Abstract: A photomask and method for fabricating an integrated circuit is provided. The photomask includes a plurality of main features, enclosed in at least one first region and at least one second region, wherein the first region comprises single the main feature and the second region comprises multiple the main features; and a plurality of assistant features disposed between the first region and the second region, or between the second regions. The photomask enhances the accuracy of the critical dimension and facilitate fabricating an integrated circuit.

Abstract: A method is presented for well planning. The method includes modeling one or more reservoir segments within a subsurface model. The reservoir segments, which are associated with target reservoirs, are evaluated prior to creating a well plan based on the reservoir segments to provide a fluid flow path from the reservoir targets to the well pad through the reservoir segments. The method enhances the well planning process through the use of these reservoir segments.

Abstract: A method and computer program are provided for analyzing a set of layers within an integrated circuit design to determine a set of critical points for each layer within the set of layers. The critical points are based at least in part on manufacturer specific process parameters. The method includes assigning a critical point value to each of the critical points within each set of critical points, analyzing a path through the integrated circuit design across multiple integrated circuit design layers, and determining a sum of critical point values of each critical point along the path.

Abstract: According to an exemplary embodiment, a method of forming a substrate pattern having an isolated region and a dense region is provided. The method includes the following operations: forming a first photoresist layer over the substrate; exposing the first photoresist layer through a first mask corresponding to the isolated region; developing the first photoresist layer to form a first pattern; forming a second photoresist layer over the substrate and the first pattern; exposing the second photoresist layer through a second mask corresponding to the substrate pattern; developing the second photoresist layer to form a second pattern; and etching the first pattern and the substrate to form the substrate pattern in the isolated region and the dense region.

Abstract: According to an exemplary embodiment, a method of forming a substrate pattern having an isolated region and a dense region is provided. The method includes the following operations: forming a first photoresist layer over the substrate; exposing the first photoresist layer through a first mask corresponding to the isolated region; developing the first photoresist layer to form a first pattern; forming a second photoresist layer over the substrate and the first pattern; exposing the second photoresist layer through a second mask corresponding to the substrate pattern; developing the second photoresist layer to form a second pattern; and etching the first pattern and the substrate to form the substrate pattern in the isolated region and the dense region.

Abstract: A protective cover for a network cable socket is disclosed. The protective cover is moveably connected to the network cable socket. The protective cover of the network cable socket comprises a housing and two elastic sheets. The housing is moveably connected to the network cable socket. Each of the elastic sheets includes a fixing portion, an extension arm, a stopper and a guiding ramp. The two extension arms are connected to the two fixing portions, respectively. The two fixing portions are fixed to two sides of the housing, respectively. The two stoppers and the two guiding ramps are formed at the two extension arms, respectively. A distance between the two guiding ramps is larger than the distance between the two stoppers.

Abstract: An embodiment of a feed-forward method of determining a photomask pattern is provided. The method includes providing design data associated with an integrated circuit device. A thickness of a coating layer to be used in fabricating the integrated circuit device is predicted based on the design data. This prediction is used to generate a gradating pattern. A photomask is formed having the gradating pattern.

Abstract: Method for reservoir surveillance using a three-dimensional Earth Model (101) to improve and expedite the surveillance at all scales of investigation (field, reservoir, fault compartment, and individual well) and at all time steps (minutes, hours, days, months, years). The new method allows users to rapidly identify anomalous field and well performance (109) and provides capability to investigate root causes of the performance deviation from predicted (110). Animated co-rendered displays (107) of the earth model and actual (104) and simulated (105) production data enable the user to interactively determine model adjustments back at the basic level of the Earth Model, which are then propagated to a geologic model (102) and then to the reservoir simulator (103) to update it (111) in a physically constrained way.

Abstract: A method and computer program are provided for analyzing a set of layers within an integrated circuit design to determine a set of critical points for each layer within the set of layers. The critical points are based at least in part on manufacturer specific process parameters. The method includes assigning a critical point value to each of the critical points within each set of critical points, analyzing a path through the integrated circuit design across multiple integrated circuit design layers, and determining a sum of critical point values of each critical point along the path.

Abstract: A method, including: identifying a well target or reservoir segment; defining a dynamic surface grid, the dynamic surface grid being a representation of a ground surface, sea-level, or subsea surface above a reservoir upon which a drill center is locatable, and the dynamic surface grid including a plurality of cells that define potential locations for the drill center; assigning, to each of the plurality of cells of the dynamic surface grid, a value of a drilling or geologic attribute that defines a quality of a drill center position relative to the well target or reservoir segment; and selecting, based on a value of the drilling or geologic attribute, a location for the drill center corresponding to a location represented on the dynamic surface grid.

