Patents by Inventor Chris Kirk

Chris Kirk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220027816
    Abstract: This disclosure describes systems, methods, and devices related to customizing the presentation of data indicative of disruptive events relative to workplaces. A device may determine a geographical area comprising one or more geographical sub-areas, and a disruptive event is taking place at the geographical area. The device may determine one or more metrics associated with the disruptive event. The device may determine, based on the one or more metrics, a first disruption score indicative of a future severity condition caused by the disruptive event that will take place at a first geographical sub-area of the one or more geographical sub-areas. The device may generate a first user interface to present a geographical map associated with the geographical area, and the first geographical area is marked by the first disruption score.
    Type: Application
    Filed: July 21, 2021
    Publication date: January 27, 2022
    Applicant: Cox Automotive, Inc.
    Inventors: Duane Ritter, Chris Kirk, Jim Shortal, Jessie Lacks, Jonathan Smoke, Mark Strand, Taylor Horton, Russell Anderson, Spencer Taft, Russ Johnson, Viktor Wronowski
  • Patent number: 9927371
    Abstract: A line scan wafer inspection system includes a confocal slit aperture filter to remove sidelobes and enhance resolution in the scanning direction. A position detector associated with the slit aperture filter monitors and corrects illumination line image positions relative to the slit aperture to keep image position variations within tolerable limits. Each detector measures a line position and then uses the line position signal to adjust optical, mechanical, and electronic components in the collection path in a feedback loop. The feedback loop may be employed in a runtime calibration process or during inspection to enhance stability.
    Type: Grant
    Filed: April 21, 2015
    Date of Patent: March 27, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Mark S. Wang, Chris Kirk, Andrey Kharisov
  • Publication number: 20150369750
    Abstract: A line scan wafer inspection system includes a confocal slit aperture filter to remove sidelobes and enhance resolution in the scanning direction. A position detector associated with the slit aperture filter monitors and corrects illumination line image positions relative to the slit aperture to keep image position variations within tolerable limits. Each detector measures a line position and then uses the line position signal to adjust optical, mechanical, and electronic components in the collection path in a feedback loop. The feedback loop may be employed in a runtime calibration process or during inspection to enhance stability.
    Type: Application
    Filed: April 21, 2015
    Publication date: December 24, 2015
    Inventors: Mark S. Wang, Chris Kirk, Andrey Kharisov
  • Publication number: 20130123976
    Abstract: A method and apparatus for fulfilling a product offer are described herein. An offer of a product sample is made in exchange for a shopper checking in at a vending machine on asocial networking site. Information associated with a check-in is passed to a vending machine which dispenses a product sample.
    Type: Application
    Filed: June 28, 2012
    Publication date: May 16, 2013
    Inventors: Guerin James McClure, Franklin Flurry, Austin Hobbs, Jason Stewart, Rendall Koski, Kirk Vlastakis, Chris Kirk, Kien Lao, Chris Church, David Rankin, Stephen Cukiernik, Greg Tetrualt
  • Patent number: 7705331
    Abstract: Methods and systems for providing illumination of a specimen for a process performed on the specimen are provided. One system configured to provide illumination of a specimen for a process performed on the specimen includes a laser configured to generate excitation light. The system also includes focusing optics configured to focus the excitation light to a plasma in an electrodeless lamp such that the plasma generates light. The system is also configured such that the light illuminates the specimen during the process.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: April 27, 2010
    Assignee: KLA-Tencor Technologies Corp.
    Inventors: Greg Kirk, Rich Solarz, Chris Kirk, Gil Delgado, Anatoly Schemelinin, Jim Li, Qibiao Chen, Charles Nenghe Wang
  • Patent number: 5502306
    Abstract: There is disclosed numerous embodiments of a method and apparatus for a particle scanning system and an automatic inspection system. In each of these a particle beam is directed at the surface of a substrate for scanning that substrate. Also included are a selection of detectors to detect at least one of the secondary particles, back-scattered particles and transmitted particles from the substrate. The substrate is mounted on an x-y stage to provide it with at least one degree of freedom while the substrate is being scanned by the/particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary particles. The system also has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment means for initially aligning the substrate beneath the,particle beam means.
    Type: Grant
    Filed: March 17, 1994
    Date of Patent: March 26, 1996
    Assignee: KLA Instruments Corporation
    Inventors: Dan Meisburger, Alan D. Brodie, Curt Chadwick, Anil Desai, Hans Dohse, Dennis Emge, John Greene, Ralph Johnson, Ming-Yie Ling, John McMurtry, Barry Becker, Ray Paul, Mike Robinson, Richard Simmons, David E. A. Smith, John Taylor, Lee Veneklasen, Dean Walters, Paul Wieczorek, Sam Wong, April Dutta, Surendra Lele, Kirkwood Rough, Henry Pearce-Percy, Jack Y. Jau, Chun C. Lin, Hoi T. Nguyen, Yen-Jen Oyang, Timothy L. Hutcheson, David J. Clark, Chung-Shih Pan, Chetana Bhaskar, Chris Kirk, Eric Munro