Patents by Inventor Chris D. Atkinson

Chris D. Atkinson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8273523
    Abstract: In accordance with the invention, there are semiconductor devices and methods of making semiconductor devices and holes. The method of making a semiconductor device can comprise forming a photoresist layer over a surface of a wafer, wherein the wafer comprises an edge that has a substantially rounded profile, an array of dies, and at least one edge die. The method can also comprise dividing a shot area into a plurality of shot portions and assigning a blind ID to each of the plurality of shot portions. The method can further comprise identifying one or more edge shot portions on the edge of the wafer for additional exposure; and exposing one or more times identified one or more edge shot portions on the edge of the wafer and blocking non-identified one or more non-edge shot portions.
    Type: Grant
    Filed: December 28, 2006
    Date of Patent: September 25, 2012
    Assignee: Texas Instruments Incorporated
    Inventors: Shangting Detweiler, Basab Chatterjee, Chris D. Atkinson, Richard L. Guldi
  • Patent number: 7596456
    Abstract: A system and methods for the evaluation of the integrity of a wafer cassette and the disposition thereof are based upon evaluation of wafer measurement data obtained using a wafer sorter cassette mapping system utilized in-line during wafer sorting operations. In one embodiment, wafers are placed into slots in the wafer cassette. A wafer sorter cassette mapping sensor is scanned over the wafers in the wafer cassette. The positions of the wafers are measured while scanning the sensor over the wafers. The wafer position measurements are evaluated using a modeling system to determine slot positions, and a determination of the integrity of the cassette is generated. If the integrity determination indicates that the cassette is deformed beyond a predetermined value, the cassette is replaced. The measurement data may be stored in a data base for further trend analysis or for replacement forecasting.
    Type: Grant
    Filed: November 18, 2005
    Date of Patent: September 29, 2009
    Assignee: Texas Instruments Incorporated
    Inventors: Kelly C. Mollenkopf, Chris D. Atkinson, Richard L. Guldi
  • Publication number: 20080160779
    Abstract: In accordance with the invention, there are semiconductor devices and methods of making semiconductor devices and holes. The method of making a semiconductor device can comprise forming a photoresist layer over a surface of a wafer, wherein the wafer comprises an edge that has a substantially rounded profile, an array of dies, and at least one edge die. The method can also comprise dividing a shot area into a plurality of shot portions and assigning a blind ID to each of the plurality of shot portions. The method can further comprise identifying one or more edge shot portions on the edge of the wafer for additional exposure; and exposing one or more times identified one or more edge shot portions on the edge of the wafer and blocking non-identified one or more non-edge shot portions.
    Type: Application
    Filed: December 28, 2006
    Publication date: July 3, 2008
    Inventors: Shangting Detweiler, Basab Chatterjee, Chris D. Atkinson, Richard L. Guldi
  • Patent number: 7374866
    Abstract: According to one embodiment of the present invention, a method of forming a semiconductor device includes forming a photoresist layer on a surface of a wafer. The wafer includes an array of die that includes a plurality of complete die and at least one partial edge die. The wafer has an edge that has a substantially rounded profile causing undersized patterns in semiconductor devices formed on partial edge die. A first exposure intensity is assigned to a first group of die on the surface of the wafer. The first group of die includes a group of complete die, and the first exposure intensity is assigned based at least in part on the location of the first group of die on the surface of the wafer. A second exposure intensity is assigned to a second group of die on the surface of the wafer. The second group of die includes at least one partial edge die. The second exposure intensity less than the first exposure intensity to compensate for reduced line width due to the wafer edge topography.
    Type: Grant
    Filed: October 8, 2004
    Date of Patent: May 20, 2008
    Assignee: Texas Instruments Incorporated
    Inventors: Chris D. Atkinson, Richard L. Guldi, Shangting Detweiler
  • Patent number: 6848066
    Abstract: A photolithography system includes a photolithography tool 32 that includes a stage upon which a semiconductor wafer is mounted. The tool is operable to move the stage to automatically focus a pre-determined image on a surface of the semiconductor wafer. The tool is further operable to log movements of the stage. The system also includes an automation host computer 36 operable to poll the photolithography tool 32 to obtain data reflecting the logged movements of the stage. The automation host computer 36 is further operable to analyze the data and compare the data to pre-determined error conditions. The host computer also takes a pre-determined action, including sending an electronic mail message to the personal computers 38 of relevant line personnel, in the event the data meets the pre-determined error conditions.
    Type: Grant
    Filed: August 4, 2003
    Date of Patent: January 25, 2005
    Assignee: Texas Instruments Incorporated
    Inventors: Chris D. Atkinson, Keith W. Melcher, Richard L. Guldi
  • Publication number: 20040029029
    Abstract: A photolithography system includes a photolithography tool 32 that includes a stage upon which a semiconductor wafer is mounted. The tool is operable to move the stage to automatically focus a pre-determined image on a surface of the semiconductor wafer. The tool is further operable to log movements of the stage. The system also includes an automation host computer 36 operable to poll the photolithography tool 32 to obtain data reflecting the logged movements of the stage. The automation host computer 36 is further operable to analyze the data and compare the data to pre-determined error conditions. The host computer also takes a pre-determined action, including sending an electronic mail message to the personal computers 38 of relevant line personnel, in the event the data meets the pre-determined error conditions.
    Type: Application
    Filed: August 4, 2003
    Publication date: February 12, 2004
    Inventors: Chris D. Atkinson, Keith W. Melcher, Richard L. Guldi
  • Patent number: 6645684
    Abstract: A photolithography system includes a photolithography tool 32 that includes a stage upon which a semiconductor wafer is mounted. The tool is operable to move the stage to automatically focus a pre-determined image on a surface of the semiconductor wafer. The tool is further operable to log movements of the stage. The system also includes an automation host computer 36 operable to poll the photolithography tool 32 to obtain data reflecting the logged movements of the stage. The automation host computer 36 is further operable to analyze the data and compare the data to pre-determined error conditions. The host computer also takes a pre-determined action, including sending an electronic mail message to the personal computers 38 of relevant line personnel, in the event the data meets the pre-determined error conditions.
    Type: Grant
    Filed: October 5, 2001
    Date of Patent: November 11, 2003
    Assignee: Texas Instruments Incorporated
    Inventors: Chris D. Atkinson, Keith W. Melcher, Richard L. Guldi
  • Publication number: 20030068833
    Abstract: A photolithography system includes a photolithography tool 32 that includes a stage upon which a semiconductor wafer is mounted. The tool is operable to move the stage to automatically focus a pre-determined image on a surface of the semiconductor wafer. The tool is further operable to log movements of the stage. The system also includes an automation host computer 36 operable to poll the photolithography tool 32 to obtain data reflecting the logged movements of the stage. The automation host computer 36 is further operable to analyze the data and compare the data to pre-determined error conditions. The host computer also takes a pre-determined action, including sending an electronic mail message to the personal computers 38 of relevant line personnel, in the event the data meets the pre-determined error conditions.
    Type: Application
    Filed: October 5, 2001
    Publication date: April 10, 2003
    Inventors: Chris D. Atkinson, Keith W. Melcher, Richard L. Guldi