Patents by Inventor Christoph Daube
Christoph Daube has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230170580Abstract: Implementations of the present disclosure generally relate to separators, high performance electrochemical devices, such as, batteries and capacitors, including the aforementioned separators, systems and methods for fabricating the same. In one implementation, a separator is provided. The separator comprises a polymer substrate, capable of conducting ions, having a first surface and a second surface opposing the first surface. The separator further comprises a first ceramic-containing layer, capable of conducting ions, formed on the first surface. The first ceramic-containing layer has a thickness in a range from about 1,000 nanometers to about 5,000 nanometers. The separator further comprises a second ceramic-containing layer, capable of conducting ions, formed on the second surface. The second ceramic-containing layer is a binder-free ceramic-containing layer and has a thickness in a range from about 1 nanometer to about 1,000 nanometers.Type: ApplicationFiled: January 25, 2023Publication date: June 1, 2023Inventors: Connie P. WANG, Wen SI, Yin Let SIM, Torsten DIETER, Roland TRASSL, Subramanya P. HERLE, Christoph DAUBE, Jian ZHU, James CUSHING
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Publication number: 20230170581Abstract: Implementations of the present disclosure generally relate to separators, high performance electrochemical devices, such as, batteries and capacitors, including the aforementioned separators, systems and methods for fabricating the same. In one implementation, a separator is provided. The separator comprises a polymer substrate, capable of conducting ions, having a first surface and a second surface opposing the first surface. The separator further comprises a first ceramic-containing layer, capable of conducting ions, formed on the first surface. The first ceramic-containing layer has a thickness in a range from about 1,000 nanometers to about 5,000 nanometers. The separator further comprises a second ceramic-containing layer, capable of conducting ions, formed on the second surface. The second ceramic-containing layer is a binder-free ceramic-containing layer and has a thickness in a range from about 1 nanometer to about 1,000 nanometers.Type: ApplicationFiled: January 25, 2023Publication date: June 1, 2023Inventors: Connie P. WANG, Wen SI, Yin Let SIM, Torsten DIETER, Roland TRASSL, Subramanya P. HERLE, Christoph DAUBE, Jian ZHU, James CUSHING
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Patent number: 11588209Abstract: Separators, high performance electrochemical devices, such as, batteries and capacitors, including the aforementioned separators, systems and methods for fabricating the same. In one implementation, a separator is provided. The separator comprises a polymer substrate (131), capable of conducting ions, having a first surface and a second surface opposing the first surface. The separator further comprises a first ceramic-containing layer (136), capable of conducting ions, formed on the first surface. The first ceramic-containing layer (136) has a thickness in arrange from about 1,000 nanometers to about 5000 nanometers. The separator further comprises a second ceramic-containing layer (138), capable of conducting ions, formed on the second surface. The second ceramic-containing layer (138) is a binder-free ceramic-containing layer and has a thickness in arrange from about 1 nanometer to about 1,000 nanometers.Type: GrantFiled: August 21, 2018Date of Patent: February 21, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Connie P. Wang, Wen Si, Yin Let Sim, Torsten Dieter, Roland Trassl, Subramanya P. Herle, Christoph Daube, Jian Zhu, James Cushing
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Publication number: 20210328308Abstract: Separators, high performance electrochemical devices, such as, batteries and capacitors, including the aforementioned separators, systems and methods for fabricating the same. In one implementation, a separator is provided. The separator comprises a polymer substrate (131), capable of conducting ions, having a first surface and a second surface opposing the first surface. The separator further comprises a first ceramic-containing layer (136), capable of conducting ions, formed on the first surface. The first ceramic-containing layer (136) has a thickness in arrange from about 1,000 nanometers to about 5000 nanometers. The separator further comprises a second ceramic-containing layer (138), capable of conducting ions, formed on the second surface. The second ceramic-containing layer (138) is a binder-free ceramic-containing layer and has a thickness in arrange from about 1 nanometer to about 1,000 nanometers.Type: ApplicationFiled: August 21, 2018Publication date: October 21, 2021Inventors: Connie P. WANG, Wen SI, Yin Let SIM, Torsten DIETER, Roland TRASSL, Subramanya P. HERLE, Christoph DAUBE, Jian ZHU, James CUSHING
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Patent number: 6740207Abstract: Sparking is suppressed during high-frequency sputtering by a high-frequency generator (5) which has a controlled switching unit (13) that is connected upstream in relation to the output of the generator. A high-frequency supply signal that is generated at the output of the high-frequency generator is stopped for plasma discharge (PL) for a short time, by the switching unit.Type: GrantFiled: March 28, 2002Date of Patent: May 25, 2004Assignee: Unaxis Deutschland GmbHInventors: Andreas Kloeppel, Christoph Daube, Johannes Stollenwerk, Thomas Linz
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Patent number: 6676814Abstract: A method for manufacturing a display panel substrate has the steps of flowing a working gas along and out of a slit defined between two sputtering targets of Mg and toward the substrate thereby selecting the purity of the Mg material of the targets to be at least 99% and thereby blowing sputtered-off material out of the slit and toward the substrate. Introduction, in an area between the slit and the substrate, of a reactive gas containing oxygen, follows, and reacting the sputtered-off material with the reactive gas results in depositing on the substrate, an MgO layer. The method also includes setting the temperature of the substrate during the coating process.Type: GrantFiled: October 13, 2000Date of Patent: January 13, 2004Assignee: Unaxis Trading AGInventors: Johannes Stollenwerk, Christoph Daube, Achim Gürke
