Patents by Inventor Christof Riedesel
Christof Riedesel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240079207Abstract: A multi-beam charged particle system and a method of setting a working distance WD of the multi beam charged particle system are provided. With the method, the working distance is adjusted while the imaging performance of a wafer inspection task is maintained by computing parameter values of components from predetermined calibration parameter values. The method can allow a relatively fast wafer inspection task even with a wafer stage with a fixed z-position parallel to an optical axis of the multi-beam charged particle system.Type: ApplicationFiled: November 6, 2023Publication date: March 7, 2024Inventors: Michael Behnke, Ulrich Bihr, Christof Riedesel, Arne Thoma, Dirk Zeidler
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Patent number: 11728130Abstract: A method, including: recording plural images of an object by scanning plural particle beams across the object and detecting signals generated by the particle beams, wherein the plural particle beams are generated by a multi-beam particle microscope; determining plural regions of interest; determining plural image regions in each of the recorded images; determining plural displacement vectors; and determining image distortions based on image data of the recorded images and the determined displacement vectors.Type: GrantFiled: April 1, 2021Date of Patent: August 15, 2023Assignee: Carl Zeiss SMT GmbHInventors: Dirk Zeidler, Thomas Korb, Philipp Huethwohl, Jens Timo Neumann, Christof Riedesel, Christian Wojek, Joaquin Correa, Wolfgang Hoegele
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Method for detector equalization during the imaging of objects with a multi-beam particle microscope
Patent number: 11645740Abstract: A method for detector equalization during the imaging of objects with a multi-beam particle microscope includes performing an equalization on the basis of individual images in or on the basis of overlap regions. For detector equalization, contrast values and/or brightness values are used and iterative methods can be employed.Type: GrantFiled: March 4, 2021Date of Patent: May 9, 2023Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Michael Behnke, Stefan Schubert, Christof Riedesel -
Patent number: 11562881Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.Type: GrantFiled: October 28, 2021Date of Patent: January 24, 2023Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Stefan Schubert, Ingo Mueller, Joerg Jacobi, Mario Muetzel, Antonio Casares, Christof Riedesel
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Publication number: 20220392734Abstract: Certain improvements of multi-beam raster units such as multi-beam generating units and multi-beam deflector units of a multi-beam charged particle microscopes are provided. The improvements include design, fabrication and adjustment of multi-beam raster units including apertures of specific shape and dimensions. The improvements can enable multi-beam generation and multi-beam deflection or stigmation with higher precision. The improvements can be relevant for routine applications of multi-beam charged particle microscopes, for example in semiconductor inspection and review, where high reliability and high reproducibility and low machine-to-machine deviations are desirable.Type: ApplicationFiled: August 18, 2022Publication date: December 8, 2022Inventors: Yanko Sarov, Ulrich Bihr, Hans Fritz, Dirk Zeidler, Georg Kurij, Ralf Lenke, AndrĂ¡s G. Major, Christof Riedesel
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Publication number: 20220351936Abstract: A multi-beam charged particle microscope and a method of operating a multi-beam charged particle microscope for wafer inspection with high throughput and with high resolution and high reliability are provided. The method of operation and the multi-beam charged particle beam microscope comprises a mechanism for a synchronized scanning operation and image acquisition by a plurality of charged particle beamlets according a selected scan program, wherein the selected scan program can be selected according an inspection task from different scan programs.Type: ApplicationFiled: July 19, 2022Publication date: November 3, 2022Inventors: Nicolas Kaufmann, Andreas Adolf, Volker Wieczorek, Nico Kaemmer, Christof Riedesel, Stefan Schubert
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Publication number: 20220246388Abstract: A multiple particle beam microscope and an associated method set a desired focal plane with an optical resolution and set a telecentric irradiation with the plurality of the primary beams. A method determines an optimal setting plane, into which an object surface is brought. Further, a system provides an improved resolution and telecentric irradiation for a large number of primary beams. Targeted selection and targeted individual influencing of individual primary beams and/or a mechanism means for influencing the plurality of primary beams in collective fashion can be implemented.Type: ApplicationFiled: January 24, 2022Publication date: August 4, 2022Inventors: Nicole Rauwolf, Nico Kaemmer, Michael Behnke, Ingo Mueller, Dirk Zeidler, Arne Thoma, Christof Riedesel, Gunther Scheunert
