Patents by Inventor Christian Felix
Christian Felix has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240120774Abstract: A device (100) for wirelessly transferring power toward a consumer (200) by way of inductive coupling, wherein the device (100) has: a rectifier (101) for generating a DC voltage (UG) from a line voltage (UN), an inverter (102) which is configured to generate a pulse-width-modulated drive signal (AS), and a power coil (103) driven by way of the pulse-width-modulated drive signal (AS), which power coil can generate an alternating magnetic field for power transfer and for measurement purposes, wherein, in a first operating mode, the inverter (102) is configured to generate the pulse-width-modulated drive signal (AS) for power transfer as a function of the DC voltage (UG), and wherein, in a second operating mode, the inverter is configured to generate the pulse-width-modulated drive signal (AS) for measurement purposes depending on a measurement voltage (UM), wherein the DC voltage (UG) is greater than the measurement voltage (UM) during the second operating mode.Type: ApplicationFiled: September 26, 2023Publication date: April 11, 2024Inventors: Christian Egenter, Ulrich Waechter, Max-Felix Mueller, Mathias Bellm
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Patent number: 11954248Abstract: A display pose of a client computing device is computed in a hybrid manner using both the client computing device and a server. Using the client computing device, an initial pose of the client computing device at an initial time is computed. A prospective pose at a target time is predicted using the client computing device. The prospective pose is sent along with auxiliary data from the client computing device to the server and a display pose of the client computing device at a display time is computed. The display pose is computed using the prospective pose and the auxiliary data.Type: GrantFiled: March 17, 2023Date of Patent: April 9, 2024Assignee: Microsoft Technology Licensing, LLC.Inventors: Matthias Felix Reeh, Christian Voss-Wolff, Alex Christopher Turner
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Publication number: 20240102926Abstract: Aspects of the present invention relate to methods for characterizing a multi-layered tire tread. In one example, a method comprises providing a first rubber composition having a first refractive index and providing a second rubber composition having a second refractive index. The method further comprises determining a difference between the first refractive index and the second refractive index and comparing the difference to a threshold refractive index. In addition, the method comprises adding a refractive index modifier to the first rubber composition and/or second rubber composition in case the comparison provides that the difference is lower than the threshold refractive index, so that the difference is greater than, or equal to, the threshold refractive index.Type: ApplicationFiled: December 7, 2023Publication date: March 28, 2024Inventors: Claude Schweitzer, Pierre Felix Orlewski, Christian Jean-Marie Kaes, Abdulkareem Modupe Melaiye, Michael Freylinger, Sylvain Fourme, Pauline Monique Marie-Lucie Ghislaine Delroisse
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Patent number: 11939397Abstract: Provided herein are antibodies or antigen-binding fragments thereof, e.g., monoclonal antibodies or antigen binding fragments thereof, that specifically bind to ENTPD2 (e.g., human ENTPD2 protein), and methods of using these antibodies or antigen-binding fragments. The present invention also relates to combination therapies comprising an anti-human ENTPD2 antibody or antigen binding fragment and at least one additional therapeutic agent, and methods of using these combination therapies.Type: GrantFiled: May 29, 2019Date of Patent: March 26, 2024Assignee: Novartis AGInventors: Michael Didonato, Christoph Erkel, Anna Galkin, Scott Glaser, Klaus Felix Hartlepp, Yong Jia, Alexandra Kraus, Christian Cho-Hua Lee, Sarah Michelle Rue, Jian Shi, Xenia Karola Wezler
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Patent number: 11936203Abstract: A method is provided for operating a device for wireless transfer of energy in the direction of an electrical consumer via inductive coupling. The method involves sequentially carrying out a power transfer, a data exchange, a measurement of setup parameters, and a measurement of a resonance frequency, wherein during the power transfer, an electrical actual power emitted by an inverter is regulated to a predetermined electrical setpoint value, wherein during the data exchange, data are exchanged between the device and the electrical consumer via a communication unit, wherein during the measurement of the setup parameters, objects possibly arranged over a power coil are detected, wherein during the measurement of the resonance frequency, a resonance frequency of a resonant circuit having the power coil is ascertained, and wherein the measurement of the resonance frequency is executed immediately before or immediately after the measurement of the setup parameters or the data exchange.Type: GrantFiled: October 28, 2022Date of Patent: March 19, 2024Assignee: E.G.O. ELEKTRO-GERAETEBAU GMBHInventors: Mathias Bellm, Christian Egenter, Max-Felix Mueller, Ulrich Waechter
