Patents by Inventor Christiaan J. C. M. Nillesen

Christiaan J. C. M. Nillesen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of repairing a defect in a lithographic mask comprising metal deposition from solution via U.V. stimulated electron emission
    Patent number: 5190835
    Abstract: The invention provides a method by which a transparent defect (3) in a lithographic mask (1) can be effectively restored in a simple manner. For this purpose, the mask (1) is provided with a photosensitive layer (4) and is introduced into a solution of a metal ion (5). Subsequently, the mask is exposed at the area of the defect. The photosensitive layer (4) is capable of depositing the metal ion in the form of metal under the influence of the radiation (6) supplied. According to the invention, the exposure is continued until such a quantity of metal (7) has been deposited that the radiation can no longer penetrate to the photosensitive layer (4). At that instant, the metal deposition is stopped so that overgrowth of the metal deposit (7) is automatically counteracted in a simple manner.
    Type: Grant
    Filed: March 1, 1991
    Date of Patent: March 2, 1993
    Assignee: U.S. Philips Corporation
    Inventors: Johannes W. M. Jacobs, Christiaan J. C. M. Nillesen, Johannes M. G. Rikken