surface of the photoelectric conversion layer. The first passivation layer is disposed on the doped layer, wherein the first passivation layer has a plurality of openings exposing a portion of the doped layer. The first TCO layer is disposed on the first passivation layer and in the openings, and directly contacts the exposed doped layer via the openings, wherein a ratio of an area of the openings to an area of the first TCO layer is between 0.01 and 0.5. The front electrode is disposed on the first TCO layer. The back electrode is disposed on the back surface of the photoelectric conversion layer.
    Type: Grant
    Filed: January 15, 2018
    Date of Patent: June 23, 2020
    Assignee: Industrial Technology Research Institute
    Inventors: Chao-Cheng Lin, Chorng-Jye Huang, Chen-Cheng Lin, Chun-Heng Chen, Chen-Hsun Du, Chun-Ming Yeh, Jui-Chung Hsiao
  • Publication number: 20200135947
    Abstract: A solar cell includes an N-type silicon substrate, a P-type doped region, an anti-reflective layer, an n+ back surface field (BSF), aluminum electrodes, aluminum doped regions, and a backside electrode. The N-type silicon substrate has a first surface and a second surface opposite to the first surface. The P-type doped region is formed in the first surface of the N-type silicon substrate. The anti-reflective layer is formed on the P-type doped region. The aluminum electrodes are formed on the P-type doped region, and the aluminum doped regions are formed in the P-type doped region under the aluminum electrodes, wherein the aluminum doped regions are in direct contact with the aluminum electrodes. The n+ BSF is formed in the second surface of the N-type silicon substrate, and the backside electrode is formed on the second surface of the N-type silicon substrate.
    Type: Application
    Filed: January 9, 2019
    Publication date: April 30, 2020
    Applicant: Industrial Technology Research Institute
    Inventors: Chun-Ming Yeh, Chorng-Jye Huang, Chun-Chieh Lo
  • Publication number: 20200098940
    Abstract: A module structure includes a front sheet, a back sheet opposite to the front sheet, and a solar cell disposed between the front sheet and the back sheet. A first encapsulation film is disposed between the solar cell and the front sheet, and a second encapsulation film is disposed between the solar cell and the back sheet. The first encapsulation film and the second encapsulation film include an encapsulation material, which includes a resin and a fluorescent molecule. The fluorescent molecule includes a fluorescent group bonded to a polyhedral oligomeric silsesquioxane.
    Type: Application
    Filed: November 27, 2018
    Publication date: March 26, 2020
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Min-Tsung KUAN, Wen-Hsien WANG, Szu-Lin WANG, Wen-Hsien CHOU, Wen-Kuei LEE, Fu-Ming LIN, Chorng-Jye HUANG
  • Publication number: 20190221701
    Abstract: A solar cell includes a photoelectric conversion layer, a doped layer, a first passivation layer, a first TCO layer, a front electrode and a back electrode. The doped layer is disposed on the front surface of the photoelectric conversion layer. The first passivation layer is disposed on the doped layer, wherein the first passivation layer has a plurality of openings exposing a portion of the doped layer. The first TCO layer is disposed on the first passivation layer and in the openings, and directly contacts the exposed doped layer via the openings, wherein a ratio of an area of the openings to an area of the first TCO layer is between 0.01 and 0.5. The front electrode is disposed on the first TCO layer. The back electrode is disposed on the back surface of the photoelectric conversion layer.
    Type: Application
    Filed: January 15, 2018
    Publication date: July 18, 2019
    Applicant: Industrial Technology Research Institute
    Inventors: Chao-Cheng Lin, Chorng-Jye Huang, Chen-Cheng Lin, Chun-Heng Chen, Chen-Hsun Du, Chun-Ming Yeh, Jui-Chung Hsiao
  • Patent number: 10312384
    Abstract: A solar cell is provided. The solar cell includes a Si substrate having a first surface and a second surface opposite to each other, an emitter, a first electrode, a doped region, a passivation layer, a doped polysilicon layer, a semiconductor layer, and a second electrode. The emitter is disposed on the first surface. The first electrode is disposed on the emitter. The doped region is disposed in the second surface. The passivation layer is disposed on the second surface. The doped polysilicon layer is disposed on the passivation layer, wherein a plurality of holes penetrates the doped polysilicon layer and the passivation layer and exposes a portion of the second surface. The semiconductor layer is disposed on the doped polysilicon layer and in the holes. The band gap of the semiconductor layer is greater than that of the Si substrate. The second electrode is disposed on the semiconductor layer.
