Patents by Inventor Christian N. Werner

Christian N. Werner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190099845
    Abstract: The present disclosure provides a potassium aluminum fluoride (KAlF4) flux agent having improved properties such as a lower melting point which allows for the use of solders and alloys with lower melting points. The potassium aluminum fluoride (KAlF4) flux agent may also allow for faster brazing of standard alloys.
    Type: Application
    Filed: June 5, 2018
    Publication date: April 4, 2019
    Inventors: Elisabeth Memmel, Jessica Maurer, Christian N. Werner, Anja Nieland
  • Publication number: 20190039189
    Abstract: The present disclosure provides a free flowing potassium aluminum fluoride (KAlF4) flux agent (e.g., for plasma flux applications), having improved properties such as a more spherical morphology that is resistant to caking. The potassium aluminum fluoride (KAlF4) flux agent is rendered free flowing due to the starting temperature and rate of addition of potassium hydroxide when producing KAlF4.
    Type: Application
    Filed: June 5, 2018
    Publication date: February 7, 2019
    Inventors: Elisabeth Memmel, Jessica Maurer, Christian N. Werner
  • Patent number: 10174433
    Abstract: A stannous methanesulfonate solution for tin electroplating applications and a method of forming the same are disclosed. The solution has an elevated pH. The solution also has a sufficient tin concentration for electroplating applications.
    Type: Grant
    Filed: December 2, 2014
    Date of Patent: January 8, 2019
    Assignee: Honeywell International Inc.
    Inventors: Christian N. Werner, Ronald E. H. Friedemann, Jessica Maurer
  • Publication number: 20170009362
    Abstract: A stannous methanesulfonate solution for tin electroplating applications and a method of forming the same are disclosed. The solution has an elevated pH. The solution also has a sufficient tin concentration for electroplating applications.
    Type: Application
    Filed: December 2, 2014
    Publication date: January 12, 2017
    Inventors: Christian N. Werner, Ronald E. H. Friedemann, Jessica Maurer