Patents by Inventor Chris Hruska

Chris Hruska has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140246364
    Abstract: A system for performing ozone water treatment comprises a voltage supply circuit and a plasma eductor reactor. The voltage supply circuit includes an H-bridge controller and driver, a transformer, and an output port. The H-bridge controller and driver are configured to switch the electrical polarity of a pair of terminals. A primary of the transformer is connected to the H-bridge driver and controller. A secondary of the transformer connects in parallel with a first capacitor and in series with an inductor and a second capacitor. The output port connects in parallel with the second capacitor. The plasma eductor reactor includes an electric field generator, a flow spreader, and a diffuser. The electric field generator includes a pair of electrodes that generate an electric field. The flow spreader supplies a stream of oxygen. The diffuser supplies a stream of water. The streams of water and oxygen pass through the electric field.
    Type: Application
    Filed: March 1, 2013
    Publication date: September 4, 2014
    Applicant: Eon Labs LLC
    Inventors: Chris Hruska, Walter Buchanan, David Forsee
  • Patent number: 7709864
    Abstract: A rectifier device (10) comprising a multi-layer epitaxial film (12) and a rectifier and a transistor manufactured in the film (12), wherein the transistor is oriented vertically relative to the plane of the rectifier. The rectifier and transistor are separated by a transition zone of inverted bias. The rectifier is a Schottky barrier rectifier, and the transistor is a JFET. More specifically, the device (1) comprises the film (12), a trench (16), a first region (18) associated with an upper portion of the trench (16), and second region (20) associated with a lower portion. The interface between the p+ material of the second region (20) and the n material of the film (12) creates a p+/n junction. The device (10) has use in high frequency, low-loss power circuit applications in which high switching speed and low forward voltage drop are desirable.
    Type: Grant
    Filed: April 7, 2006
    Date of Patent: May 4, 2010
    Assignee: Diodes Fabtech Inc
    Inventors: Roman Hamerski, Chris Hruska, Fazia Hossain
  • Publication number: 20070235830
    Abstract: A rectifier device (10) comprising a multi-layer epitaxial film (12) and a rectifier and a transistor manufactured in the film (12), wherein the transistor is oriented vertically relative to the plane of the rectifier. The rectifier and transistor are separated by a transition zone of inverted bias. The rectifier is a Schottky barrier rectifier, and the transistor is a JFET. More specifically, the device (1) comprises the film (12), a trench (16), a first region (18) associated with an upper portion of the trench (16), and second region (20) associated with a lower portion. The interface between the p+ material of the second region (20) and the n material of the film (12) creates a p+/n junction. The device (10) has use in high frequency, low-loss power circuit applications in which high switching speed and low forward voltage drop are desirable.
    Type: Application
    Filed: April 7, 2006
    Publication date: October 11, 2007
    Inventors: Roman Hamerski, Chris Hruska, Fazia Hossain