Abstract: An ESD protection circuit includes a silicon controlled rectifier (SCR) including a first conduction path between a first node and a second node and a clamp circuit coupled to a control terminal of the SCR. The clamp circuit is part of a second conduction path between the first node and the second node. During an ESD event, the clamp circuit conduct an ESD current until a threshold IV point is reached. The clamp circuit triggers the SCR, which then acts as a snapback device to conduct the ESD current at a lower voltage.

Abstract: The described techniques address issues associated with electrostatic discharge (ESD) protection for multi-die integrated circuits (ICs). The techniques include the use of two or more semiconductor dies within a multi-die IC, which may include a first semiconductor die without ESD protection but with full ESD exposure. The first semiconductor receives ESD protection via a second semiconductor die that is integrated as part of the same package with the first semiconductor die. The second semiconductor die may be electrically more remote from ESD-exposed pins compared to the first semiconductor die. The first semiconductor die may include integrated passive devices. The second semiconductor die enables ESD protection for both semiconductor dies in the same integrated IC package.

Abstract: A silicon-controlled rectifier includes a semiconductor body including a first main surface, an active device region, a first, a second, a third and a fourth surface contact area at the first main surface and arranged directly one after another along a first lateral direction, wherein the semiconductor body is electrically contacted at each of the first to fourth surface contact areas, and a first, a second, a third and a fourth SCR region, wherein the first and third SCR regions are of a first conductivity type and directly adjoin the first and third surface contact areas, respectively, and wherein the second and fourth SCR regions are of a second conductivity type and directly adjoin the second and fourth surface contact areas, respectively, wherein the first SCR region is electrically connected to the fourth SCR region, and the second SCR region is electrically connected to the third SCR region.

Abstract: A silicon controlled rectifier (SCR) includes a first p-well region, a second p-well region, and an n-doped region. The first p-well region is coupled to a first trigger terminal via a first p-doped tap region disposed in the first p-well region. The first p-doped tap region has a higher concentration of a p-type dopant than the first p-well region. The second p-well region is coupled to a second trigger terminal via a second p-doped tap region disposed in the second p-well region. The second p-doped tap region has a higher concentration of a p-type dopant than the second p-well region.

Abstract: An ESD protection circuit includes a silicon controlled rectifier (SCR) including a first conduction path between a first node and a second node and a clamp circuit coupled to a control terminal of the SCR. The clamp circuit is part of a second conduction path between the first node and the second node. During an ESD event, the clamp circuit conduct an ESD current until a threshold IV point is reached. The clamp circuit triggers the SCR, which then acts as a snapback device to conduct the ESD current at a lower voltage.

Abstract: A vehicle having a controller, a main and a buffer memory, and a pressure sensor for each wheel. At certain time intervals after triggering, tire sensor modules transmit a sensor data record by radio, containing an individual identification code, a tire pressure and trigger information. For quick and easy assignment of wheel positions to tire sensor modules after a wheel change, after switching on the ignition or the electrical system, a detection function and subsequently and conditionally a check function are carried out. During the detection function, triggering of all modules in an order characterizing the wheel positions is expected. The controller receives the records of the triggered modules and stores them in the order received. The check function checks the records stored in the buffer memory for plausibility and, in the event of a positive result, the records are stored in the main memory instead of older records.

Abstract: In accordance with an embodiment, a semiconductor device includes: an n-doped region disposed over an insulating layer; a p-doped region disposed over the insulating layer adjacent to the n-doped region, where an interface between the n-doped region and the p-doped region form a first diode junction; a plurality of segmented p-type anode regions disposed over the insulating layer, each of the plurality of segmented p-type anode regions being surrounded by the n-doped region, where a doping concentration of the plurality of segmented p-type anode regions is greater than a doping concentration of the p-doped region; and a plurality of segmented n-type cathode regions disposed over the insulating layer. Each of the plurality of segmented n-type cathode regions are surrounded by the p-doped region, where a doping concentration of the plurality of segmented n-type cathode regions is greater than a doping concentration of the n-doped region.

