Abstract: The present invention provides constructs comprising modified riboswitches to regulate expression of a transgene within a subject. Methods of treating a disease, specifically an eye disease, are also contemplated.

Abstract: Activity-inducible fusion proteins whose activity is post-translationally regulated utilizing a hsp90 binding domain and a drug molecule are described. In the absence of the drug molecule, the activity-inducible fusion proteins are inactivated but can be activated by a relevant physiological parameter in the presence of the drug molecule. Examples of the activity-inducible fusion proteins include chimeric antigen receptors (CAR) wherein the relevant physiological parameter is antigen binding.

Abstract: Provided herein are methods and compositions for plakophilin-2 gene therapy for treating heart diseases such as arrhythmogenic right ventricular cardiomyopathy (ARVC) or arrhythmogenic cardiomyopathy (ACM).

Abstract: Provided herein are methods and compositions for plakophilin-2 gene therapy for treating heart diseases such as arrhythmogenic right ventricular cardiomyopathy (ARVC) or arrhythmogenic cardiomyopathy (ACM).

Abstract: Provided herein are methods and compositions for plakophilin-2 gene therapy for treating heart diseases such as arrhythmogenic right ventricular cardiomyopathy (ARVC) or arrhythmogenic cardiomyopathy (ACM).

Abstract: Provided herein are methods and compositions for plakophilin-2 gene therapy for treating heart diseases such as arrhythmogenic right ventricular cardiomyopathy (ARVC) or arrhythmogenic cardiomyopathy (ACM).

Abstract: Provided herein are methods and compositions for plakophilin-2 gene therapy for treating heart diseases such as arrhythmogenic right ventricular cardiomyopathy (ARVC) or arrhythmogenic cardiomyopathy (ACM).

Abstract: Provided herein are methods and compositions for plakophilin-2 gene therapy for treating heart diseases such as arrhythmogenic right ventricular cardiomyopathy (ARVC) or arrhythmogenic cardiomyopathy (ACM).

Abstract: The present invention provides constructs comprising modified riboswitches to regulate expression of a transgene within a subject. Methods of treating a disease, specifically an eye disease, are also contemplated.

Abstract: A method and system for establishing a network-based collaboration is described. The method involves the provision of a server-terminal as a data source for the collaboration session, a plurality of client-terminals to allow a user access for participating in the collaboration session and one or more application gateways, the application gateways being configured to relay data between network components during the collaboration session. Both the server-terminal and the client-terminals are allocated an application gateway to which it transmits/and receives data during the collaboration session, the allocation of the application gateways being determined by the location of the server-terminal and client terminals within the network. Also described is a method of data path optimisation for the application gateways employed within the network-based collaboration. A particular application of the present invention is found within the field of Wide Area Network (WAN)-based collaborations.

Abstract: A variety of compositions that are particularly applicable for removing one or more of resist, etching residue, planarization residue, and copper oxide from a substrate comprising copper and a low-k dielectric material are described. The resist, residues, and copper oxide are removed by contacting the substrate surface with the composition, typically for a period of 30 seconds to 30 minutes, and at a temperature between 25° and 45° C. The composition includes a fluoride-providing component; at least 1% by weight of a water miscible organic solvent; an organic acid; and at least 81% by weight water. Typically the composition further includes up to about 0.4% of one or more chelators.

Abstract: The present invention generally relates to compositions and methods for cleaning by contacting a hard disk data storage device, an inkjet printer cartridge head, or the like having residue thereon, particularly organometallic or metal oxide residue, with a cleaning composition of the present invention for a time and at a temperature sufficient to remove the residue. Stirring, agitation, circulation, sonication or other techniques as are known in the art optionally may be used. The hard disk data storage device, an inkjet printer cartridge head, or the like is generally immersed in the cleaning composition. The time and temperature can be determined based on the particular material being removed from a substrate. Generally, the temperature is in the range of from about ambient or room temperature to about 100° C. and the contact time is from about 1 to about 60 minutes. The preferred temperature and time of contact for this invention is about 25 to about 45° C. for about 2 to about 60 minutes.

