Abstract: A method of reducing defects of a semiconductor substrate whereby the substrate is rinsed with an aqueous composition containing a gemini additive of the general formula I after the development of a photoresist or a photolithographic mask wherein X is a divalent group, R1, R2, R3 and R4 are substituted or unsubstituted monovalent groups, n is an integer from 1 to 5, or 1 to 10000 depending on R3 and R4, z is an integer, which is chosen so that the overall surfactant is electrically uncharged, and Z is a counter-ion.

Abstract: A photoresist stripping and cleaning composition free from N-alkylpyrrolidones and added quaternary ammonium hydroxides comprising a component (A) which comprises the polar organic solvents N-methylimidazole, dimethylsulfoxide and 1-aminopropane-2-ol.

Abstract: The present invention relates to the use of (oxidized) thioethers of alcohol alkoxylates in washing and cleaning compositions, especially in dishwashing compositions, and to washing and cleaning compositions, especially dishwashing compositions, which comprise (oxidized) thioethers of alcohol alkoxylates. These (oxidized) thioethers are especially suitable as surfactants with rinse aid function (rinse aid surfactants). “Oxidized” relates to the sulfur atom in the thioether, which may be present in oxidized form as sulfoxide (SO) or sulfonyl (SO2).

Abstract: An aqueous acidic solution and an aqueous acidic etching solution suitable for texturizing the surface of single crystal and polycrystal silicon substrates, hydrofluoric acid; nitric acid; and at least one anionic polyether, which is surface active; a method for texturizing the surface of single crystal and polycrystal silicon substrates comprising the step of (1) contacting at least one major surface of a substrate with the said aqueous acidic etching solution; (2) etching the at least one major surface of the substrate for a time and at a temperature sufficient to obtain a surface texturization consisting of recesses and protrusions; and (3) removing the at least one major surface of the substrate from the contact with the aqueous acidic etching solution; and a method for manufacturing photovoltaic cells and solar cells using the said solution and the said texturizing method.

Abstract: A process for mineral oil production, especially Winsor type III microemulsion flooding, in which an aqueous surfactant formulation which comprises at least one alkylpolyalkoxysulfate comprising propoxy groups, and at least one further surfactant differing therefrom is used, is forced through injection wells into a mineral oil deposit and crude oil is removed from the deposit through production wells. The alkylpolyalkoxysulfate comprising propoxy groups is prepared in this case by sulfating an alkoxylated alcohol, the alkoxylated alcohol being prepared by alkoxylating an alcohol using double metal cyanide catalysts or double hydroxide clays.

Abstract: This invention relates to a process of producing compounds, which are useful as bleach boosters, as well as to the compounds, which are obtainable using said process, and to their use.

Abstract: Compositions and methods of synthesis of anionic surfactants by alkoxylation of a Guerbet alcohol (GA) having 12 to 36 carbon atoms using butylene oxide, and optionally propylene oxide and/or ethylene oxide followed by the incorporation of a terminal anionic group are described herein. The GA of the present invention is made by a facile and inexpensive method that involves high temperature base catalyzed dimerization of alcohols with 6 to 18 carbon atoms. The large hydrophobe ether surfactants of the present invention find uses in enhanced oil recovery (EOR) applications where it is used for solubilization and mobilization of oil and for environmental cleanup. Further, the hydrophobe alkoxylated GA without anionic terminal group can be used as an ultra-high molecular weight non-ionic surfactant.

Abstract: The present invention relates to a process for preparing transparent conductive oxides, comprising the following steps in the sequence of a-b-c: (a) reaction of at least one starting compound (A) comprising at least one metal or semimetal M and optionally of a dopant (D) comprising at least one doping element M?, where at least one M? is different than M, in the presence of a block copolymer (B) and of a solvent (C) to form a composite material (K), (b) optional application of the composite material (K) to a substrate (S) and (c) heating of the composite material (K) to a temperature of at least 350° C., wherein the block copolymer (B) comprises at least one alkylene oxide block (AO) and at least one isobutylene block (IB). The present invention further relates to the transparent conductive oxides thus obtainable, and to their use in electronic components, as an electrode material and as a material for antistatic applications.

Abstract: Compositions and methods of synthesis of anionic surfactants by alkoxylation of a Guerbet alcohol (GA) having 12 to 36 carbon atoms using butylene oxide, and optionally propylene oxide and/or ethylene oxide followed by the incorporation of a terminal anionic group are described herein. The GA of the present invention is made by a facile and inexpensive method that involves high temperature base catalyzed dimerization of alcohols with 6 to 18 carbon atoms. The large hydrophobe ether surfactants of the present invention find uses in enhanced oil recovery (EOR) applications where it is used for solubilization and mobilization of oil and for environmental cleanup. Further, the hydrophobe alkoxylated GA without anionic terminal group can be used as an ultra-high molecular weight non-ionic surfactant.

Abstract: The invention relates to a process for mineral oil production by means of Winsor Type III microemulsion flooding, in which an aqueous surfactant formulation comprising at least one ionic surfactant of the general formula R1—O—(CH2C(CH3)HO)m(CH2CH2O)n—XY?M+ is injected through injection boreholes into a mineral oil deposit, and crude oil is withdrawn from the deposit through production boreholes. The invention further relates to ionic surfactants of the general formula.

Abstract: The present invention relates to methods, use and compositions for combating harmful fungi and bacteria in plants. More specifically, it relates to methods and compositions for controlling, preventing, or treating plant pathogens using UV filters for combating phytotoxin-producing fungi and/or bacteria, in particular, for combating harmful fungi and/or bacteria producing photodynamically active phytotoxins.

