Patents by Inventor Chris Murray Beard

Chris Murray Beard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHODS AND APPARATUS TO CONTROL GRAYSCALE PHOTOLITHOGRAPHY
    Publication number: 20200064745
    Abstract: A die includes a resist layer located over a semiconductor substrate, and a pattern developed in the resist layer. The pattern includes a plurality of locations of developed photoresist, each location of developed photoresist separated from a neighboring location of developed photoresist by a portion of undeveloped photoresist, and the developed photoresist at each location having a corresponding different thickness.
    Type: Application
    Filed: November 4, 2019
    Publication date: February 27, 2020
    Inventors: Lucius M. Sherwin, Song Zheng, Chris Murray Beard, Noppawan Boorananut
  • Methods and apparatus to control grayscale photolithography
    Patent number: 10466597
    Abstract: Methods and apparatus to control grayscale lithography are disclosed. A disclosed example apparatus for adjusting a grayscale lithography process includes an optical measurement device to optically measure portions of a patterned wafer, and a processor to calculate a profile based on the measured portions, and to determine an adjustment of the grayscale lithography process based on the calculated profile. The disclosed apparatus also includes an adjuster to control the grayscale lithography process based on the adjustment.
    Type: Grant
    Filed: November 1, 2017
    Date of Patent: November 5, 2019
    Assignee: TEXAS INSTRUMENTS INCORPORATED
    Inventors: Lucius M. Sherwin, Song Zheng, Chris Murray Beard, Noppawan Boorananut
  • METHODS AND APPARATUS TO CONTROL GRAYSCALE PHOTOLITHOGRAPHY
    Publication number: 20190129298
    Abstract: Methods and apparatus to control grayscale lithography are disclosed. A disclosed example apparatus for adjusting a grayscale lithography process includes an optical measurement device to optically measure portions of a patterned wafer, and a processor to calculate a profile based on the measured portions, and to determine an adjustment of the grayscale lithography process based on the calculated profile. The disclosed apparatus also includes an adjuster to control the grayscale lithography process based on the adjustment.
    Type: Application
    Filed: November 1, 2017
    Publication date: May 2, 2019
    Inventors: Lucius M. Sherwin, Song Zheng, Chris Murray Beard, Noppawan Boorananut