Patents by Inventor Choun Woo Lee

Choun Woo Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8530537
    Abstract: Disclosed are a black photosensitive resin composition that includes (A) an organic binder resin, (B) a reactive unsaturated compound, (C) a photopolymerization initiator, (D) a black pigment including carbon black and a silver-tin-containing alloy, and (E) a solvent, and a light blocking layer using the same.
    Type: Grant
    Filed: June 16, 2011
    Date of Patent: September 10, 2013
    Assignee: Cheil Industries Inc.
    Inventors: Hyun-Moo Choi, Hye-Kyoung Cho, Ji-Won Woo, Choun-Woo Lee, Gyu-Seok Han
  • Patent number: 8216770
    Abstract: Disclosed is a resin composition including a cardo resin. Exemplary resin compositions can include (a) a cardo resin having a structural unit represented by Formula 1, (b) a reactive unsaturated compound, (c) an initiator, and (d) a solvent, wherein each R1 and R2 is independently a hydrogen atom, a halogen atom or a C1-C5 alkyl group, R3 is a vinyl, acryl or methacryl group, Z represents the residue of an acid anhydride or dianhydride, X is —CO—, —SO2—, —C(CF3)2—, —Si(CH3)2—, —CH2—, —C(CH3)2—, —O—, (R4?H, Et, C2H4Cl, C2H4OH, CH2CH?CH2 or Ph), and k is integer from 1 to 40. Further disclosed is a color filter which includes a fine pattern formed using the composition. The color filter can exhibit superior resistance to heat and chemicals, improved developability, and good adhesiveness.
    Type: Grant
    Filed: May 11, 2007
    Date of Patent: July 10, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Hee Young Oh, Choun Woo Lee, Hye Kyoung Cho, Ju Kwang Park, Cheon Seok Lee
  • Publication number: 20120077897
    Abstract: Disclosed are a black photosensitive resin composition that includes (A) an organic binder resin, (B) a reactive unsaturated compound, (C) a photopolymerization initiator, (D) a black pigment including carbon black and a silver-tin-containing alloy, and (E) a solvent, and a light blocking layer using the same.
    Type: Application
    Filed: June 16, 2011
    Publication date: March 29, 2012
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Hyun-Moo CHOI, Hye-Kyoung CHO, Ji-Won WOO, Choun-Woo LEE, Gyu-Seok HAN
  • Publication number: 20080090177
    Abstract: Disclosed is a resin composition including a cardo resin. Exemplary resin compositions can include (a) a cardo resin having a structural unit represented by Formula 1, (b) a reactive unsaturated compound, (c) an initiator, and (d) a solvent, wherein each R1 and R2 is independently a hydrogen atom, a halogen atom or a C1-C5 alkyl group, R3 is a vinyl, acryl or methacryl group, Z represents the residue of an acid anhydride or dianhydride, X is —CO—, —SO2—, —C(CF3)2—, —Si(CH3)2— and k is integer from 1 to 40. Further disclosed is a color filter which includes a fine pattern formed using the composition. The color filter can exhibit superior resistance to heat and chemicals, improved developability, and good adhesiveness.
    Type: Application
    Filed: May 11, 2007
    Publication date: April 17, 2008
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Hee Young OH, Choun Woo LEE, Hye Kyoung CHO, Ju Kwang PARK, Cheon Seok LEE
  • Publication number: 20070154820
    Abstract: A photosensitive resin composition suitable for the production of a light-shielding black matrix for use in a liquid crystal display is disclosed. The photosensitive resin composition includes a cardo binder resin and a carboxyl group-containing polyfunctional monomer and exhibits superior physical properties, such as heat resistance, chemical resistance, development margin, developability and adhesive properties. Further disclosed is a black matrix produced using the photosensitive resin composition. The black matrix has superior physical properties, including heat resistance, chemical resistance, development margin and adhesive properties. Particularly, since the black matrix has excellent developability with an alkaline solution, it contains no undissolved material of the composition in radiation-unexposed portions.
    Type: Application
    Filed: August 28, 2006
    Publication date: July 5, 2007
    Inventors: Hyun Jung Kang, Choun Woo Lee, Hee Young Oh, Cheon Seok Lee