Abstract: A display device is disclosed. A display panel displays a first image according to a first output image. A timing controller includes a receiving unit, a compression unit, a decompression unit and a processing unit. The receiving unit receives a first input image and a second input image and outputs a first processed image and a second processed image. The first input image is the same as the first processed image. The second input image is the same as the second processed image. The compression unit generates a first compressed image according to the first processed image. The receiving unit stores the first compressed image. The decompression unit processes the stored first compressed image to generate a first decompressed image. The processing unit processes the second processed image and the first decompressed image to generate the first output image.

Abstract: A method is provided for displaying selected portions of a three-dimensional (3D) volumetric data set representing a subsurface formation. At least one two-dimensional (2D) canvas is generated. The 2D canvas corresponds to a plane in the 3D data set. The 2D canvas is shown in a first display window. One or more primitives are created on the 2D canvas. A volumetric region of the 3D volumetric data set corresponding to the one or more primitives is identified. The volumetric region is displayed in a 3D scene. The 3D scene is shown in a second display window.

Abstract: A method for characterizing a three-dimensional surface profile of a semiconductor workpiece is provided. In this method, the three-dimensional surface profile is imaged from a normal angle to measure widths of various surfaces in a first image. The three-dimensional surface is also imaged from a first oblique angle to re-measure the widths of the various surfaces in a second image. Based on differences in widths of corresponding surfaces for first and second images, a feature height and sidewall angle are determined for the three-dimensional profile.

Abstract: An information handling system display having a first part that includes a display screen and rendering electronics fastened onto a second part to seal the rendering electronics within the display. The first part is bonded onto the second part via an adhesive that forms a bond between the two parts. A shearing mechanism is also disposed within the display with at least one externally exposed end. A pulling force is applied to the at least one externally exposed end in order to cut through the bond when there is a need to separate the two parts from each other.

Abstract: Method for determining one or more optimal well trajectories and a drill center location for hydrocarbon production. A well path and drill center optimization problem (55) is solved in which one constraint is that a well trajectory must intersect a finite size target region (61) in each formation of interest, or in different parts of the same formation. The finite target size provides flexibility for the optimization problem to arrive at a more advantageous solution. Typical well path optimization constraints are also applied, such as anti-collision constraints and surface site constraints (62).

Abstract: A method and systems for dynamically planning a well site are provided herein. The method includes generating, via a computing system, a three-dimensional model of a hydrocarbon field including a reservoir. The method also includes determining a location for a well site based on the three-dimensional model and determining reservoir targets for the determined location and a well trajectory for each reservoir target. The method also includes adjusting the location for the well site within the three-dimensional model and dynamically adjusting the reservoir targets and the well trajectories based on the dynamic adjustment of the location for the well site. The determination and the dynamic adjustment of the location, the reservoir targets, and the well trajectories for the well site are based on specified constraints. The method further includes determining a design for the well site based on the dynamic adjustment of the location, the reservoir targets, and the well trajectories for the well site.

Abstract: Integrated circuit design techniques are disclosed. In some methods, a target layout design having a geometric pattern thereon is received. A set of fast-bias contour (FBC) rules is applied to the target layout design to provide an electronic photomask having FBC-edits. The FBC-edits differentiate the electronic photomask from the target layout design, and the FBC rules are applied without previously applying optical proximity correction (OPC) to the target layout design. A lithography process check is performed on the electronic photomask to determine whether a patterned integrated circuit layer, which is to be manufactured based on the electronic photomask, is expected to be in conformance with the geometric pattern of the target layout design.

Abstract: A method of creating a visual display based on a plurality of data sources is provided. An exemplary embodiment of the method comprises extracting a set of extracted data from the plurality of data sources and processing at least a portion of the extracted data with a set of knowledge agents according to specific criteria to create at least one data assemblage. The exemplary method also comprises providing an integrated two-dimensional/three-dimensional (2D/3D) visual display in which at least one 2D element of the at least one data assemblage is integrated into a 3D visual representation using a mapping identifier and a criteria identifier.

Abstract: A method of planning a drilling operation IS provided that comprises selecting a set of targeted regions based on data from a three-dimensional shared earth model and generating at least one targeted segment within each one of the set of targeted regions The method further comprises defining at least one application agent for the purpose of evaluating the at least one targeted segment within each one of the set of targeted regions based on a potential payout in terms of production of hydrocarbons The exemplary method additionally comprises identifying at least one well trajectory through the at least one targeted segment within each one of the set of targeted regions And the method comprises employing the at least one application agent to evaluate well trajectories based on the potential payout in terms of at least one of production of hydrocarbons, drilling complexity, cost or stability of well planning.

Abstract: Method for determining visualization rendering parameters for seismic data to heighten subtle differences. The full data volume and at least one sub-volume are processed in the inventive method (12). Statistics are extracted for the data or attributes of the data (13). Rendering parameters are derived based on comparing and computing the statistical information for the volume and sub-volumes (14).