Abstract: Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.

Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.

Abstract: Dental material which comprises at least one compound of formula I, in which R1 is a linear, branched or cyclic aliphatic C1-C30 hydrocarbon radical or an aromatic C6-C30 hydrocarbon radical, wherein the aliphatic or aromatic hydrocarbon radical can be substituted or unsubstituted and wherein aliphatic hydrocarbon radicals can be interrupted by one or more urethane groups, ester groups, oxygen atoms and/or sulfur atoms; X, Y, Z independently of each other in each case are —COOR2, —CON(R3R4)—, an aromatic C6-C10 hydrocarbon radical or CN, wherein R2, R3, R4 in each case independently of each other is hydrogen, a linear, branched or cyclic aliphatic C1-C30 hydrocarbon radical or an aromatic C6-C30 hydrocarbon radical, wherein the aliphatic or aromatic hydrocarbon radical can be substituted or unsubstituted and wherein aliphatic hydrocarbon radicals can be interrupted by one or more oxygen atoms, and m is 2 or 3.

Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.

Abstract: Radically polymerizable composition which contains at least one vinyl ether according to general formula I:

Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.

Abstract: Dental material which comprises at least one compound of formula I, in which R1 is a linear, branched or cyclic aliphatic C1-C30 hydrocarbon radical or an aromatic C6-C30 hydrocarbon radical, wherein the aliphatic or aromatic hydrocarbon radical can be substituted or unsubstituted and wherein aliphatic hydrocarbon radicals can be interrupted by one or more urethane groups, ester groups, oxygen atoms and/or sulfur atoms; X, Y, Z independently of each other in each case are -COOR2—, -CON(R3R4)—, an aromatic C6-C10 hydrocarbon radical or CN, wherein R2, R3, R4 in each case independently of each other is hydrogen, a linear, branched or cyclic aliphatic C1-C30 hydrocarbon radical or an aromatic C6-C30 hydrocarbon radical, wherein the aliphatic or aromatic hydrocarbon radical can be substituted or unsubstituted and wherein aliphatic hydrocarbon radicals can be interrupted by one or more oxygen atoms, and m is 2 or 3.

Abstract: The invention relates to the use of sulfonic acid esters of the following Formula 1 and/or Formula 2, individually or as a mixture of more than one thereof, as regulators in polymerization reactions of radically polymerizable, ethylenically unsaturated monomers: wherein A in each case independently is selected from H, CN, linear, branched or cyclic aliphatic or aromatic C1-C30 hydrocarbon residues; X in each case independently is —COO— or —CON(R1)—, wherein the binding to A occurs via O or N, or is absent if A is an aromatic hydrocarbon residue or CN; B in each case independently is selected from linear, branched or cyclic aliphatic or aromatic C1-C30 hydrocarbon residues; R1 in each case independently is selected from hydrogen and linear, branched or cyclic aliphatic or aromatic C1-C10 hydrocarbon residues, which are optionally substituted with one or more OH groups, wherein the aliphatic hydrocarbon residues are optionally interrupted by one or more oxygen atoms; and n in each case independently is

Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.

Abstract: Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.

Abstract: Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.

Abstract: Radically polymerizable dental material, which contains at least one sulphonic acid ester of Formula 1: in which A is H, CN, an aromatic, cycloaliphatic, linear or branched aliphatic C1-C30-hydrocarbon radical or a combination thereof; X is COO— or —CON(R1)— or is absent; B is an aromatic, cycloaliphatic, linear or branched aliphatic C1-C30-hydrocarbon radical, or a combination thereof; R1 is hydrogen or an aromatic, cycloaliphatic, linear or branched aliphatic C1-C10-hydrocarbon radical; m is an integer from 1 to 6, n is an integer from 1 to 6 and p is an integer from 1 to 6; wherein m and p cannot simultaneously be greater than 1. The compounds of Formula 1 are active as chain transfer agents in radical polymerization.