    Type: Grant
    Filed: November 15, 2016
    Date of Patent: June 4, 2019
    Assignee: Industrial Technology Research Institute
    Inventors: Chao-Cheng Lin, Chien-Kai Peng, Chen-Cheng Lin, Chen-Hsun Du, Chorng-Jye Huang, Chun-Ming Yeh
  • Publication number: 20190131472
    Abstract: A solar cell includes a silicon substrate, a passivation structure, and a metal electrode. The passivation structure is disposed on a surface of the silicon substrate, and the passivation structure includes a tunneling layer and a doped polysilicon layer. The tunneling layer is disposed on the surface of the silicon substrate. The doped polysilicon layer is disposed on the tunneling layer and includes a first region and a second region having different thicknesses from each other, and the thickness of the first region is greater than that of the second region, wherein the thickness of the first region is between 50 nm and 500 nm, and the thickness of the second region is greater than 0 and equal to or less than 250 nm. The metal electrode is disposed on the first region of the doped polysilicon layer.
    Type: Application
    Filed: December 11, 2017
    Publication date: May 2, 2019
    Applicant: Industrial Technology Research Institute
    Inventors: Jui-Chung Hsiao, Chun-Ming Yeh, Chao-Cheng Lin, Chorng-Jye Huang, Chen-Hsun Du, Chun-Heng Chen
  • Publication number: 20180114871
    Abstract: A solar cell is provided. The solar cell includes a Si substrate having a first surface and a second surface opposite to each other, an emitter, a first electrode, a doped region, a passivation layer, a doped polysilicon layer, a semiconductor layer, and a second electrode. The emitter is disposed on the first surface. The first electrode is disposed on the emitter. The doped region is disposed in the second surface. The passivation layer is disposed on the second surface. The doped polysilicon layer is disposed on the passivation layer, wherein a plurality of holes penetrates the doped polysilicon layer and the passivation layer and exposes a portion of the second surface. The semiconductor layer is disposed on the doped polysilicon layer and in the holes. The band gap of the semiconductor layer is greater than that of the Si substrate. The second electrode is disposed on the semiconductor layer.
    Type: Application
    Filed: November 15, 2016
    Publication date: April 26, 2018
    Applicant: Industrial Technology Research Institute
    Inventors: Chao-Cheng Lin, Chien-Kai Peng, Chen-Cheng Lin, Chen-Hsun Du, Chorng-Jye Huang, Chun-Ming Yeh
  • Patent number: 7884029
    Abstract: A solar cell having an improved structure of rear surface includes a p-type doped region, a dense metal layer, a loose metal layer, at least one bus bar opening, and solderable material on or within the bus bar opening. The solderable material contacts with the dense aluminum layer. The improved structure in rear surface increases the light converting efficiency, and provides a good adhesion between copper ribbon and solar cell layer thereby providing cost advantages and reducing the complexity in manufacturing. A solar module and solar system composed of such solar cell are also disclosed.
    Type: Grant
    Filed: June 9, 2009
    Date of Patent: February 8, 2011
    Assignee: DelSolar Co., Ltd.
    Inventors: Shih-Cheng Lin, Wei-Chih Chang, Yi-Chin Chou, Chorng-Jye Huang, Pin-Sheng Wang
  • Publication number: 20090305457
    Abstract: A solar cell having an improved structure of rear surface includes a p-type doped region, a dense metal layer, a loose metal layer, at least one bus bar opening, and solderable material on or within the bus bar opening. The solderable material contacts with the dense aluminum layer. The improved structure in rear surface increases the light converting efficiency, and provides a good adhesion between copper ribbon and solar cell layer thereby providing cost advantages and reducing the complexity in manufacturing. A solar module and solar system composed of such solar cell are also disclosed.