Abstract: A silicon-controlled rectifier includes a semiconductor body including a first main surface, an active device region, a first, a second, a third and a fourth surface contact area at the first main surface and arranged directly one after another along a first lateral direction, wherein the semiconductor body is electrically contacted at each of the first to fourth surface contact areas, and a first, a second, a third and a fourth SCR region, wherein the first and third SCR regions are of a first conductivity type and directly adjoin the first and third surface contact areas, respectively, and wherein the second and fourth SCR regions are of a second conductivity type and directly adjoin the second and fourth surface contact areas, respectively, wherein the first SCR region is electrically connected to the fourth SCR region, and the second SCR region is electrically connected to the third SCR region.

Abstract: A silicon-controlled rectifier (SCR) includes a semiconductor body including a first main surface, an active device region, a first, a second, a third and a fourth surface contact area at the first main surface and arranged directly one after another along a first lateral direction, wherein the semiconductor body is electrically contacted at each of the first to fourth surface contact areas, and a first, a second, a third and a fourth SCR region, wherein the first and third SCR regions are of a first conductivity type and directly adjoin the first and third surface contact areas, respectively, and wherein the second and fourth SCR regions are of a second conductivity type and directly adjoin the second and fourth surface contact areas, respectively, wherein the first SCR region is electrically connected to the fourth SCR region, and the second SCR region is electrically connected to the third SCR region.

Abstract: The described techniques address issues associated with electrostatic discharge (ESD) protection for multi-die integrated circuits (ICs). The techniques include the use of two or more semiconductor dies within a multi-die IC, which may include a first semiconductor die without ESD protection but with full ESD exposure. The first semiconductor receives ESD protection via a second semiconductor die that is integrated as part of the same package with the first semiconductor die. The second semiconductor die may be electrically more remote from ESD-exposed pins compared to the first semiconductor die. The first semiconductor die may include integrated passive devices. The second semiconductor die enables ESD protection for both semiconductor dies in the same integrated IC package.

Abstract: In accordance with an embodiment, a semiconductor device includes: an n-doped region disposed over an insulating layer; a p-doped region disposed over the insulating layer adjacent to the n-doped region, where an interface between the n-doped region and the p-doped region form a first diode junction; a plurality of segmented p-type anode regions disposed over the insulating layer, each of the plurality of segmented p-type anode regions being surrounded by the n-doped region, where a doping concentration of the plurality of segmented p-type anode regions is greater than a doping concentration of the p-doped region; and a plurality of segmented n-type cathode regions disposed over the insulating layer. Each of the plurality of segmented n-type cathode regions are surrounded by the p-doped region, where a doping concentration of the plurality of segmented n-type cathode regions is greater than a doping concentration of the n-doped region.

Abstract: A silicon-controlled rectifier (SCR) includes a semiconductor body including a first main surface, an active device region, a first, a second, a third and a fourth surface contact area at the first main surface and arranged directly one after another along a first lateral direction, wherein the semiconductor body is electrically contacted at each of the first to fourth surface contact areas, and a first, a second, a third and a fourth SCR region, wherein the first and third SCR regions are of a first conductivity type and directly adjoin the first and third surface contact areas, respectively, and wherein the second and fourth SCR regions are of a second conductivity type and directly adjoin the second and fourth surface contact areas, respectively, wherein the first SCR region is electrically connected to the fourth SCR region, and the second SCR region is electrically connected to the third SCR region.

Abstract: A silicon-controlled rectifier (SCR) includes a semiconductor body including a first main surface and an active device region. First through fourth surface contact areas at the first main surface are arranged directly one after another along a lateral direction. The semiconductor body is electrically contacted at each surface contact area. First and third SCR regions of a first conductivity type directly adjoin the first and third surface contact areas, respectively. Second and fourth SCR regions of a second conductivity type directly adjoin the second and fourth surface contact areas, respectively. The second SCR region at least partially overlaps a first well region of the first conductivity type at the first main surface. The first SCR region at most partially overlaps the first well region at the first main surface, and is electrically connected to the second SCR region. The third SCR region is electrically connected to the fourth SCR region.