Abstract: Radically polymerizable composition which contains at least one vinyl ether according to general formula I: in which the variables have the following meanings: A is H, CN, a cycloaliphatic, linear or branched aliphatic C1-C30 hydrocarbon residue, an aromatic C6-C30 hydrocarbon residue or a combination thereof; X is —COO—, —CON(R3)— or is dispensed with; B is H, CN, a cycloaliphatic, linear or branched aliphatic C1-C30 hydrocarbon residue, an aromatic C6-C30 hydrocarbon residue or a combination thereof; Y is —COO—, —CON(R3)— or is dispensed with; R1-3 in each case independently of one another are hydrogen, a cycloaliphatic, linear or branched aliphatic C1-C10 hydrocarbon residue or an aromatic C6-C10 hydrocarbon residue; m is an integer from 1 to 6; n is an integer from 1 to 6; p is an integer from 1 to 6; wherein m and p cannot be greater than 1 at the same time and wherein if m=1, p=n, and if p=1, m=n.

Abstract: Radically polymerizable dental material, which contains at least one compound of Formula I: The material preferably additionally contains a radically polymerizable monomer, an initiator for the radical polymerization and filler. It is characterized by a low polymerization contraction stress.

Abstract: Radically polymerizable dental material, which contains at least one compound of Formula I: and at least one thermolabile radically polymerizable compound and/or at least one photolabile radically polymerizable compound. The materials are characterized by debonding-on-demand properties.

Abstract: Radically polymerizable dental material, which contains at least one sulphonic acid ester of Formula 1: in which A is H, CN, an aromatic, cycloaliphatic, linear or branched aliphatic C1-C30-hydrocarbon radical or a combination thereof; X is COO— or —CON(R1)— or is absent; B is an aromatic, cycloaliphatic, linear or branched aliphatic C1-C30-hydrocarbon radical, or a combination thereof; R1 is hydrogen or an aromatic, cycloaliphatic, linear or branched aliphatic C1-C10-hydrocarbon radical; m is an integer from 1 to 6, n is an integer from 1 to 6 and p is an integer from 1 to 6; wherein m and p cannot simultaneously be greater than 1. The compounds of Formula 1 are active as chain transfer agents in radical polymerization.

Abstract: The invention relates to the use of sulfonic acid esters of the following Formula 1 and/or Formula 2, individually or as a mixture of more than one thereof, as regulators in polymerization reactions of radically polymerizable, ethylenically unsaturated monomers: wherein A in each case independently is selected from H, CN, linear, branched or cyclic aliphatic or aromatic C1-C30 hydrocarbon residues; X in each case independently is —COO— or —CON(R1)—, wherein the binding to A occurs via O or N, or is absent if A is an aromatic hydrocarbon residue or CN; B in each case independently is selected from linear, branched or cyclic aliphatic or aromatic C1-C30 hydrocarbon residues; R1 in each case independently is selected from hydrogen and linear, branched or cyclic aliphatic or aromatic C1-C10 hydrocarbon residues, which are optionally substituted with one or more OH groups, wherein the aliphatic hydrocarbon residues are optionally interrupted by one or more oxygen atoms; and n in each case independently is an

Abstract: Radically polymerizable dental material, which contains at least one compound of Formula I: The material preferably additionally contains a radically polymerizable monomer, an initiator for the radical polymerization and filler. It is characterized by a low polymerization contraction stress.

Abstract: Radically polymerizable dental material, which contains at least one compound of Formula I: and at least one thermolabile radically polymerizable compound and/or at least one photolabile radically polymerizable compound. The materials are characterized by debonding-on-demand properties.

Abstract: A technology for producing synthesis gas from crude gas from various gasification processes for solid or liquid fuels. To limit the temperatures in a subsequent strongly exothermic CO shift reaction to adjust the H2/CO ratio, the crude gas which has been freed of dust flows through two shift reactors arranged in series. The first reactor has a specific reaction-kinetically limited catalyst and the second reactor has a conventional sour gas catalyst. The specific catalyst used in the first reactor limits the exothermic shift reaction to such an extent that the reaction temperatures in the first and second reactors remain so low to avoid thermal damage to the catalysts even without introduction of external steam, and the desired gas composition is achieved.