Patents by Inventor Christianus Wilhelmus Johanne BERENDSEN
Christianus Wilhelmus Johanne BERENDSEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240085796Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.Type: ApplicationFiled: October 16, 2023Publication date: March 14, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Dzmitry LABETSKI, Christianus Wilhelmus Johannes BERENDSEN, Rui Miguel DUARTE RODRIGUES NUNES, Alexander Igorevich ERSHOV, Kornelis Frits FEENSTRA, Igor Vladimirovich FOMENKOV, Klaus Martin HUMMLER, Arun JOHNKADAKSHAM, Matthias KRAUSHAAR, Andrew David LAFORGE, Marc Guy LANGLOIS, Maksim LOGINOV, Yue MA, Seyedmohammad MOJAB, Kerim NADIR, Alexander SHATALOV, John Tom STEWART, Henricus Gerardus TEGENBOSCH, Chunguang XIA
-
Publication number: 20230418165Abstract: Disclosed herein is a fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus whereby a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system comprising: a damper arranged between a first extraction member and a second extraction member both configured to extract fluid; wherein the damper is configured to support a meniscus of the immersion liquid between a surface of the damper and the surface of the substrate.Type: ApplicationFiled: October 22, 2021Publication date: December 28, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Cornelius Maria ROPS, Erik, Henricus Egidius, Catharina EUMMELEN, Giovanni, Luca GATTOBIGIO, Christianus, Wilhelmus Johannes BERENDSEN
-
Patent number: 11822252Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.Type: GrantFiled: January 22, 2021Date of Patent: November 21, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Dzmitry Labetski, Christianus Wilhelmus Johannes Berendsen, Rui Miguel Duarte Rodreigues Nunes, Alexander Igorevich Ershov, Kornelis Frits Feenstra, Igor Vladimirovich Fomenkov, Klaus Martin Hummler, Arun Johnkadaksham, Matthias Kraushaar, Andrew David Laforge, Marc Guy Langlois, Maksim Loginov, Yue Ma, Seyedmohammad Mojab, Kerim Nadir, Alexander Shatalov, John Tom Stewart, Henricus Gerardus Tegenbosch, Chunguang Xia
-
Publication number: 20230333480Abstract: A fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus so that a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system including a replaceable plate with an outer surface that includes a plurality of fluid openings configured for supply and/or extraction of immersion liquid and/or gas in a channel between the fluid handling system and the substrate, wherein the outer surface is coated.Type: ApplicationFiled: November 25, 2021Publication date: October 19, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Christianus Wilhelmus Johannes BERENDSEN, Theodorus Wilhelmus POLET, Erik Henricus Egidius Catharina EUMMELEN, Giovanni Luca GATTOBIGIO, Koen CUYPERS
-
Publication number: 20230259037Abstract: A lithographic apparatus has a substrate holder configured to hold a substrate and a projection system configured to project a radiation beam onto the substrate held by the substrate holder. There is also a fluid handling system configured to confine immersion liquid to a space between a part of the projection system and a surface of the substrate so that the radiation beam can irradiate the surface of the substrate by passing through the immersion liquid. An excitation device is provided to generate surface acoustic waves in the substrate and propagating toward the immersion liquid.Type: ApplicationFiled: June 14, 2021Publication date: August 17, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Cornelius Maria ROPS, Christianus Wilhelmus Johannes BERENDSEN, Erik Henricus Egidius Catharina EUMMELEN, Dagmar Antoinette WISMEIJER
-
Patent number: 11720032Abstract: A process tool for processing production substrates, the process tool including: a movable stage configured to perform long-stroke movements in an X-Y plane; an imaging device mounted to a fixed part of the tool and having an optical axis substantially parallel to the X-Y plane; and a mirror mounted on the movable stage and oriented at a predetermined angle of inclination to the X-Y plane so that by moving the movable stage to a predetermined position a part of a component to be inspected can be imaged by the imaging device.Type: GrantFiled: August 30, 2019Date of Patent: August 8, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Raphael Nico Johan Stegen, Erik Henricus Egidius Catharina Eummelen, Christianus Wilhelmus Johannes Berendsen, Theodorus Wilhelmus Polet, Giovanni Luca Gattobigio
-
Publication number: 20210349397Abstract: A process tool for processing production substrates, the process tool including: a movable stage configured to perform long-stroke movements in an X-Y plane; an imaging device mounted to a fixed part of the tool and having an optical axis substantially parallel to the X-Y plane; and a mirror mounted on the movable stage and oriented at a predetermined angle of inclination to the X-Y plane so that by moving the movable stage to a predetermined position a part of a component to be inspected can be imaged by the imaging device.Type: ApplicationFiled: August 30, 2019Publication date: November 11, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Raphael Nico Johan STEGEN, Erik Henricus Egidius Catharina EUMMELEN, Christianus Wilhelmus Johannes BERENDSEN, Theodorus Wilhelmus POLET, Giovanni Luca GATTOBIGIO
