Patents by Inventor Christian Hembd-Sollner

Christian Hembd-Sollner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Projection exposure system as well as a process for compensating image defects occuring in the projection optics of a projection exposure system, in particular for microlithography
    Patent number: 6784977
    Abstract: A projection exposure system, in particular for microlithography, serves for the generation of an image in an image plane of an object arranged in an object plane. The system comprises a light source that emits a projection light bundle. The system also comprises a projection optics arranged in the optical path between the object plane and the image plane as well as at least one optical correction component arranged in the projection light optical path in front of the image plane. In order to change the optical image properties this component is coupled to at least one correction manipulator so that an optical surface of the optical correction component illuminated by the projection light bundle is moved at least regionally. In this connection the correction manipulator operates together with a correction sensor device. The correction sensor device comprises a light source that emits at least one measuring light bundle.
    Type: Grant
    Filed: April 25, 2002
    Date of Patent: August 31, 2004
    Assignee: Carl Zeiss Semiconductor Manufacturing Technologies AG
    Inventors: Rudolf von Bünau, Christian Hembd-Söllner, Hubert Holderer
  • Projection exposure system as well as a process for compensating image defects occurring in the projection optics of a projection exposure system, in particular for microlithography
    Publication number: 20030002023
    Abstract: A projection exposure system, in particular for microlithography, serves for the generation of an image in an image plane of an object arranged in an object plane. The system comprises a light source that emits a projection light bundle. The system also comprises a projection optics arranged in the optical path between the object plane and the image plane as well as at least one optical correction component arranged in the projection light optical path in front of the image plane. In order to change the optical image properties this component is coupled to at least one correction manipulator so that an optical surface of the optical correction component illuminated by the projection light bundle is moved at least regionally. In this connection the correction manipulator operates together with a correction sensor device. The correction sensor device comprises a light source that emits at least one measuring light bundle.
    Type: Application
    Filed: April 25, 2002
    Publication date: January 2, 2003
    Inventors: Rudolf von Bunau, Christian Hembd-Sollner, Hubert Holderer