Patents by Inventor Christiane Gottschalk
Christiane Gottschalk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20160115025Abstract: A system and method for facilitating a chemical reaction is provided. The system can have an electrically conductive member. The electrically conductive member is capable of holding a chemical mixture. The electrically conductive member is directly coupled to a power source and is heated when the power source is on. When a chemical mixture is within the electrically conductive member and the power source is on, the chemical mixture is heated such that a chemical reaction can occur.Type: ApplicationFiled: January 7, 2016Publication date: April 28, 2016Inventors: Johannes Seiwert, Christiane Gottschalk, Joachim Lohr, Martin Blacha
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Publication number: 20150232333Abstract: A system and method for facilitating a chemical reaction is provided. The system can have an electrically conductive member. The electrically conductive member is capable of holding a chemical mixture. The electrically conductive member is directly coupled to a power source and is heated when the power source is on. When a chemical mixture is within the electrically conductive member and the power source is on, the chemical mixture is heated such that a chemical reaction can occur.Type: ApplicationFiled: February 25, 2014Publication date: August 20, 2015Applicant: MKS Instruments, Inc.Inventors: Johannes Seiwert, Christiane Gottschalk, Joachim Lohr, Martin Blacha
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Patent number: 8882885Abstract: A system to purge dissolved gases selectively from liquids can include a first contactor having two first contactor inlets and two first contactor outlets. The first contactor can receive liquid from a liquid source at a first inlet of the first contactor and an inert gas source at a second inlet of the first contactor, the inert gas can purge a first portion of gas from the liquid source. The first portion of purged gas exits the first contactor at a first outlet of the first contactor. The second contactor can receive input from the second outlet of the first contactor and the inert gas, the inert gas purges a second portion of the gas from the liquid source. The second portion of purged gas can exit the second contactor at a first outlet of the second contactor.Type: GrantFiled: March 15, 2012Date of Patent: November 11, 2014Assignee: MKS Instruments, Inc.Inventors: Ulrich Brammer, Johannes Seiwert, Christiane Gottschalk
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Patent number: 8727323Abstract: Devices, systems, and methods employed in wet cleaning semiconductor devices are provided. In particular, systems that can deliver deionized water with the desired concentration of CO2 and methods of generating deionized water with a desired concentration of CO2 for use in wet cleaning of semiconductor devices are provided.Type: GrantFiled: April 26, 2013Date of Patent: May 20, 2014Assignee: MKS Instruments, Inc.Inventors: Johannes Seiwart, Ulrich Brammer, Christiane Gottschalk, Joachim Lohr
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Patent number: 8448925Abstract: Devices, systems, and methods employed in wet cleaning semiconductor devices are provided. In particular, systems that can deliver deionized water with the desired concentration of CO2 and methods of generating deionized water with a desired concentration of CO2 for use in wet cleaning of semiconductor devices are provided.Type: GrantFiled: June 2, 2010Date of Patent: May 28, 2013Assignee: MKS Instruments, Inc.Inventors: Johannes Seiwert, Ulrich Brammer, Christiane Gottschalk, Joachim Lohr
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Publication number: 20120279396Abstract: A system to purge dissolved gases selectively from liquids can include a first contactor having two first contactor inlets and two first contactor outlets. The first contactor can receive liquid from a liquid source at a first inlet of the first contactor and an inert gas source at a second inlet of the first contactor, the inert gas can purge a first portion of gas from the liquid source. The first portion of purged gas exits the first contactor at a first outlet of the first contactor. The second contactor can receive input from the second outlet of the first contactor and the inert gas, the inert gas purges a second portion of the gas from the liquid source. The second portion of purged gas can exit the second contactor at a first outlet of the second contactor.Type: ApplicationFiled: March 15, 2012Publication date: November 8, 2012Applicant: MKS Instruments, Inc.Inventors: Ulrich Brammer, Johannes Seiwert, Christiane Gottschalk
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Publication number: 20110134716Abstract: Devices, systems, and methods employed in wet cleaning semiconductor devices are provided. In particular, systems that can deliver deionized water with the desired concentration of CO2 and methods of generating deionized water with a desired concentration of CO2 for use in wet cleaning of semiconductor devices are provided.Type: ApplicationFiled: June 2, 2010Publication date: June 9, 2011Applicant: MKS Instruments, Inc.Inventors: Johannes Seiwert, Ulrich Brammer, Christiane Gottschalk, Joachim Lohr
