Patents by Inventor Christian KUTZA

Christian KUTZA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reactor for depositing polycrystalline silicon
    Patent number: 10774443
    Abstract: The yield and quality of polysilicon rods produced in the Siemens process are increased by preventing pieces of silicon too large to be removed by flushing with gas from entering reaction gas inlets and offgas outlets by means of protective elements installed in the inlets and/or outlets.
    Type: Grant
    Filed: October 11, 2016
    Date of Patent: September 15, 2020
    Assignee: WACKER CHEMIE AG
    Inventors: Heinz Kraus, Christian Kutza
  • Device for insulating and sealing electrode holders in CVD reactors
    Patent number: 10562778
    Abstract: Improved sealing of Siemens reactor electrodes which results in improved reactor campaign times, is accomplished by use of an electrically insulating ring in combination with two seals, a first seal located in a groove in the insulating ring or in a groove in the reactor base plate adjacent the insulating ring, and a second seal not contained in a groove.
    Type: Grant
    Filed: October 10, 2016
    Date of Patent: February 18, 2020
    Assignee: WACKER CHEMIE AG
    Inventors: Dominik Rennschmid, Heinz Kraus, Christian Kutza
  • Device for insulating and sealing electrode holders in CVD reactors
    Patent number: 10550466
    Abstract: Siemens CVD reactors are sealed in a manner which facilitates long production campaigns without refurbishing the seals, by the use of at least two seals, and an electrically insulating member having a thermal conductivity of from 1 to 200 W/mK, a sustained use temperature of at least 400° C., and a resistivity of more than 1·109 ?cm.
    Type: Grant
    Filed: November 6, 2015
    Date of Patent: February 4, 2020
    Assignee: WACKER CHEMIE AG
    Inventors: Heinz Kraus, Christian Kutza, Dominik Rennschmid
  • Gas distributor for a Siemens reactor
    Patent number: 10525426
    Abstract: A gas distribution system for a polysilicon deposition reactor eliminates or mitigates the problems associated with prior art distribution systems employs at least two segments which are gas-tightly connected to one another by readily detachable fasteners, with at least one gas inlet opening and one gas outlet opening, the gas distributor of the system being mounted by readily detachable fasteners to the polysilicon reactor.
    Type: Grant
    Filed: March 19, 2014
    Date of Patent: January 7, 2020
    Assignee: Wacker Chemie AG
    Inventors: Friedrich Popp, Christian Kutza, Martin Roeckl, Tobias Weiss
  • REACTOR FOR DEPOSITING POLYCRYSTALLINE SILICON
    Publication number: 20180298521
    Abstract: The yield and quality of polysilicon rods produced in the Siemens process are increased by preventing pieces of silicon too large to be removed by flushing with gas from entering reaction gas inlets and offgas outlets by means of protective elements installed in the inlets and/or outlets.
    Type: Application
    Filed: October 11, 2016
    Publication date: October 18, 2018
    Applicant: Wacker Chemie AG
    Inventors: Heinz KRAUS, Christian KUTZA
  • DEVICE FOR INSULATING AND SEALING ELECTRODE HOLDERS IN CVD REACTORS
    Publication number: 20180208469
    Abstract: Improved sealing of Siemens reactor electrodes which results in improved reactor campaign times, is accomplished by use of an electrically insulating ring in combination with two seals, a first seal located in a groove in the insulating ring or in a groove in the reactor base plate adjacent the insulating ring, and a second seal not contained in a groove.
    Type: Application
    Filed: October 10, 2016
    Publication date: July 26, 2018
    Applicant: Wacker Chemie AG
    Inventors: Dominik RENNSCHMID, Heinz KRAUS, Christian KUTZA
  • DEVICE FOR INSULATING AND SEALING ELECTRODE HOLDERS IN CVD REACTORS
    Publication number: 20170306477
    Abstract: Siemens CVD reactors are sealed in a manner which facilitates long production campaigns without refurbishing the seals, by the use of at least two seals, and an electrically insulating member having a thermal conductivity of from 1 to 200 W/mK, a sustained use temperature of at least 400° C., and a resistivity of more than 1-109 ?cm.
    Type: Application
    Filed: November 6, 2015
    Publication date: October 26, 2017
    Applicant: Wacker Chemie AG
    Inventors: Heinz KRAUS, Christian KUTZA, Dominik RENNSCHMID
  • GAS DISTRIBUTOR FOR A SIEMENS REACTOR
    Publication number: 20160067663
    Abstract: A gas distribution system for a polysilicon deposition reactor eliminates or mitigates the problems associated with prior art distribution systems employs at least two segments which are gas-tightly connected to one another by readily detachable fasteners, with at least one gas inlet opening and one gas outlet opening, the gas distributor of the system being mounted by readily detachable fasteners to the polysilicon reactor.
    Type: Application
    Filed: March 19, 2014
    Publication date: March 10, 2016
    Inventors: Friedrich POPP, Christian KUTZA, Martin ROECKL, Tobias WEISS
  • DEVICE FOR PROTECTING AN ELECTRODE SEAL IN A REACTOR FOR THE DEPOSITION OF POLYCRYSTALLINE SILICON
    Publication number: 20160045886
    Abstract: Electrode support seals in a Siemens reactor for the deposition of polycrystalline silicon are protected against thermal stress and degradation, and shorting by falling fragments is prevented by shielding having a high resistivity and also a high thermal conductivity.
    Type: Application
    Filed: February 26, 2014
    Publication date: February 18, 2016
    Inventors: Heinz KRAUS, Andreas HEGEN, Christian KUTZA