Abstract: Polysilicon fragments are purified to remove metal contaminates by contacting the fragments with a purifying liquid at a flow rate >100 mm/sec. Effective removal without abrasion is accomplished.

Abstract: Polysilicon fragments are purified to remove metal contaminates by contacting the fragments with a purifying liquid at a flow rate >100 mm/sec. Effective removal without abrasion is accomplished.

Abstract: Polysilicon is freed of metallic impurities without the use of HCl or H2O2 by a preliminary cleaning with NHO3, HF, and H2SiF6 and a main cleaning with HNO3 and HF, followed by hydrophilization. The main cleaning solution can be cycled to the process as a preliminary cleaning solution component.

Abstract: In a method for recovering acid from an aqueous etching mixture containing HF, HNO3, H2SiF6 and HNO2 which has been used for purifying polycrystalline silicon, the used etching mixture is distilled progressively so that approximately from 20 to 50 wt. % of the mixture is distilled off as dilute acid containing more than 90 wt. % of the silicon dissolved as hexafluorosilicic acid in a first fraction, and the water contained in the used etching mixture having been reduced by approximately 10-30 wt. %, this water-depleted mixture is then concentrated by evaporation to a residue of about 1 to 5 wt. % of the initial amount of used etching mixture during which a second fraction is distilled off, and the residue is disposed of.

Abstract: Polysilicon fragments are purified to remove metal contaminates by contacting the fragments with a purifying liquid at a flow rate >100 mm/sec. Effective removal without abrasion is accomplished.

Abstract: The present invention relates to a method for cleaning polycrystalline silicon fragments to a metal content of <100 ppbw, wherein a polysilicon fraction is added to an aqueous cleaning solution containing HF and H2O2, this aqueous cleaning solution is removed and the polycrystalline fraction thereby obtained is washed with highly pure water and subsequently dried.

Abstract: In a method for recovering acid from an aqueous etching mixture containing HF, HNO3, H2SiF6 and HNO2 which has been used for purifying polycrystalline silicon, the used etching mixture is distilled progressively so that approximately from 20 to 50 wt. % of the mixture is distilled off as dilute acid containing more than 90 wt. % of the silicon dissolved as hexafluorosilicic acid in a first fraction, and the water contained in the used etching mixture having been reduced by approximately 10-30 wt. %, this water-depleted mixture is then concentrated by evaporation to a residue of about 1 to 5 wt. % of the initial amount of used etching mixture during which a second fraction is distilled off, and the residue is disposed of.

Abstract: The present invention relates to a method for cleaning polycrystalline silicon fragments to a metal content of <100 ppbw, wherein a polysilicon fraction is added to an aqueous cleaning solution containing HF and H2O2, this aqueous cleaning solution is removed and the polycrystalline fraction thereby obtained is washed with highly pure water and subsequently dried.

Abstract: A contact screw for conductive cores of a shielded cable, such screw being provided to be moved axially in a connecting device by means of threading; it has a shank (1) with screw threading (3) and a contact tip (2) the section of which provided for penetration of the cable insulation and the shield is provided with a coating (4) of insulating material, the exterior surface of the coating (4) being provided with threading (5) whose pitch is greater than the pitch of the screw threading (3) on the shank (1).

Abstract: In order to achieve a high degree of protection, especially a degree of protection IP67 with the simplest possible sealing system in contacting device, a sealing ridge is provided on housing top, which cooperates with a gasket. For reliable sealing, this is preferably arranged continuously around a contact region and is forced into the preferably plate-like gasket in the installed state. During contacting of the conductors of ribbon cable, a contacting element, for example, of contact screw penetrates the gasket and in so doing displaces sealing material, which additionally contributes to sealing. The contacting device is preferably designed as an adapter for a field bus system or as a so-called “heavy rectangular plug-in connector”.

Abstract: The terminal (1) with stirrup-shaped base member (4) and spring-loaded pressure plate (6) retained to slide between the stirrup lateral sides (4',4") includes a respective recess (10,11) on each of the lateral sides that enables the terminal (1) to be set onto the bar (3) from the side over the conductor (2).