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Publication number: 20240066781Abstract: Aspects of the present invention relate to a tire tread production line and a method for manufacturing a tire tread. The production line comprises a coextruder, a THz sensor and a controller operatively connected to the coextruder and to the THz sensor. The THz sensor is configured to irradiate the multi-layer tire tread extrudate with THz electromagnetic radiation, and receive a response of the multi-layer tire tread extrudate to the THz electromagnetic radiation. The controller is configured to operate the coextruder based on the response of the multi-layer tire tread extrudate to the THz electromagnetic radiation.Type: ApplicationFiled: August 30, 2022Publication date: February 29, 2024Inventors: Claude Schweitzer, Christian Jean-Marie Kaes, Pauline Monique Marie-Lucie Ghislaine Delroisse, Pierre Felix Orlewski, Michael Freylinger, Sylvain Fourme
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Patent number: 11886126Abstract: The present application relates to an apparatus and to a method for removing at least a single particulate from a substrate, especially an optical element for extreme ultraviolet (EUV) photolithography, wherein the apparatus comprises: (a) an analysis unit designed to determine at least one constituent of a material composition of the at least one single particulate; and (b) at least one gas injection system designed to provide a gas matched to the particular constituent in an environment of the at least one single particulate; (c) wherein the matched gas contributes to removing the at least one single particulate from the substrate.Type: GrantFiled: July 7, 2021Date of Patent: January 30, 2024Assignee: Carl Zeiss SMT GmbHInventors: Klaus Edinger, Christian Felix Hermanns, Tilo Sielaff, Jens Oster, Christof Baur, Maksym Kompaniiets
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Publication number: 20230305386Abstract: The present disclosure relates to methods, to an apparatus and to a computer program for processing of a lithography object. More particularly, the present invention relates to a method for removing a material, to a corresponding apparatus and to a method for lithographic processing of a wafer, and to a computer program for performing the methods. A method for processing a lithography object comprises, for example: providing a first gas comprising first molecules; providing a particle beam in a working region of the object for removal of a first material in the working region based at least partly on the first gas, wherein the first material comprises ruthenium.Type: ApplicationFiled: March 21, 2023Publication date: September 28, 2023Inventors: Christian Felix Hermanns, Petra Spies, Daniel Rhinow, Maximilian Rumler, Horst Schneider, Fan Tu, Laura Ahmels, Benjamin Herd
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Publication number: 20230280647Abstract: The present invention pertains to methods, apparatuses and computer programs for processing an object for lithography. A method for processing an object for lithography comprises: (a) providing a first gas; (b) providing a second gas, the second gas including second molecules capable of performing an inversion oscillation; (c) providing a particle beam in a working region of the object for production of a deposition material in the working region based at least partly on the first gas and the second gas. The second gas is provided with a gas flow rate of less than 5 sccm, preferably less than 2 sccm, more preferably less than 0.5 sccm.Type: ApplicationFiled: February 8, 2023Publication date: September 7, 2023Inventors: Daniel Rhinow, Christian Felix Hermanns, Johann-Christoph Von Saldern, Hubertus Marbach, Nicole Auth, Bartholomaeus Szafranek, Christian Preischl
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Publication number: 20230185180Abstract: Method for the particle beam-induced etching of a lithography mask, more particularly a non-transmissive EUV lithography mask, having the steps of: a) providing the lithography mask in a process atmosphere, b) beaming a focused particle beam onto a target position on the lithography mask, c) supplying at least one first gaseous component to the target position in the process atmosphere, where the first gaseous component can be converted by activation into a reactive form, where the reactive form reacts with a material of the lithography mask to form a volatile compound, and d) supplying at least one second gaseous component to the target position in the process atmosphere, where the second gaseous component under predetermined process conditions with exposure to the particle beam forms a deposit comprising a compound of silicon with oxygen, nitrogen and/or carbon.Type: ApplicationFiled: February 6, 2023Publication date: June 15, 2023Inventors: Fan Tu, Horst Schneider, Markus Bauer, Petra Spies, Maximilian Rumler, Christian Felix Hermanns
