Abstract: Power supply devices for generating at least one electric high-frequency power signal for a plasma having at least a first plasma state and a second plasma state are provided. The power supply devices are configured to determine a first variable that characterizes a power reflected by the plasma in the first plasma state, determine a second variable that characterizes a power reflected by the plasma in the second plasma state, generate a third variable based on the first variable and the second variable, and control at least one of a frequency or a power of the high-frequency power signal based on the third variable.

Abstract: Power supply devices for generating at least one electric high-frequency power signal for a plasma having at least a first plasma state and a second plasma state are provided. The power supply devices are configured to determine a first variable that characterizes a power reflected by the plasma in the first plasma state, determine a second variable that characterizes a power reflected by the plasma in the second plasma state, generate a third variable based on the first variable and the second variable, and control at least one of a frequency or a power of the high-frequency power signal based on the third variable.

Abstract: A power supply system includes a power converter configured to generate a high-frequency power signal and connected to a load to supply a plasma process or a gas laser process with power. The power converter has at least one amplifier path including at least one amplifier, an analog signal generated from a digital signal by a digital-analog converter (DAC) being supplied to the amplifier path, and a logic circuit unit configured to generate the digital signal and connected upstream of the DAC. The logic circuit unit has a signal data memory for storing signal data values for generating an analog signal form, an amplitude data memory for storing amplitude data values for influencing amplitudes of the analog signals, and a multiplier for multiplying the signal data values by the amplitude data values. The power converter includes an adjustable voltage supply for supplying the amplifier with a voltage.

Abstract: A power supply system includes a power converter configured to generate a high-frequency power signal and connected to a load to supply a plasma process or a gas laser process with power. The power converter has at least one amplifier path including at least one amplifier, an analog signal generated from a digital signal by a digital-analog converter (DAC) being supplied to the amplifier path, and a logic circuit unit configured to generate the digital signal and connected upstream of the DAC. The logic circuit unit has a signal data memory for storing signal data values for generating an analog signal form, an amplitude data memory for storing amplitude data values for influencing amplitudes of the analog signals, and a multiplier for multiplying the signal data values by the amplitude data values. The power converter includes an adjustable voltage supply for supplying the amplifier with a voltage.

Abstract: In a method for operating a plasma installation, an induction heating installation or a laser excitation installation in a pulsed power output operation, includes controlling at least one semiconductor switching element to produce a power loss in the at least one semiconductor switching element during a pulse pause time period in a pulse pause operation during which no power suitable for the ignition or the operation of the plasma process, the induction heating process, or the laser excitation process is produced at a power output of a power generator by the at least one semiconductor switching element of the power generator, and such that a reduction of a temperature of the at least one semiconductor switching element by more than a predetermined value is prevented.

Abstract: In a method for operating a plasma installation, an induction heating installation or a laser excitation installation in a pulsed power output operation, includes controlling at least one semiconductor switching element to produce a power loss in the at least one semiconductor switching element during a pulse pause time period in a pulse pause operation during which no power suitable for the ignition or the operation of the plasma process, the induction heating process, or the laser excitation process is produced at a power output of a power generator by the at least one semiconductor switching element of the power generator, and such that a reduction of a temperature of the at least one semiconductor switching element by more than a predetermined value is prevented.

Abstract: One aspect of the invention includes a directional coupler having a coupling factor in the forward direction determined from the equation Cf=Cf·ej?Cf, a coupling factor in the reverse direction determined from the equation Cr=Cr·ej?Cr, an isolation in the forward direction determined from the equation If=If·ej?If, and an isolation in the reverse direction determined from the equation Ir=Ir·ej?Ir, wherein at least one condition is met from among the group consisting of: (1) the absolute value of ??=?Cr+?Cf?(?Ir+?If) being less than or equal to 20°, K = C f C r * I r I f ( 2 ) is less than or equal to 1.6, and (3) Cf=Cr and If=Ir.

Abstract: One aspect of the invention includes a directional coupler having a coupling factor in the forward direction determined from the equation Cf=Cf·ej?Cf, a coupling factor in the reverse direction determined from the equation Cr=Cr·ej?Cr, an isolation in the forward direction determined from the equation If=If·ej?If, and an isolation in the reverse direction determined from the equation Ir=Ir·ej?Ir, wherein at least one condition is met from among the group consisting of: (1) the absolute value of ??=?Cr+?Cf?(?Ir+?If) being less than or equal to 20°, K = C f C r * I r I f ( 2 ) is less than or equal to 1.6, and (3) Cf=Cr and If=Ir.