Abstract: A composition for the stripping of photoresist and the cleaning of residues from substrates, and for silicon oxide etch, comprising from about 0.01 percent by weight to about 10 percent by weight of one or more fluoride compounds, from about 10 percent by weight to about 95% by weight of a sulfoxide or sulfone solvent, and from about 20 percent by weight to about 50 percent by weight water. The composition may contain corrosion inhibitors, chelating agents, co-solvents, basic amine compounds, surfactants, acids and bases.

Abstract: A method for two step cleaning of semiconductor substrate wherein a first formulation is contacted with the substrate and subsequently a second formulation is contacted with the substrate, optionally followed with a deionized water wash. The first formulation may be remover compositions referred to in the specification, such as a fluoride containing composition, and the second formulation may comprise a basic compound and from 0% to about 90% water, and may further comprise water from 0% to about 92.5% organic solvent.

Abstract: The present invention relates to a reflector apparatus for reflecting light upon a film set. The reflector apparatus comprises a fire retardant frame formed of a twin wall board made with a block-copolymer polypropylene resin with flame inhibiting properties. A flexible fire retardant sheet is detachably attached with the frame. The fire retardant sheet is constructed of a fire retardant material such as ripstop, ultra bounce, and nugget cloth. Through use of the reflector apparatus, a user can direct the light from a lamp onto the frame and/or flexible fire retardant sheet to be reflected onto the film set, allowing the user to control lighting conditions of the film set. The present invention also relates to a method for reflecting light upon a set using the reflector apparatus described herein.

Abstract: A variety of compositions that are particularly applicable for removing one or more of resist, etching residue, planarization residue, and copper oxide from a substrate comprising copper and a low-k dielectric material are described. The resist, residues, and copper oxide are removed by contacting the substrate surface with the composition, typically for a period of 30 seconds to 30 minutes, and at a temperature between 25° and 45° C. The composition includes a fluoride-providing component; at least 1% by weight of a water miscible organic solvent; an organic acid; and at least 81% by weight water. Typically the composition further includes up to about 0.4% of one or more chelators.

Abstract: The present invention relates to a reflector apparatus for reflecting light upon a film set. The reflector apparatus comprises a fire retardant frame formed of a twin wall board made with a block-copolymer polypropylene resin with flame inhibiting properties. A flexible fire retardant sheet is detachably attached with the frame. The fire retardant sheet is constructed of a fire retardant material such as ripstop, ultra bounce, and nugget cloth. Through use of the reflector apparatus, a user can direct the light from a lamp onto the frame and/or flexible fire retardant sheet to be reflected onto the film set, allowing the user to control lighting conditions of the film set. The present invention also relates to a method for reflecting light upon a set using the reflector apparatus described herein.

Abstract: The present invention relates to a reflector apparatus for reflecting light upon a film set. The reflector apparatus comprises a fire retardant frame formed of a twin wall board made with a block-copolymer polypropylene resin with flame inhibiting properties. A flexible fire retardant sheet is detachably attached with the frame. The fire retardant sheet is constructed of a fire retardant material such as ripstop, ultra bounce, and nugget cloth. Through use of the reflector apparatus, a user can direct the light from a lamp onto the frame and/or flexible fire retardant sheet to be reflected onto the film set, allowing the user to control lighting conditions of the film set. The present invention also relates to a method for reflecting light upon a set using the reflector apparatus described herein.

Abstract: A composition for the stripping of photoresist and the cleaning of residues from substrates, and for silicon oxide etch, comprising from about 0.01 percent by weight to about 10 percent by weight of one or more fluoride compounds, from about 10 percent by weight to about 95% by weight of a sulfoxide or sulfone solvent, and from about 20 percent by weight to about 50 percent by weight water. The composition may contain corrosion inhibitors, chelating agents, co-solvents, basic amine compounds, surfactants, acids and bases.

Abstract: A composition for the stripping of photoresist and the cleaning of residues from substrates, and for silicon oxide etch, comprising from about 0.01 percent by weight to about 10 percent by weight of one or more fluoride compounds, from about 10 percent by weight to about 95% by weight of a sulfoxide or sulfone solvent, and from about 20 percent by weight to about 50 percent by weight water. The composition may contain corrosion inhibitors, chelating agents, co-solvents, basic amine compounds, surfactants, acids and bases.