Patents by Inventor Christian K. Forgey
Christian K. Forgey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11623229Abstract: Various embodiments for an adjustable flow nozzle system having a manifold with a plurality of adjustable flow nozzles in which the flow rate of each adjustable flow nozzle may be individually adjusted are described herein.Type: GrantFiled: April 13, 2021Date of Patent: April 11, 2023Assignee: Shellback Semiconductor Technology, LLCInventors: Christian K. Forgey, Mark Nelson, Alexander Trufanov
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Patent number: 11615947Abstract: The present invention provides a magnetron system, comprising a baseplate assembly. The baseplate assembly defining a housing portion and a power feedthrough. A sputtering target is disposed within the housing portion of the baseplate assembly. An electromagnetic assembly is disposed within the housing portion of the baseplate assembly. The electromagnetic assembly comprising a plurality of electromagnet pairs and a plurality of magnet pairs, wherein the plurality of electromagnet pairs and the plurality of magnet pairs are arranged in an alternating order such that at least one electromagnet pair of the plurality of electromagnet pairs is juxtapositioned between two magnet pairs of the plurality of magnet pairs, and at least one magnet pair of the plurality of magnet pairs is juxtapositioned between two electromagnet pairs of the plurality of electromagnet pairs.Type: GrantFiled: August 20, 2021Date of Patent: March 28, 2023Assignee: OEM Group, LLCInventors: Marc-Andre Lariviere, Juan M. Rios Reyes, Nitin Choudhary, Chao Li, Brendan V. Trang, Christian K. Forgey, Michael S. Correra, William W. Senseman
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Patent number: 11577259Abstract: Various embodiments for an adjustable flow nozzle system having a manifold with a plurality of adjustable flow nozzles in which the flow rate of each adjustable flow nozzle may be individually adjusted are described herein.Type: GrantFiled: April 13, 2021Date of Patent: February 14, 2023Assignee: Shellback Semiconductor Technology, LLCInventors: Christian K. Forgey, Mark Nelson, Alexander Trufanov
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Publication number: 20220068620Abstract: The present invention provides a magnetron system, comprising a baseplate assembly. The baseplate assembly defining a housing portion and a power feedthrough. A sputtering target is disposed within the housing portion of the baseplate assembly. An electromagnetic assembly is disposed within the housing portion of the baseplate assembly. The electromagnetic assembly comprising a plurality of electromagnet pairs and a plurality of magnet pairs, wherein the plurality of electromagnet pairs and the plurality of magnet pairs are arranged in an alternating order such that at least one electromagnet pair of the plurality of electromagnet pairs is juxtapositioned between two magnet pairs of the plurality of magnet pairs, and at least one magnet pair of the plurality of magnet pairs is juxtapositioned between two electromagnet pairs of the plurality of electromagnet pairs.Type: ApplicationFiled: August 20, 2021Publication date: March 3, 2022Applicant: OEM Group, LLCInventors: Marc-Andre Lariviere, Juan M. Rios Reyes, Nitin Choudhary, Chao Li, Brendan V. Trang, Christian K. Forgey, Michael S. Correra, William W. Senseman
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Publication number: 20220068619Abstract: The present invention provides a magnetron system comprising a baseplate assembly that defines a housing portion and a power feedthrough. A magnet assembly and a segmented target assembly are disposed within the housing portion. The segmented target assembly has an inner target segment having a plurality of target tiles. A plurality of electrical contacts are in electrical communication with the power feedthrough, wherein each electrical contact of the plurality of electrical contacts electrically contacts a respective target tile of the plurality of target tiles such that power is delivered from each electrical contact of the plurality of electrical contacts to each respective target tile of the plurality of target tiles.Type: ApplicationFiled: July 29, 2021Publication date: March 3, 2022Applicant: OEM Group, LLCInventors: Marc-Andre Lariviere, Juan M. Rios Reyes, Nitin Choudhary, Chao Li, Brendan V. Trang, Christian K. Forgey, Michael S. Correra