-
Publication number: 20210141311Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.Type: ApplicationFiled: January 22, 2021Publication date: May 13, 2021Inventors: Dzmitry LABETSKI, Christianus Wilhelmus Johannes BERENDSEN, Rui Miguel DUARTE RODRIGUES NUNES, Alexander Igorevich ERSHOV, Kornelis Frits FEENSTRA, Igor Vladimirovich FOMENKOV, Klaus Martin HUMMLER, Arun JOHNKADAKSHAM, Matthias KRAUSHAAR, Andrew David LAFORGE, Marc Guy LANGLOIS, Maksim LOGINOV, Yue MA, Seyedmohammad MOJAB, Kerim NADIR, Alexander SHATALOV, John Tom STEWART, Henricus Gerardus TEGENBOSCH, Chunguang XIA
-
Patent number: 10955749Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.Type: GrantFiled: January 5, 2018Date of Patent: March 23, 2021Assignee: ASML Netherlands B.V.Inventors: Dzmitry Labetski, Christianus Wilhelmus Johannes Berendsen, Rui Miguel Duarte Rodriges Nunes, Alexander Igorevich Ershov, Kornelis Frits Feenstra, Igor Vladimirovich Fomenkov, Klaus Martin Hummler, Arun Johnkadaksham, Matthias Kraushaar, Andrew David Laforge, Marc Guy Langlois, Maksim Loginov, Yue Ma, Seyedmohammad Mojab, Kerim Nadir, Alexander Shatalov, John Tom Stewart, IV, Henricus Gerardus Tegenbosch, Chunguang Xia
-
Patent number: 10948825Abstract: A method of processing a substrate includes: providing a substrate with a layer of photosensitive material on a surface of the substrate; and removing at least part of the photosensitive material from around an outer edge of the layer of photosensitive material so as to generate an edge, having a radial width, around the layer of photosensitive material remaining on the surface of the substrate, wherein the photosensitive material varies in thickness forming a thickness profile across the radial width and the removing is controlled so as to generate variation in the thickness profile along the length of the edge, and/or wherein the removing is controlled so as to generate a rough edge around the layer of photosensitive material remaining on the surface of the substrate.Type: GrantFiled: December 22, 2016Date of Patent: March 16, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Christianus Wilhelmus Johannes Berendsen, Güneş Nakibo{hacek over (g)}lu, Daan Daniel Johannes Antonius Van Sommeren, Gijsbert Rispens, Johan Franciscus Maria Beckers, Theodorus Johannes Antonius Renckens
-
Publication number: 20200166845Abstract: A method of processing a substrate includes: providing a substrate with a layer of photosensitive material on a surface of the substrate; and removing at least part of the photosensitive material from around an outer edge of the layer of photosensitive material so as to generate an edge, having a radial width, around the layer of photosensitive material remaining on the surface of the substrate, wherein the photosensitive material varies in thickness forming a thickness profile across the radial width and the removing is controlled so as to generate variation in the thickness profile along the length of the edge, and/or wherein the removing is controlled so as to generate a rough edge around the layer of photosensitive material remaining on the surface of the substrate.Type: ApplicationFiled: December 22, 2016Publication date: May 28, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Christianus Wilhelmus Johannes BERENDSEN, Günes NAKIBOGLU, Daan Daniel Johannes Antonius VAN SOMMEREN, Gijsbert RISPENS, Johan Franciscus Maria BECKERS, Theodorus Johannes Antonius RENCKENS
-
Publication number: 20200089124Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.Type: ApplicationFiled: January 5, 2018Publication date: March 19, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Dzmitry LABETSKI, Christianus Wilhelmus Johanne BERENDSEN, Rui Miguel DUARTE RODRIGES NUNES, Alexander Igorevich ERSHOV, Kornelis Frits FEENSTRA, Igor Vladimirovich FOMENKOV, Klaus Martin HUMMLER, Arun JOHNKADAKSHAM, Matthias KRAUSHAAR, Andrew David LAFORGE, Marc Guy LANGLOIS, Maksim LOGINOV, Yue MA, Seyedmohammad MOJAB, Kerim NADIR, Alexander SHATALOV, John Tom STEWART (IV), Henricus Gerardus TEGENBOSCH, Chunguang XIA
-