Abstract: A surfactant and a surfactant formulation comprising at least one ionic surfactant of the general formula R1—O-(D)n-(B)m-(A)l-XY?M+ where R1 is a linear or branched, saturated or unsaturated, aliphatic and/or aromatic hydrocarbon radical having 8 to 30 carbon atoms, A is ethyleneoxy, B is propyleneoxy, and D is butyleneoxy, l is from 0 to 99, m is from 0 to 99 and n is from 1 to 99, X is an alkyl or alkylene group having 0 to 10 carbon atoms, M+ is a cation, and Y? is selected from the group of sulfate groups, sulfonate groups, carboxylate groups and phosphate groups.

Abstract: The present invention relates to a surfactant mixture comprising at least one secondary alkanesulfonate having 14 to 17 carbon atoms of the general formula (I) and at least one anionic surfactant of the general formula (II) where R1, R2, R3, R4, A0, k, X, o, Y, a, b, M are each as defined in the description and the claims. The invention further relates to the use and production thereof, and to aqueous surfactant formulations comprising the surfactant mixture, and to processes for producing mineral oil by means of Winsor type III microemulsion flooding, in which the aqueous surfactant formulation is injected through injection wells into a mineral oil deposit and crude oil is withdrawn through production wells from the deposit.

Abstract: The present invention relates to a surfactant mixture comprising at least one surfactant of the general formula (I) R1O—(CH2CH(CH2OR2)O)p-(D)n-(B)m-(A)l-(X)k—Y?1/bMb+??(I) where R1, R2, p, D, n, B, m, A, l, X, k, Y?, b, Mb+ are each as defined in the claims and the description. The invention further relates to processes for mineral oil production by means of Winsor type III microemulsion flooding using a surfactant formulation comprising the surfactant mixture.

Abstract: The present invention relates to processes for tertiary mineral oil production with the aid of a surfactant mixture and to the use of a surfactant mixture for tertiary mineral oil production by means of Winsor type III microemulsion flooding, by injecting a surfactant mixture through at least one aqueous injection borehole into a mineral oil deposit, and withdrawing crude oil from the deposit through at least one production borehole, wherein the surfactant mixture, for the purpose of lowering the interfacial tension between oil and water to <0.1 mN/m, comprises at least the following components: (a) one or more polycarboxylate(s) comprising at least 50 mol % of acrylic acid units and/or methacrylic acid units and/or maleic acid units and/or itaconic acid units or salts thereof, and (b) one or more anionic and/or nonionic surfactant(s).

Abstract: Cleaning compositions comprising amphiphilic water-soluble alkoxylated polyalkylenimines having an inner polyethylene oxide block and an outer polypropylene oxide block.

Abstract: Compounds of the formulae: RO—X—NH2 (Ia); RO—X—NH3+Y? (Ib); RO—X—NH—Z—NH2 (IIa); and RO—X—NH—Z—NH3+Y? (IIb), in which X is an aliphatic alkylene group containing 2 to 6 carbon atoms; Z is an aliphatic alkylene group containing 2 to 6 carbon atoms; Y? is an anion; and R is an aliphatic iso C13H27? group with average branching degree ranging from 1.5 to 3.5. The compounds are particularly suitable as flotation collectors for enriching an iron mineral from a silicate-containing iron ore.

Abstract: The invention concerns a process for enriching an iron mineral from a silicate containing iron ore by inverse flotation comprising the addition of a collector or collector composition comprising at least one of the compounds of formulae RC(O)N(Z—O—X-NH2)2 (Ia); RC(O)N(Z-O-X-NH2)2H+ Y? (Ib); in which X is an aliphatic alkylene group containing 2 to 6 carbon atoms; Z is an aliphatic alkylene group containing 2 to 6 carbon atoms; Y? is an anion; and R is a saturated or unsaturated, linear or branched, aliphatic or aromatic moiety having between 7 and 23 carbon atoms. The invention also relates to the novel compounds according to formulae (Ia) and (Ib), compositions comprising said compounds and the use of compounds and formulations as collectors for enriching of iron mineral.

Abstract: The invention relates to a process for enriching an iron mineral from a silicate containing iron ore by inverse flotation comprising the addition of a collector or collector composition comprising at least one of the compounds of formulae RO—X—NH2 (Ia); RO—X—NH3+Y? (Ib); RO—X—NH—Z—NH2 (IIa); and RO—X—NH—Z—NH3+Y? (IIb), in which X is a linear or branched aliphatic alkylene group containing 2 to 6 carbon atoms; Z is a linear or branched aliphatic alkylene group containing 2 to 6 carbon atoms; Y? is an anion; and R is an aliphatic group of the formula (I) C5H11CH(C3H7)CH2— (I) wherein the C5H11 moeity of the aliphatic group of the formula (I) comprises 70 to 99% by weight n-C5H11—, and 1 to 30% by weight C2H5CH(CH3)CH2— and/or CH3CH(CH3)CH2CH2—.

Abstract: A method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices, the said method comprising the steps of (1) providing a substrate having patterned material layers having line-space dimensions of 50 nm and less and aspect ratios of >2; (2) providing the surface of the patterned material layers with a positive or a negative electrical charge by contacting the substrate at least once with an aqueous, fluorine-free solution S containing at least one fluorine-free cationic surfactant A having at least one cationic or potentially cationic group, at least one fluorine-free anionic surfactant A having at least one anionic or potentially anionic group, or at least one fluorine-free amphoteric surfactant A; and (3) removing the aqueous, fluorine-free solution S from the contact with the substrate.