Patents by Inventor Christianus De Mol

Christianus De Mol has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20060033898
    Abstract: A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
    Type: Application
    Filed: August 17, 2005
    Publication date: February 16, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Theodorus Cadee, Johannes Jacobs, Nicolaas Kate, Erik Loopstra, Aschwin Lodewijk Vermeer, Jeroen Maria Mertens, Christianus De Mol, Marcel Hubertus Muitjens, Antonius Van Der Net, Joost Ottens, Johannes Quaedackers, Maria Reuhman-Huisken, Marco Stavenga, Patricius Tinnemans, Martinus Verhagen, Jacobus Johannus Hendricus Verspay, Frederik De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Smeets, Bart Schoondermark, Franciscus Janssen, Michel Riepen
  • Lithographic apparatus, method of substrate identification, device manufacturing method, substrate, and computer program
    Publication number: 20050195378
    Abstract: In a method according to an embodiment of the invention, substrate identification is performed by comparing the measured distance between two features on an unidentified substrate with one or more stored distances. The one or more stored distances are the distances intended during the design of one or more substrates. The unidentified substrate is identified by a stored distance that corresponds to the measured distance.
    Type: Application
    Filed: March 2, 2004
    Publication date: September 8, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Michael Van Der Veen, Christianus De Mol
  • Method of characterization, method of characterizing a process operation, and device manufacturing method
    Publication number: 20050031975
    Abstract: A system in which deformation of a substrate wafer is monitored during processing of the wafer is disclosed. In one embodiment, the distortion in the substrate wafer is measured after each exposure and processing operation by comparing the position of a plurality of reference marks to values in a database.
    Type: Application
    Filed: May 13, 2004
    Publication date: February 10, 2005
    Applicant: ASML Netherlands B. V.
    Inventors: Maria Reuhman-Huisken, Christianus De Mol, Hoite Tolsma