Abstract: In a method for producing a final mask layout for a mask, a provisional auxiliary mask layout is generated in accordance with an electrical circuit diagram. The provisional mask layout includes a main structure that extends in a longitudinal direction. The provisional auxiliary mask layout is converted into a final mask layout with the aid of an OPC method. The converting includes associating at least one optically non-resolvable auxiliary structure with the main structure, wherein the at least one optically non-resolvable auxiliary structure has a longitudinal direction that extends obliquely with respect to the longitudinal direction of the main structure.

Abstract: A method for producing a final mask layout (20?) avoids imaging errors. A provisional auxiliary mask layout (110) is produced, in particular in accordance with a predefined electrical circuit diagram, and is converted into the final mask layout (20?) with the aid of an OPC method. A main structure (120, 130) of the provisional auxiliary mask layout (110) is assigned optically non-resolvable auxiliary structures (160, 320). Exclusively the optically non-resolvable auxiliary structures (160, 320) are altered in the context of the OPC method, and the main structure (120, 130) itself remains unaltered.

Abstract: A method for producing for a mask a mask layout which avoids aberrations in which a provisional auxiliary mask layout produced, in particular in accordance with a prescribed electrical circuit diagram is converted into the mask layout with the aid of an OPC method. At least two different OPC variants are used in the course of the OPC method by subdividing the original auxiliary mask layout into at least two layout areas and processing each of the layout areas in accordance with one of the at least two OPC variants.