Patent number: 10216095Abstract: An immersion lithographic apparatus is configured to subject a photosensitive layer on a substrate to a patterned beam of radiation via a liquid. The immersion lithographic apparatus includes a moveable object having a surface, a fluid handling system to control a presence of the liquid in a volume restricted by the surface, the fluid handling system, and a free surface of the liquid, the free surface extending between the surface and the fluid handling system; and a heating system configured to locally heat a portion of the liquid at a receding side of a periphery edge of the volume in contact with the surface, where the object is receding from the volume along a direction of movement of the object relative to the fluid handling system.Type: GrantFiled: July 22, 2014Date of Patent: February 26, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Michel Riepen, Christianus Wilhelmus Johannes Berendsen, Anton Alexander Darhuber, Hubertus Mattheus Joseph Maria Wedershoven, Josephus Catharina Henricus Zeegers
-
Patent number: 10018926Abstract: A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.Type: GrantFiled: May 7, 2015Date of Patent: July 10, 2018Assignee: ASML NETHERLANDS, B.V.Inventors: Rogier Hendrikus Magdalena Cortie, Christianus Wilhelmus Johannes Berendsen, Andre Bernardus Jeunink, Adrianus Hendrik Koevoets, Jim Vincent Overkamp, Siegfried Alexander Tromp, Van Vuong Vy, Daniel Elza Roeland Audenaerdt
-
Patent number: 9983489Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.Type: GrantFiled: April 24, 2015Date of Patent: May 29, 2018Assignee: ASML Netherlands B.V.Inventors: Christianus Wilhelmus Johannes Berendsen, Marcel Beckers, Henricus Jozef Castelijns, Hubertus Antonius Geraets, Adrianus Hendrik Koevoets, Leon Martin Levasier, Peter Schaap, Bob Streefkerk, Siegfried Alexander Tromp
-
Patent number: 9939738Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two-phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation.Type: GrantFiled: July 16, 2015Date of Patent: April 10, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Adrianus Hendrik Koevoets, Christianus Wilhelmus Johannes Berendsen, Rogier Hendrikus Magdalena Cortie, Jim Vincent Overkamp, Patricius Jacobus Neefs, Putra Saputra, Ruud Hendrikus Martinus Johannes Bloks, Michael Johannes Hendrika Wilhelmina Renders, Johan Gertrudis Cornelis Kunnen, Thibault Simon Mathieu Laurent
-
Publication number: 20170212429Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two- phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation.Type: ApplicationFiled: July 16, 2015Publication date: July 27, 2017Applicant: ASML Netherlands B.V.Inventors: Adrianus Hendrik KOEVOETS, Christianus Wilhelmus Johannes BERENDSEN, Rogier Hendrikus Magdalena CORTIE, Jim Vincent OVERKAMP, Patricius Jacobus NEEFS, Putra SAPUTRA, Ruud Hendrikus Martinus Johannes BLOKS, Michael Johannes Hendrika Wilhelmina RENDERS, Johan Gertrudis Cornelis KUNNEN, Thibault Simon Mathieu LAURENT
-
Publication number: 20170115578Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.Type: ApplicationFiled: April 24, 2015Publication date: April 27, 2017Applicant: ASML Netherlands B.V.Inventors: Christianus Wilhelmus Johannes BERENDSEN, Marcel BECKERS, Henricus Jozef CASTELIJNS, Hubertus Antonius GERAETS, Adrianus Hendrik KOEVOETS, Leon Martin LEVASIER, Peter SCHAAP, Bob STREEFKERK, Siegfried Alexander TROMP
-
Publication number: 20160195821Abstract: An immersion lithographic apparatus is configured to subject a photosensitive layer on a substrate to a patterned beam of radiation via a liquid. The immersion lithographic apparatus includes a moveable object having a surface, a fluid handling system to control a presence of the liquid in a volume restricted by the surface, the fluid handling system, and a free surface of the liquid, the free surface extending between the surface and the fluid handling system; and a heating system configured to locally heat a portion of the liquid at a receding side of a periphery edge of the volume in contact with the surface, where the object is receding from the volume along a direction of movement of the object relative to the fluid handling system.Type: ApplicationFiled: July 22, 2014Publication date: July 7, 2016Applicant: ASML Netherlands B.V.Inventors: Michel RIEPEN, Christianus Wilhelmus Johanne BERENDSEN, Anton Alexander DARHUBER, Hubertus Mattheus Joseph M WEDERSHOVEN, Josephus Catharina Henricus ZEEGERS
-
Patent number: RE49142Abstract: A lithographic apparatus comprising includes an object table which carries an object. The lithographic apparatus may further comprise at least one include a sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the a deformation of the an object due to a varying loads load during operation of the lithographic apparatus, for example a varying loads load induced by a two-phase flow in a channel formed within of the object table. Additionally, or alternatively, the The lithographic apparatus comprises may include a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation.Type: GrantFiled: October 2, 2019Date of Patent: July 19, 2022Assignee: ASML Netherlands B.V.Inventors: Adrianus Hendrik Koevoets, Christianus Wilhelmus Johannes Berendsen, Rogier Hendrikus Magdalena Cortie, Jim Vincent Overkamp, Patricius Jacobus Neefs, Putra Saputra, Ruud Hendrikus Martinus Johannes Bloks, Michael Johannes Hendrika Wilhelmina Renders, Johan Gertrudis Cornelis Kunnen, Thibault Simon Mathieu Laurent