Patents by Inventor Chris D. Bencher

Chris D. Bencher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ABSORBER LAYER FOR DSA PROCESSING
    Publication number: 20080230154
    Abstract: A method of processing a substrate comprising depositing a layer comprising amorphous carbon on the substrate and then laser annealing the substrate is provided. Optionally, the layer further comprises a dopant selected from the group consisting of nitrogen, boron, phosphorus, fluorine, and combinations thereof. In one aspect, the layer comprising amorphous carbon is an anti-reflective coating and an absorber layer that absorbs electromagnetic radiation emitted by the laser and anneals a top surface layer of the substrate.
    Type: Application
    Filed: February 28, 2008
    Publication date: September 25, 2008
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Luc Van Autryve, Chris D. Bencher, Dean Jennings, Haifan Liang, Abhilash J. Mayur, Mark Yam, Wendy H. Yeh, Richard A. Brough
  • Absorber layer for DSA processing
    Patent number: 7262106
    Abstract: A method of processing a substrate comprising depositing a layer comprising amorphous carbon on the substrate and then exposing the substrate to electromagnetic radiation have one or more wavelengths between about 600 nm and about 1000 nm under conditions sufficient to heat the layer to a temperature of at least about 300° C. is provided. Optionally, the layer further comprises a dopant selected from the group consisting of nitrogen, boron, phosphorus, fluorine, and combinations thereof. In one aspect, the layer comprising amorphous carbon is an anti-reflective coating and an absorber layer that absorbs the electromagnetic radiation and anneals a top surface layer of the substrate. In one aspect, the substrate is exposed to the electromagnetic radiation in a laser annealing process.
    Type: Grant
    Filed: January 15, 2004
    Date of Patent: August 28, 2007
    Assignee: Applied Materials, Inc.
    Inventors: Luc Van Autryve, Chris D. Bencher, Dean Jennings, Haifan Liang, Abhilash J. Mayur, Mark Yam, Wendy H. Yeh, Richard A. Brough
  • Absorber layer for DSA processing
    Patent number: 7109087
    Abstract: A method of processing a substrate comprising depositing a layer comprising amorphous carbon on the substrate and then laser annealing the substrate is provided. Optionally, the layer further comprises a dopant selected from the group consisting of nitrogen, boron, phosphorus, fluorine, and combinations thereof. In one aspect, the layer comprising amorphous carbon is an anti-reflective coating and an absorber layer that absorbs electromagnetic radiation emitted by the laser and anneals a top surface layer of the substrate.
    Type: Grant
    Filed: October 3, 2003
    Date of Patent: September 19, 2006
    Assignee: Applied Materials, Inc.
    Inventors: Luc Van Autryve, Chris D. Bencher, Dean Jennings, Haifan Liang, Abhilash J. Mayur, Mark Yam, Wendy H. Yeh, Richard A. Brough