Patents by Inventor Christian Overmann

Christian Overmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11153469
    Abstract: The invention relates to a modular optical recording system. According to the invention, a compact, flexibly configurable and expandable system structure for image recording, image stabilization and image correction is provided with an optical observation device that is to be arranged in the region of a preferably cylindrical housing concept. The recording system is designed in such a manner that a precise, play-free and frictionless mechanical correction of at least complete rotations about the optical axis and/or a precise and play-free adjustment of the flange focal distance is made possible.
    Type: Grant
    Filed: January 29, 2018
    Date of Patent: October 19, 2021
    Assignee: Dream Chip Technologies GmbH
    Inventor: Christian Overmann
  • Publication number: 20190373143
    Abstract: The invention relates to a modular optical recording system. According FIG. 8 to the invention, a compact, flexibly configurable and expandable system structure for image recording, image stabilization and image correction is provided with an optical observation device that is to be arranged in the region of a preferably cylindrical housing concept. The recording system is designed in such a manner that a precise, play-free and frictionless mechanical correction of at least complete rotations about the optical axis and/or a precise and play-free adjustment of the flange focal distance is made possible.
    Type: Application
    Filed: January 29, 2018
    Publication date: December 5, 2019
    Inventor: Christian Overmann
  • Publication number: 20060138111
    Abstract: Disclosed is a method for determining the focal position of a laser beam, according to which a plurality of linear patterns are first created on the surface of a sample substrate by the laser beam, the distance between the laser and the substrate surface being gradually modified. The width of the individual lines is then measured and the line having the smallest width is determined. The vertical setting associated with the smallest line width is evaluated and stored as the focal setting of the machine.
    Type: Application
    Filed: May 30, 2003
    Publication date: June 29, 2006
    Applicant: Siemens Aktiengesellschaft
    Inventors: Dirk Hillebrand, Hans Mayer, Christian Overmann
  • Patent number: 6649864
    Abstract: In a method for the laser drilling of holes in a circuit substrate with the aid of a perforated mask, a laser beam is moved in the region of the perforated mask on a circular path. The center point of the region lies concentrically with respect to the set position of the respective hole in the mask. Further, the diameter of the region is smaller than the diameter of the hole. At the same time, the diameter of the laser beam spot is chosen to be large enough that it always covers the center point of the perforated mask during the circular motion. As a result, an energy distribution of the laser energy, which is as uniform as possible, is achieved in the region of the perforated mask.
    Type: Grant
    Filed: February 19, 2002
    Date of Patent: November 18, 2003
    Assignee: Siemens Aktiengesellschaft
    Inventors: Hubert De Steur, Hans Juergen Mayer, Otto Märten, Christian Overmann, Wei Pan, Eddy Roelants, Martin Wehner
  • Publication number: 20030047544
    Abstract: In a method for the laser drilling of holes in a circuit substrate with the aid of a perforated mask, a laser beam is moved in the region of the perforated mask on a circular path. The center point of the region lies concentrically with respect to the set position of the respective hole in the mask. Further, the diameter of the region is smaller than the diameter of the hole. At the same time, the diameter of the laser beam spot is chosen to be large enough that it always covers the center point of the perforated mask during the circular motion. As a result, an energy distribution of the laser energy, which is as uniform as possible, is achieved in the region of the perforated mask.
    Type: Application
    Filed: February 19, 2002
    Publication date: March 13, 2003
    Inventors: Hubert De Steur, Hans Juergen Mayer, Otto Marten, Christian Overmann, Wei Pan, Eddy Roelants, Martin Wehner
  • Patent number: D917595
    Type: Grant
    Filed: July 30, 2019
    Date of Patent: April 27, 2021
    Inventor: Christian Overmann