    Type: Application
    Filed: June 9, 2009
    Publication date: December 10, 2009
    Inventors: Shih-Cheng Lin, Wei-Chih Chang, Yi-Chin Chou, Chorng-Jye Huang, Pin-Sheng Wang
  • Publication number: 20090301555
    Abstract: A solar cell having an improved structure of rear surface includes a p-type doped region, a dense metal layer, a loose metal layer, at least one bus bar opening, and solderable material on or within the bus bar opening. The solderable material contacts with the dense aluminum layer. The improved structure in rear surface increases the light converting efficiency, and provides a good adhesion between copper ribbon and solar cell layer thereby providing cost advantages and reducing the complexity in manufacturing. A solar module and solar system composed of such solar cell are also disclosed.
    Type: Application
    Filed: June 9, 2009
    Publication date: December 10, 2009
    Inventors: Shih-Cheng Lin, Wei-Chih Chang, Yi-Chin Chou, Chorng-Jye Huang, Pin-Sheng Wang
  • Publication number: 20040123802
    Abstract: A method for making p-type transparent conductive films and the corresponding system are disclosed. A laser beam is used as the evaporation source of a target, so that the target containing a group-III element vaporizes and forms a coating on a substrate. At the same time, a gas to be mingled into the coating is made into plasma to increase its activity. The gas contains a group-V element. The particles in the target have reactions with the plasma so that the coating thus formed contain both group-III and group-V elements, with the concentration of the group-V element higher than that of group-III element. This achieves the goal of making a p-type transparent conductive film.
    Type: Application
    Filed: April 9, 2003
    Publication date: July 1, 2004
    Inventors: Chorng-Jye Huang, Shih-Cheng Lin, Cheng-Ting Chen, Lee-Ching Kuo
  • Patent number: 6692985
    Abstract: A solar cell substrate with thin film polysilicon. The solar cell substrate includes a substrate; a transparent conductive layer, formed on the substrate; a thermal isolation layer having inlaid conductive layers, formed on the transparent conductive layer; and a polysilicon layer, formed on the thermal isolation layer.
    Type: Grant
    Filed: June 7, 2002
    Date of Patent: February 17, 2004
    Assignee: Industrial Technology Research Institute
    Inventors: Chorng-Jye Huang, Lee Ching Kuo, Jyi Tyan Yeh, Chien Sheng Huang, Leo C. K. Liau, Shih-Chen Lin, Cheng-Ting Chen, Feng-Cheng Jeng
  • Publication number: 20020185171
    Abstract: A solar cell substrate with thin film polysilicon. The solar cell substrate includes a substrate; a transparent conductive layer, formed on the substrate; a thermal isolation layer having inlaid conductive layers, formed on the transparent conductive layer; and a polysilicon layer, formed on the thermal isolation layer.
    Type: Application
    Filed: June 7, 2002
    Publication date: December 12, 2002
    Inventors: Chorng-Jye Huang, Lee-Ching Kuo, Jyi-Tyan Yeh, Chien-Sheng Huang, Leo C.K. Liau, Shih-Chen Lin, Cheng-Ting Chen, Feng-Cheng Jeng
  • Patent number: 6277667
    Abstract: This invention discloses a novel method for fabricating solar cells. Using the existing screen-printing, masking or photolithography techniques, a P-type or N-type diffusion source is coated on the sites of an N-type or P-type silicon wafer desired for forming electrodes. Then, a low dose P-type or N-type diffusion source is in situ diffused into the N-type or P-type silicon wafer together with the P-type or N-type diffusion source coated on the N-type or P-type silicon wafer in the furnace. Thereafter, a P−/P+ or N−/N+ diffusion region is formed within the N-type or P-type silicon wafer. Finally, electrodes aligned to the P+ or N+ diffusion region are formed by means of screen-printing. Then, a solar cell with high photocurrent and low series resistance can be obtained.
    Type: Grant
    Filed: September 7, 1999
    Date of Patent: August 21, 2001
    Assignee: Industrial Technology Research Institute
    Inventors: Chorng-Jye Huang, Cheng-Ting Chen, Chien-sheng Huang, Lee-Ching Kuo