Patents by Inventor Chris Heung-Gyun Lee

Chris Heung-Gyun Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • DETECTION OF CLEARANCE OF POLYSILICON RESIDUE
    Publication number: 20080138988
    Abstract: During polishing of a substrate, polysilicon can be removed from a surface of the substrate. Detecting an endpoint during polishing of polysilicon can include polishing the substrate having a polysilicon residue on an area of oxide area and optically detecting clearance of the polysilicon residue.
    Type: Application
    Filed: December 7, 2007
    Publication date: June 12, 2008
    Inventors: Jeffrey Drue David, Jun Qian, Garrett Sin, Daxin Mao, Chris Heung-Gyun Lee, Sivakumar Dhandapani, Boguslaw A. Swedek, Dominic J. Benvegnu, Lakshmanan Karuppiah