Abstract: The invention provides a glass door apparatus with a right and a left glass door leaf (10, 100) and functional end caps (40a, 40b, 240a, 240b), which respectively have a protrusion (52a, 52b, 252a, 252b), which, with respect to a lateral front face of the functional end cap protrudes laterally outwards in a manner at least substantially parallel to a pane face of a glass pane of one glass door leaf as well as away from said glass pane, and/or a cavity (54a, 54b, 254a, 254b) which, with respect to said lateral front face, protrudes laterally inwards in a manner is at least substantially parallel to said pane face and towards said glass pane and which, in the opposite direction, opens laterally outwardly, and wherein, in the closed state of glass door apparatus, the protrusion and/or the cavity is/are overlapped with a complementary counterpiece of the other glass door leaf.

Abstract: The invention provides a glass door apparatus with a right and a left glass door leaf (10, 100) and functional end caps (40a, 40b, 240a, 240b), which respectively have a protrusion (52a, 52b, 252a, 252b), which, with respect to a lateral front face of the functional end cap protrudes laterally outwards in a manner at least substantially parallel to a pane face of a glass pane of one glass door leaf as well as away from said glass pane, and/or a cavity (54a, 54b, 254a, 254b) which, with respect to said lateral front face, protrudes laterally inwards in a manner is at least substantially parallel to said pane face and towards said glass pane and which, in the opposite direction, opens laterally outwardly, and wherein, in the closed state of glass door apparatus, the protrusion and/or the cavity is/are overlapped with a complementary counterpiece of the other glass door leaf.

Abstract: Illumination optics for EUV microlithography guide an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1.

Abstract: An illumination optics for EUV microlithography guides an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1. A field facet mirror has a plurality of field facets that set defined illumination conditions in the object field. A following optics downstream of the field facet mirror transmits the illumination light into the object field. The following optics includes a pupil facet mirror with a plurality of pupil facets. The field facets are in each case individually allocated to the pupil facets so that portions of the illumination light bundle impinging upon in each case one of the field facets are guided on to the object field via the associated pupil facet.