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Patent number: 7731161Abstract: Devices, systems, and methods employed in wet cleaning semiconductor devices are provided. In particular, systems that can deliver deionized water with the desired concentration of CO2 and methods of generating deionized water with a desired concentration of CO2 for use in wet cleaning of semiconductor devices are provided.Type: GrantFiled: October 17, 2007Date of Patent: June 8, 2010Assignee: MKS Instruments, Inc.Inventors: Johannes Seiwert, Ulrich Brammer, Christiane Gottschalk, Joachim Lohr
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Patent number: 7622037Abstract: The invention features an apparatus and a method for supplying ozonated water to more than one process tool. Ozonated water of a first concentration received from an ozonated water generator and water received from a source are mixed to produce ozonated water of a second concentration. The ozonated water of a second concentration is supplied to a first process tool. Ozonated water from the ozonated water generator is supplied to a second process tool while supplying the ozonated water of the second concentration to the first process tool.Type: GrantFiled: August 7, 2007Date of Patent: November 24, 2009Assignee: MKS Instruments, Inc.Inventors: Jens Fittkau, Johannes Seiwert, Christiane Gottschalk
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Publication number: 20080257738Abstract: Devices, systems, and methods employed in wet cleaning semiconductor devices are provided. In particular, systems that can deliver deionized water with the desired concentration of CO2 and methods of generating deionized water with a desired concentration of CO2 for use in wet cleaning of semiconductor devices are provided.Type: ApplicationFiled: October 17, 2007Publication date: October 23, 2008Applicant: MKS Instruments, Inc.Inventors: Johannes Seiwert, Ulrich Brammer, Christiane Gottschalk, Joachim Lohr
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Publication number: 20080002518Abstract: The invention features an apparatus and a method for supplying ozonated water to more than one process tool. Ozonated water of a first concentration received from an ozonated water generator and water received from a source are mixed to produce ozonated water of a second concentration. The ozonated water of a second concentration is supplied to a first process tool. Ozonated water from the ozonated water generator is supplied to a second process tool while supplying the ozonated water of the second concentration to the first process tool.Type: ApplicationFiled: August 7, 2007Publication date: January 3, 2008Applicant: MKS Instruments, Inc.Inventors: Jens Fittkau, Johannes Seiwert, Christiane Gottschalk
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Patent number: 7264006Abstract: The invention features an apparatus and a method for supplying ozonated water to more than one process tool. Ozonated water of a first concentration received from an ozonated water generator and water received from a source are mixed to produce ozonated water of a second concentration. The ozonated water of a second concentration is supplied to a first process tool. Ozonated water from the ozonated water generator is supplied to a second process tool while supplying the ozonated water of the second concentration to the first process tool.Type: GrantFiled: August 19, 2005Date of Patent: September 4, 2007Assignee: MKS Instruments, Inc.Inventors: Jens Fittkau, Johannes Seiwert, Christiane Gottschalk
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Publication number: 20070034230Abstract: The invention relates to a method and system for cleaning semiconductor elements accommodated in a tank which uses ozonized, deionized (DI) ultrapure water. According to the invention, ozone is generated in an ozone generator (3) according to the principal of silent electric discharge while admitting highly pure oxygen. Said ozone is fed to a contactor (7) through which DI water flows. The ozone is then dissolved in the DI water. While optionally admitting additional chemicals, the ozonized DI water is conducted through the tank (12) holding the semiconductor elements in order to clean the same, and the used DI water is carried away (15). In order to stabilize the ozone concentration, CO2 is added to the ozone/oxygen mixture generated by the ozone generator (7).Type: ApplicationFiled: May 12, 2006Publication date: February 15, 2007Applicant: MKS Instruments, Inc.Inventors: Christiane Gottschalk, Jurgen Schweckendiek, Ulrich Brammer
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Patent number: 7067017Abstract: The invention relates to a method and system for cleaning semiconductor elements accommodated in a tank which uses ozonized, deionized (DI) ultrapure water. According to the invention, ozone is generated in an ozone generator (3) according to the principal of silent electric discharge while admitting highly pure oxygen. Said ozone is fed to a contactor (7) through which DI water flows. The ozone is then dissolved in the DI water. While optionally admitting additional chemicals, the ozonized DI water is conducted through the tank (12) holding the semiconductor elements in order to clean the same, and the used DI water is carried away (15). In order to stabilize the ozone concentration, CO2 is added to the ozone/oxygen mixture generated by the ozone generator (7).Type: GrantFiled: July 15, 2004Date of Patent: June 27, 2006Assignee: MKS Instruments, Inc.Inventors: Christiane Gottschalk, Jürgen Schweckendiek, Ulrich Brammer