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Publication number: 20220108864Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.Type: ApplicationFiled: October 28, 2021Publication date: April 7, 2022Inventors: Dirk Zeidler, Stefan Schubert, Ingo Mueller, Joerg Jacobi, Mario Muetzel, Antonio Casares, Christof Riedesel
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Patent number: 11239054Abstract: A multi-beam particle beam system includes a multi-aperture plate having a multiplicity of apertures. During operation, one particle beam of the plurality of particle beams passes through each of the apertures. A multiplicity of electrodes are insulated from the second multi-aperture plate to influence the particle beam passing through the aperture. A voltage supply system for the electrodes includes: a signal a generator to generate a serial sequence of digital signals; a D/A converter to convert the digital signals into a sequence of voltages between an output of the D/A converter and the multi-aperture plate; and a controllable changeover system, which feeds the sequence of voltages successively to different electrodes.Type: GrantFiled: November 16, 2020Date of Patent: February 1, 2022Assignee: Carl Zeiss MultiSEM GmbHInventors: Yanko Sarov, Jan Horn, Ulrich Bihr, Christof Riedesel, Erik Essers
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Patent number: 11164715Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.Type: GrantFiled: September 15, 2020Date of Patent: November 2, 2021Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Stefan Schubert, Ingo Mueller, Joerg Jacobi, Mario Muetzel, Antonio Casares, Christof Riedesel
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Publication number: 20210296089Abstract: A method, including: recording plural images of an object by scanning plural particle beams across the object and detecting signals generated by the particle beams, wherein the plural particle beams are generated by a multi-beam particle microscope; determining plural regions of interest; determining plural image regions in each of the recorded images; determining plural displacement vectors; and determining image distortions based on image data of the recorded images and the determined displacement vectors.Type: ApplicationFiled: April 1, 2021Publication date: September 23, 2021Inventors: Dirk Zeidler, Thomas Korb, Philipp Huethwohl, Jens Timo Neumann, Christof Riedesel, Christian Wojek, Joaquin Correa, Wolfgang Hoegele
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Patent number: 11087948Abstract: A multi-beam charged particle system includes: a vacuum enclosure having an opening covered by a door; a particle source configured to generate charged particles, wherein the particle source is arranged within the vacuum enclosure; at least one multi-aperture plate module including at least one multi-aperture plate and a base; and a transfer box having an opening covered by a door. The at least one multi-aperture plate includes a plurality of apertures. The base is configured to hold the at least one multi-aperture plate. The base is configured to be fixed relative to the vacuum enclosure such that the multi-aperture plate module is arranged in an interior of the vacuum enclosure such that, during operation of the particle beam system, particles traverse the plural multi-aperture plates through the apertures of the plates.Type: GrantFiled: July 28, 2020Date of Patent: August 10, 2021Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Thomas Kemen, Christof Riedesel, Ralf Lenke, Joerg Jacobi
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Publication number: 20210217577Abstract: A method of operating a multi-beam particle beam system includes: generating a multiplicity of particle beams such that they each pass through multipole elements that are either intact or defective; focusing the particle beams in a predetermined plane; determining excitations for the deflection elements of the multipole elements; exciting the deflection elements of the multipole elements that are intact with the determined excitations; modifying the determined excitations for the deflection elements of the multipole elements that are defective; and exciting the deflection elements of the defective multipole elements with the modified excitations. Modifying the determined excitations includes adding corrective excitations to the determined excitations. The corrective excitations are the same for all deflection elements of the defective multipole element.Type: ApplicationFiled: March 29, 2021Publication date: July 15, 2021Inventors: Dirk Zeidler, Christof Riedesel, Arne Thoma, Georgo Metalidis, Joerg Jacobi, Stefan Schubert, Ralf Lenke, Ulrich Bihr, Yanko Sarov, Georg Kurij
