Patents by Inventor Chris David Chapman

Chris David Chapman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma arc reactor for the production of fine powders
    Patent number: 7727460
    Abstract: A plasma arc reactor and process for producing a powder from a solid feed material, for example aluminium, is provided. The reactor comprises: (a) a first electrode (5), (b) a second electrode (10) which is adapted to be spaced apart from the first electrode by a distance sufficient to achieve a plasma arc therebetween, (c) means for introducing a plasma gas into the space between the first and second electrodes, (d) means for generating a plasma arc in the space between the first and second electrodes, wherein the first electrode has a channel (7) running therethrough, an outlet of the channel exiting into the space between the first and second electrodes, and wherein means are provided for feeding solid material (20) through the channel to exit therefrom via the outlet into the space between the first and second electrodes.
    Type: Grant
    Filed: December 16, 2005
    Date of Patent: June 1, 2010
    Assignee: Tetronics Limited
    Inventors: David Edward Deegan, Chris David Chapman, Timothy Paul Johnson
  • Plasma arc reactor for the production of fine powders
    Patent number: 7022155
    Abstract: A plasma arc reactor and process for producing a powder from a solid feed material, for example aluminium, is provided. The reactor comprises: (a) a first electrode (5), (b) a second electrode (10) which is adapted to be spaced apart from the first electrode by a distance sufficient to achieve a plasma arc therebetween, (c) means for introducing a plasma gas into the space between the first and second electrodes, (d) means for generating a plasma arc in the space between the first and second electrodes, wherein the first electrode has a channel (7) running therethrough, an outlet of the channel exiting into the space between the first and second electrodes, and wherein means are provided for feeding solid material (20) through the channel to exit therefrom via the outlet into the space between the first and second electrodes.
    Type: Grant
    Filed: February 9, 2001
    Date of Patent: April 4, 2006
    Assignee: Tetronics Limited
    Inventors: David Edward Deegan, Chris David Chapman, Timothy Paul Johnson
  • Plasma arc reactor for the production of fine powders
    Publication number: 20030097903
    Abstract: A plasma arc reactor and process for producing a powder from a solid feed material, for example aluminium, is provided. The reactor comprises: (a) a first electrode (5), (b) a second electrode (10) which is adapted to be spaced apart from the first electrode by a distance sufficient to achieve a plasma arc therebetween, (c) means for introducing a plasma gas into the space between the first and second electrodes, (d) means for generating a plasma arc in the space between the first and second electrodes, wherein the first electrode has a channel (7) running therethrough, an outlet of the channel exiting into the space between the first and second electrodes, and wherein means are provided for feeding solid material (20) through the channel to exit therefrom via the outlet into the space between the first and second electrodes.
    Type: Application
    Filed: November 21, 2002
    Publication date: May 29, 2003
    Inventors: David Edward Deegan, Chris David Chapman, Timothy Paul Johnson