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Publication number: 20060107969Abstract: The invention features an apparatus and a method for supplying ozonated water to more than one process tool. Ozonated water of a first concentration received from an ozonated water generator and water received from a source are mixed to produce ozonated water of a second concentration. The ozonated water of a second concentration is supplied to a first process tool. Ozonated water from the ozonated water generator is supplied to a second process tool while supplying the ozonated water of the second concentration to the first process tool.Type: ApplicationFiled: August 19, 2005Publication date: May 25, 2006Applicant: MKS Instruments, Inc.Inventors: Jens Fittkau, Johannes Seiwert, Christiane Gottschalk
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Patent number: 6948504Abstract: The invention features an apparatus and a method for supplying ozonated water to more than one process tool. Ozonated water of a first concentration received from an ozonated water generator and water received from a source are mixed to produce ozonated water of a second concentration. The ozonated water of a second concentration is supplied to a first process tool. Ozonated water from the ozonated water generator is supplied to a second process tool while supplying the ozonated water of the second concentration to the first process tool.Type: GrantFiled: September 10, 2004Date of Patent: September 27, 2005Assignee: MKS Instruments, Inc.Inventors: Jens Fittkau, Johannes Seiwert, Christiane Gottschalk
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Publication number: 20050056301Abstract: The invention relates to a method and system for cleaning semiconductor elements accommodated in a tank which uses ozonized, deionized (DI) ultrapure water. According to the invention, ozone is generated in an ozone generator (3) according to the principal of silent electric discharge while admitting highly pure oxygen. Said ozone is fed to a contactor (7) through which DI water flows. The ozone is then dissolved in the DI water. While optionally admitting additional chemicals, the ozonized DI water is conducted through the tank (12) holding the semiconductor elements in order to clean the same, and the used DI water is carried away (15). In order to stabilize the ozone concentration, CO2 is added to the ozone/oxygen mixture generated by the ozone generator (7).Type: ApplicationFiled: July 15, 2004Publication date: March 17, 2005Applicant: Applied Science and Technology, Inc.Inventors: Christiane Gottschalk, Jurgen Schweckendiek, Ulrich Brammer
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Publication number: 20050029202Abstract: The invention features an apparatus and a method for supplying ozonated water to more than one process tool. Ozonated water of a first concentration received from an ozonated water generator and water received from a source are mixed to produce ozonated water of a second concentration. The ozonated water of a second concentration is supplied to a first process tool. Ozonated water from the ozonated water generator is supplied to a second process tool while supplying the ozonated water of the second concentration to the first process tool.Type: ApplicationFiled: September 10, 2004Publication date: February 10, 2005Applicant: Applied Science and Technology, Inc.Inventors: Jens Fittkau, Johannes Seiwert, Christiane Gottschalk
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Patent number: 6805791Abstract: The invention features an apparatus and a method for supplying ozonated water to more than one process tool. Ozonated water of a first concentration received from an ozonated water generator and water received from a source are mixed to produce ozonated water of a second concentration. The ozonated water of a second concentration is supplied to a first process tool. Ozonated water from the ozonated water generator is supplied to a second process tool while supplying the ozonated water of the second concentration to the first process tool.Type: GrantFiled: April 26, 2002Date of Patent: October 19, 2004Assignee: Applied Science and Technology, Inc.Inventors: Jens Fittkau, Johannes Seiwert, Christiane Gottschalk
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Patent number: 6786976Abstract: The invention relates to a method and system for cleaning semiconductor elements accommodated in a tank which uses ozonized, deionized (DI) ultrapure water. According to the invention, ozone is generated in an ozone generator (3) according to the principal of silent electric discharge while admitting highly pure oxygen. Said ozone is fed to a contactor (7) through which DI water flows. The ozone is then dissolved in the DI water. While optionally admitting additional chemicals, the ozonized DI water is conducted through the tank (12) holding the semiconductor elements in order to clean the same, and the used DI water is carried away (15). In order to stabilize the ozone concentration, CO2 is added to the ozone/oxygen mixture generated by the ozone generator (7).Type: GrantFiled: February 15, 2001Date of Patent: September 7, 2004Assignee: Applied Science and Technology, Inc.Inventors: Christiane Gottschalk, Jürgen Schweckendiek, Ulrich Brammer