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Publication number: 20210192700Abstract: A method for detector equalization during the imaging of objects with a multi-beam particle microscope includes performing an equalization on the basis of individual images in or on the basis of overlap regions. For detector equalization, contrast values and/or brightness values are used and iterative methods can be employed.Type: ApplicationFiled: March 4, 2021Publication date: June 24, 2021Inventors: Dirk Zeidler, Michael Behnke, Stefan Schubert, Christof Riedesel
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Publication number: 20210066037Abstract: A multi-beam particle beam system includes a multi-aperture plate having a multiplicity of apertures. During operation, one particle beam of the plurality of particle beams passes through each of the apertures. A multiplicity of electrodes are insulated from the second multi-aperture plate to influence the particle beam passing through the aperture. A voltage supply system for the electrodes includes: a signal a generator to generate a serial sequence of digital signals; a D/A converter to convert the digital signals into a sequence of voltages between an output of the D/A converter and the multi-aperture plate; and a controllable changeover system, which feeds the sequence of voltages successively to different electrodes.Type: ApplicationFiled: November 16, 2020Publication date: March 4, 2021Inventors: Yanko Sarov, Jan Horn, Ulrich Bihr, Christof Riedesel, Erik Essers
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Publication number: 20200411274Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.Type: ApplicationFiled: September 15, 2020Publication date: December 31, 2020Inventors: Dirk Zeidler, Stefan Schubert, Ingo Mueller, Joerg Jacobi, Mario Muetzel, Antonio Casares, Christof Riedesel
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Patent number: 10854423Abstract: A multi-beam particle beam system includes a multi-aperture plate having a multiplicity of apertures. During operation, one particle beam of the plurality of particle beams passes through each of the apertures. A multiplicity of electrodes are insulated from the second multi-aperture plate to influence the particle beam passing through the aperture. A voltage supply system for the electrodes includes: a signal a generator to generate a serial sequence of digital signals; a D/A converter to convert the digital signals into a sequence of voltages between an output of the D/A converter and the multi-aperture plate; and a controllable changeover system, which feeds the sequence of voltages successively to different electrodes.Type: GrantFiled: February 15, 2019Date of Patent: December 1, 2020Assignee: Carl Zeiss MultiSEM GmbHInventors: Yanko Sarov, Jan Horn, Ulrich Bihr, Christof Riedesel, Erik Essers
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Publication number: 20200357600Abstract: A multi-beam charged particle system includes: a vacuum enclosure having an opening covered by a door; a particle source configured to generate charged particles, wherein the particle source is arranged within the vacuum enclosure; at least one multi-aperture plate module including at least one multi-aperture plate and a base; and a transfer box having an opening covered by a door. The at least one multi-aperture plate includes a plurality of apertures. The base is configured to hold the at least one multi-aperture plate. The base is configured to be fixed relative to the vacuum enclosure such that the multi-aperture plate module is arranged in an interior of the vacuum enclosure such that, during operation of the particle beam system, particles traverse the plural multi-aperture plates through the apertures of the plates.Type: ApplicationFiled: July 28, 2020Publication date: November 12, 2020Inventors: Dirk Zeidler, Thomas Kemen, Christof Riedesel, Ralf Lenke, Joerg Jacobi
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Patent number: 10811215Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.Type: GrantFiled: May 20, 2019Date of Patent: October 20, 2020Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Stefan Schubert, Ingo Mueller, Joerg Jacobi, Mario Muetzel, Antonio Casares, Christof Riedesel
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Patent number: 10741355Abstract: A multi-beam charged particle system includes: a vacuum enclosure having an opening covered by a door; a particle source configured to generate charged particles, wherein the particle source is arranged within the vacuum enclosure; at least one multi-aperture plate module including at least one multi-aperture plate and a base; and a transfer box having an opening covered by a door. The at least one multi-aperture plate includes a plurality of apertures. The base is configured to hold the at least one multi-aperture plate. The base is configured to be fixed relative to the vacuum enclosure such that the multi-aperture plate module is arranged in an interior of the vacuum enclosure such that, during operation of the particle beam system, particles traverse the plural multi-aperture plates through the apertures of the plates.Type: GrantFiled: February 4, 2019Date of Patent: August 11, 2020Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Thomas Kemen, Christof Riedesel, Ralf Lenke, Joerg Jacobi