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Patent number: 11207697Abstract: Various embodiments for an adjustable flow nozzle system having a manifold with a plurality of adjustable flow nozzles in which the flow rate of each adjustable flow nozzle may be individually adjusted are described herein.Type: GrantFiled: January 28, 2020Date of Patent: December 28, 2021Assignee: SHELLBACK SEMICONDUCTOR TECHNOLOGY, LLCInventors: Christian K. Forgey, Alexander Trufanov, Joshua A. Levinson, Darren O. O'Reilly
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Publication number: 20210229115Abstract: Various embodiments for an adjustable flow nozzle system having a manifold with a plurality of adjustable flow nozzles in which the flow rate of each adjustable flow nozzle may be individually adjusted are described herein.Type: ApplicationFiled: April 13, 2021Publication date: July 29, 2021Applicant: OEM Group East, LLCInventors: Christian K. Forgey, Mark Nelson, Alexander Trufanov
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Patent number: 11071989Abstract: Various embodiments for an adjustable flow nozzle system having a manifold with a plurality of adjustable flow nozzles in which the flow rate of each adjustable flow nozzle may be individually adjusted are described herein.Type: GrantFiled: February 8, 2018Date of Patent: July 27, 2021Assignee: OEM Group East, LLCInventors: Christian K. Forgey, Mark Nelson, Alexander Trufanov
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Publication number: 20210054497Abstract: Various embodiments of a mechanical assembly for linear and rotational handling of electronic wafer substrates under high vacuum are disclosed herein.Type: ApplicationFiled: August 19, 2020Publication date: February 25, 2021Applicant: OEM Group, LLCInventors: Marc A. Lariviere, Brendan V. Trang, Michael S. Correra, Christian K. Forgey, Juan M. Rios Reyes
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Publication number: 20200238308Abstract: Various embodiments for an adjustable flow nozzle system having a manifold with a plurality of adjustable flow nozzles in which the flow rate of each adjustable flow nozzle may be individually adjusted are described herein.Type: ApplicationFiled: January 28, 2020Publication date: July 30, 2020Applicant: OEM Group, LLCInventors: Christian K. Forgey, Alexander Trufanov, Joshua A. Levinson, Darren O. O'Reilly
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Publication number: 20180221894Abstract: Various embodiments for an adjustable flow nozzle system having a manifold with a plurality of adjustable flow nozzles in which the flow rate of each adjustable flow nozzle may be individually adjusted are described herein.Type: ApplicationFiled: February 8, 2018Publication date: August 9, 2018Inventors: Christian K. Forgey, Mark Nelson, Alexander Trufanov
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Patent number: 5508519Abstract: A system for removal of contaminating particles from a target chamber (1) which includes a target chamber having an aperture in the floor thereof for entry of a reciprocating shaft (7) for positioning a wafer (11) within the target chamber, a seal (21) disposed at the aperture and about the shaft to seal-the interior of the target chamber from the exterior of the target chamber at the seal and a removable shield mechanism (17), preferably of polytetrafluoroethylene, disposed within the target chamber, above the seal and around the shaft to retain particles scraped from the shaft. The shield mechanism has a pocket (29) disposed over the seal and around the shaft to retain the particles therein isolated from the target chamber. The shield mechanism comprises a shield (17) disposed around the shaft and a collar (18) contacting the shield and the floor of the target chamber to form the pocket with the seal. The collar further includes a lip (16) extending toward the shaft for supporting the shield thereon.Type: GrantFiled: June 15, 1994Date of Patent: April 16, 1996Assignee: Texas Instruments IncorporatedInventors: Darryl A. Bennett, Christian K. Forgey
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Patent number: 5455426Abstract: A system for removal of contaminating particles from a target chamber (1) which comprises the target chamber having an aperture (3) for entry of an ion beam (2) therein, an orienting device (7, 9, 13, 15) within the target chamber for orienting a wafer (11) with respect to the ion beam and a reusable, removable shield (23), preferably of stainless steel, disposed along the interior walls of the target chamber and secured to the interior walls. A securing device (24) is provided for releasably securing the shield to the interior walls of the target chamber.Type: GrantFiled: June 15, 1994Date of Patent: October 3, 1995Assignee: Texas Instruments IncorporatedInventors: Christian K. Forgey, Darryl A. Bennett