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Publication number: 20220011682Abstract: The present application relates to an apparatus and to a method for removing at least a single particulate from a substrate, especially an optical element for extreme ultraviolet (EUV) photolithography, wherein the apparatus comprises: (a) an analysis unit designed to determine at least one constituent of a material composition of the at least one single particulate; and (b) at least one gas injection system designed to provide a gas matched to the particular constituent in an environment of the at least one single particulate; (c) wherein the matched gas contributes to removing the at least one single particulate from the substrate.Type: ApplicationFiled: July 7, 2021Publication date: January 13, 2022Inventors: Klaus Edinger, Christian Felix Hermanns, Tilo Sielaff, Jens Oster, Christof Baur, Maksym Kompaniiets
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Patent number: 10459342Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.Type: GrantFiled: January 14, 2019Date of Patent: October 29, 2019Assignee: ASML Netherlands B.V.Inventor: Christian Felix Wählisch
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Publication number: 20190146350Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.Type: ApplicationFiled: January 14, 2019Publication date: May 16, 2019Applicant: ASML Netherlands B.V.Inventor: Christian Felix WäHLISCH
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Patent number: 10222701Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.Type: GrantFiled: September 18, 2014Date of Patent: March 5, 2019Assignee: ASML Netherlands B.V.Inventors: Chuangxin Zhao, Sander Baltussen, Pär Mårten Lukas Broman, Richard Joseph Bruls, Cristian Bogdan Craus, Jan Groenewold, Dzmitry Labetski, Kerim Nadir, Hendrikus Gijsbertus Schimmel, Christian Felix Wählisch
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Publication number: 20160209753Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.Type: ApplicationFiled: September 18, 2014Publication date: July 21, 2016Applicant: ASML Netherlands B.V.Inventors: Chuangxin ZHAO, Pär Mårten Lukas BROMAN, Richard Joseph BRULS, Cristian Bogdan CRAUS, Jan GROENEWOLD, Dzmitry LABETSKI, Kerim NADIR, Hendrikus Gijsbertsu SCHIMMEL, Christian Felix WäHLISCH
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Publication number: 20140214509Abstract: A computer implemented method of effecting a merchant funded reward when a consumer purchases goods and/or services from a merchant using an electronic payment, including a processor executing instruction code causing collection of transaction details of the consumer purchase, processing of the transaction details to calculate any associated reward, and notification of the entire reward to be collected from the merchant.Type: ApplicationFiled: August 28, 2013Publication date: July 31, 2014Inventors: Paul Adrian Lee, Christian Felix Strauss, Ian McKenzie, David Shane Que, Matthew John Weir, Theodora Keramidas, Simon Paul Sorockyj
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Publication number: 20140137190Abstract: Embodiments of the present teachings relate to systems and methods for testing and analyzing the security of a target computing device. The method can include providing, to a server via a network, a security tool operable to be associated with a webpage accessible by a target computing device through the server, wherein security tool is operable to be executable by the target computing device and operable to collect one or more security metrics of the target computing device; receiving, from the server, the one or more security metrics of the target computing device; comparing the one or more security metrics with a security vulnerability database; and determining a level of security vulnerability for the target computing device based on comparing the one or more security metrics with the security vulnerability database.Type: ApplicationFiled: February 20, 2013Publication date: May 15, 2014Applicant: RAPID7, INC.Inventors: Marcus J. Carey, Johann Christian Felix Kirsch, HD Moore
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Patent number: D278239Type: GrantFiled: October 8, 1982Date of Patent: April 2, 1985Assignee: Teletype CorporationInventors: Christian Felix, Donald M. Genaro, Casimer Gotfryd