Abstract: An embodiment of a silicon controlled rectifier (SCR) includes a semiconductor body, an active device region, and a device isolation region configured to electrically insulate the active device region from neighboring active device regions. First SCR regions and a second SCR region of a first conductivity type are in the active device region. A first pn-junction or Schottky junction is formed at an interface between the first SCR regions and the second SCR region. A first plurality of the first SCR regions and sub-regions of the second SCR region are alternately arranged and directly adjoin one another. A second pn-junction is formed at an interface between the second SCR region and a third SCR region of a second conductivity type. A third pn-junction is formed at an interface between the third SCR region and a fourth SCR region of the first conductivity type.

Abstract: A silicon-controlled rectifier (SCR) includes a semiconductor body including a first main surface and an active device region. First through fourth surface contact areas at the first main surface are arranged directly one after another along a lateral direction. The semiconductor body is electrically contacted at each surface contact area. First and third SCR regions of a first conductivity type directly adjoin the first and third surface contact areas, respectively. Second and fourth SCR regions of a second conductivity type directly adjoin the second and fourth surface contact areas, respectively. The second SCR region at least partially overlaps a first well region of the first conductivity type at the first main surface. The first SCR region at most partially overlaps the first well region at the first main surface, and is electrically connected to the second SCR region. The third SCR region is electrically connected to the fourth SCR region.

Abstract: A compressor rotor blade for an axial-type compressor has a blade profile having a transonic section and a profile section which extends in the transonic section and has concave and convex suction-side regions on the suction side, the convex suction-side region arranged downstream of the concave suction-side region, and has convex and concave pressure-side regions on the pressure side, the concave pressure-side region arranged downstream of the convex pressure-side region. Curvature progressions on the pressure side and on the suction side are both applied in a continuous manner over a profile chord of the profile section, the positions of the minimum values of the curvature progressions deviate from each other by not more than 10% of the length of the profile chord, and the positions of the maximum values of the curvature progressions deviate from each other by not more than 10% of the length of the profile chord.

Abstract: An embodiment of a silicon controlled rectifier (SCR) includes a semiconductor body, an active device region, and a device isolation region configured to electrically insulate the active device region from neighboring active device regions. First SCR regions and a second SCR region of a first conductivity type are in the active device region. A first pn-junction or Schottky junction is formed at an interface between the first SCR regions and the second SCR region. A first plurality of the first SCR regions and sub-regions of the second SCR region are alternately arranged and directly adjoin one another. A second pn-junction is formed at an interface between the second SCR region and a third SCR region of a second conductivity type. A third pn-junction is formed at an interface between the third SCR region and a fourth SCR region of the first conductivity type.

Abstract: Described is an apparatus which comprises: a pad; a first transistor coupled in series with a second transistor and coupled to the pad; and a self-biasing circuit to bias the first transistor such that the first transistor is to be weakly biased during an electrostatic discharge (ESD) event. Described is also an apparatus which comprises: a first transistor; and a first local ballast resistor formed of a trench contact (TCN) layer, the first local ballast resistor having a first terminal coupled to either the drain or source terminal of the first transistor.

Abstract: A compressor rotor blade for an axial-type compressor has a blade profile having a transonic section and a profile section which extends in the transonic section and has concave and convex suction-side regions on the suction side, the convex suction-side region arranged downstream of the concave suction-side region, and has convex and concave pressure-side regions on the pressure side, the concave pressure-side region arranged downstream of the convex pressure-side region. Curvature progressions on the pressure side and on the suction side are both applied in a continuous manner over a profile chord of the profile section, the positions of the minimum values of the curvature progressions deviate from each other by not more than 10% of the length of the profile chord, and the positions of the maximum values of the curvature progressions deviate from each other by not more than 10% of the length of the profile chord.

Abstract: A method for profiling a replacement blade for an axial turbomachine is provided. The method includes: measuring hub contour geometry and housing contour geometry of the flow channel of the old blade and the axial position of the centre of gravity of the blade aerofoil of the old blade; laying out geometry of the blade aerofoil of the replacement blade, the blade aerofoil having a rearward sweep on its leading edge; defining a region of the blade aerofoil near the mounting and in which positive influence of the rearward sweep on the degree of stage efficiency is rated as low; and axially displacing the replacement blade aerofoil section arranged outside this region in the upstream direction, until the axial position of the centre of gravity of the blade aerofoil of the replacement blade coincides with the old blade.