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Publication number: 20030201173Abstract: A coating apparatus has two Mg-targets mutually defining a slit and with a target Mg material purity of at least 99%. An anode arrangement and a gas inlet arrangement are adjacent a first end area of the slit, the gas inlet arrangement being connected to a gas tank arrangement with a working gas. The apparatus has a substrate carrier and conveying arrangement with which a planar substrate is movable across and distant from a second slit end area opposite the first end area and a further gas inlet arrangement is situated between the second slit end area and the substrate carrier and conveying arrangement and is connected to a gas tank arrangement containing oxygen.Type: ApplicationFiled: May 1, 2003Publication date: October 30, 2003Applicant: Balzers Hochvakuum AGInventors: Johannes Stollenwerk, Christoph Daube, Achim Gurke
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Patent number: 6623607Abstract: A method and apparatus for producing a substrate which is coated with a Mgo-layer, includes a pair of Mg targets which define a slit and which have a target purity of at least 99 percent. A working gas flows along the slit. Oxygen is provided in an area between the slit and the substrate to be coated. The temperature of the substrate is set by heating or cooling the substrate during the coating process.Type: GrantFiled: December 5, 1997Date of Patent: September 23, 2003Assignee: Balzers Hochvakuum AGInventors: Johannes Stollenwerk, Christoph Daube, Achim Gürke
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Publication number: 20020104753Abstract: The aim of the invention is to suppress sparking during high-frequency sputtering. A high-frequency generator (5) is provided which has a controlled switching unit (13) that is connected upstream in relation to the output of said generator. A high-frequency supply signal that is generated at the output of the high-frequency generator is stopped for plasma discharge (PL) for a short time and by means of said switching unit.Type: ApplicationFiled: March 28, 2002Publication date: August 8, 2002Inventors: Andreas Kloeppel, Christoph Daube, Johannes Stollenwerk, Thomas Linz
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Patent number: 6150030Abstract: A substrate coated has at least one MgO-layer and an extent of at least 100 mm.times.100 mm. The layer has a predominant peak in the measuring diagram of the .THETA.-2.THETA.-method and the density of the material of the layer is at least 80% of the density of stoichiometric MgO-bulk material, which is .rho.=3.58 g/cm.sup.3.Type: GrantFiled: December 2, 1998Date of Patent: November 21, 2000Assignee: Balzers Hochvakuum AGInventors: Johannes Stollenwerk, Christoph Daube, Achim Gurke
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Patent number: 5510012Abstract: For the production of a coating formed by cathode sputtering, a target made from an alloy of gold and preferably vanadium is used. During the cathode sputtering, nitrogen gas is used as the reactive gas. The result is the formation of vanadium nitrides on the substrate to be coated. By varying the nitrogen content, the proportion of the vanadium nitrides can be changed thereby causing the appearance and the hardness of the coating to also change. This change in coating characteristics can accommodate a broad range of requirements avoiding the necessity of using different targets for different coating characteristics.Type: GrantFiled: May 27, 1992Date of Patent: April 23, 1996Assignee: Leybold AktiengesellschaftInventors: Siegfried Schulz, Christoph Daube, Alfred Belz, Andreas Rack
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Patent number: 5407548Abstract: The invention concerns a process for coating a substrate 1 of little or no corrosion resistance, especially a metal substrate having an alloy consisting at least of Ni, Cr and Fe, in an evacuable coating chamber 15, 15a. It comprises making an electrode that can be connected to a current supply 10, this electrode being electrically connected to a target 3 which is sputtered and the sputtered particles of which are deposited on the substrate 1. Reactive process gases are, for this purpose, supplied to the coating chamber 15, 15a, so that an amorphously depositing layer 2 is applied onto the substrate.Type: GrantFiled: April 29, 1993Date of Patent: April 18, 1995Assignees: Leybold Aktiengesellschaft, Degussa AktiengesellschaftInventors: Uwe Kopacz, Christoph Daube, Andreas Rack, Horst Becker, Uwe Konietzka, Martin Weigert
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Patent number: 5283435Abstract: An apparatus for determining the concentration of a gas in a vacuum chamber is described. Internal to the vacuum chamber are one or more cathodes. The chamber is fed via a gas inlet and is connected to a separate measurement chamber for accommodating a measuring device via a connecting line between the two chambers. The connecting line in conjunction with a pumping means produces a pressure gradient between the interior of the vacuum chamber and the interior of the measurement chamber. One end of the connecting line, located within the vacuum chamber terminates directly in the central region of a cathode surfaces facing the interior of the chamber, and the length, as well as the cross section of the connecting line being dimensioned so that the pressure gradient between the interior of the vacuum chamber and the interior of the measurement chamber, is precisely that required for measurement.Type: GrantFiled: May 12, 1992Date of Patent: February 1, 1994Assignee: Leybold AktiengesellschaftInventors: Christoph Daube, Alfred Belz, Uwe Kopacz
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Patent number: 5277778Abstract: Coating of components and shapes by cathode sputtering of target material of a first cathode system (6) with concentration of a first discharge space (plasma cloud) in the vicinity of the target surface by a spatially closed magnetic field (plasma trap) opposite the target (12). The field strength is reduced in front of the target surface by an additional magnet associated with a lateral boundary of the target.Type: GrantFiled: September 5, 1991Date of Patent: January 11, 1994Assignee: Leybold AGInventors: Christoph Daube, Uwe Kopacz, Siegfried Schulz