Abstract: Compositions comprising hydrogenated and dehydrogenated graphite comprising a plurality of flakes. At least one flake in ten has a size in excess of ten square micrometers. For example, the flakes can have an average thickness of 10 atomic layers or less.

Abstract: Compositions comprising hydrogenated and dehydrogenated graphite comprising a plurality of flakes. At least one flake in ten has a size in excess of ten square micrometers. For example, the flakes can have an average thickness of 10 atomic layers or less.

Abstract: Compositions comprising hydrogenated and dehydrogenated graphite comprising a plurality of flakes. At least one flake in ten has a size in excess of ten square micrometers. For example, the flakes can have an average thickness of 10 atomic layers or less.

Abstract: A semi-finished product having a substrate with a first side and an opposite second side is provided, wherein at least one diamond layer is arranged on the first side, wherein the diamond layer comprises monocrystalline diamond and the substrate comprises a material different from the diamond layer. A method for producing such a semi-finished product is provided and an integrated optical component may be produced from the semi-finished product.

Abstract: A method for producing homoepitaxial diamond layers is provided. A substrate comprising diamond and having a first side and an opposite second side is provided, at least the first side having a [100] orientation. Protruding structures are provided on the first side by masking and subsequently etching the substrate. Diamond is deposited from an activated process gas on the first side of the substrate, wherein pyramids are produced around the protruding structures, the side faces of which are at least partially [111]-oriented.

Abstract: Hot metal dissolution of carbon atoms is used to structure a diamond substrate. A layer of catalytic material is deposited on at least a portion of a surface of the diamond substrate. The layer of catalytic material may be structured using photolithography to define a gap exposing the surface of the diamond substrate, where the gap has a (110) orientation relative to the crystal structure of the diamond substrate. The exposed surface of the diamond substrate is etched to form at least one recess having at least one (111) oriented diamond surface (facet). The catalytic material is removed by a suitable cleaning process. The (111) oriented surface is then overgrown with diamond comprising a dopant resulting in a conductivity of the overgrown diamond that is different from the conductivity of the doped substrate. The doping concentration of the overgrown diamond is greater than 1019 cm?3.

Abstract: A substrate holder having a base plate where a plurality of protruding poles is arranged, said poles spaced apart from one another by intermediate spaces. Alternatively or in addition, a plasma reactor for depositing diamond from the gas phase may be provided, the plasma reactor comprising such a substrate holder. A method for depositing diamond from the gas phase may be provided.

Abstract: A semi-finished product having a substrate with a first side and an opposite second side is provided, wherein at least one diamond layer is arranged on the first side, wherein the diamond layer comprises monocrystalline diamond and the substrate comprises a material different from the diamond layer. A method for producing such a semi-finished product is provided and an integrated optical component may be produced from the semi-finished product.

Abstract: An epitaxial diamond layer and a method for the production thereof can be provided that comprises the following steps: providing a substrate; depositing a metal layer on at least a subarea of the substrate, wherein the metal layer contains, or consists of, at least one period 4, 5 or 6 metal having a melting point of greater than or equal to 1200 K; and depositing a diamond layer on at least a subarea of the metal layer; wherein at least one intermediate layer is deposited between the metal layer and the diamond layer and has a higher lattice constant than undoped crystalline diamond and a lower hardness than undoped crystalline diamond.

Abstract: Compositions comprising hydrogenated and dehydrogenated graphite comprising a plurality of flakes. At least one flake in ten has a size in excess of ten square micrometers. For example, the flakes can have an average thickness of 10 atomic layers or less.

Abstract: An epitaxial diamond layer and a method for the production thereof can be provided that comprises the following steps: providing a substrate; depositing a metal layer on at least a subarea of the substrate, wherein the metal layer contains, or consists of, at least one period 4, 5 or 6 metal having a melting point of greater than or equal to 1200 K; and depositing a diamond layer on at least a subarea of the metal layer; wherein at least one intermediate layer is deposited between the metal layer and the diamond layer and has a higher lattice constant than undoped crystalline diamond and a lower hardness than undoped crystalline diamond.

Abstract: A substrate holder having a base plate where a plurality of protruding poles is arranged, said poles spaced apart from one another by intermediate spaces. Alternatively or in addition, a plasma reactor for depositing diamond from the gas phase may be provided, the plasma reactor comprising such a substrate holder. A method for depositing diamond from the gas phase may be provided.

Abstract: An electronic device, particularly a solar cell, comprising a layer (16) of amorphous silicon (a-Si) and at least two layered electrodes (14, 18) each having an interface (20, 22) bordering said a-Si layer, in which at least one of the electrodes (14) is provided with pattern elements (14a) forming a preferably periodic micropattern. The average spacing of the pattern elements is preferably in the order of magnitude of the charge carrier drift lengths and is generally smaller than 1 .mu.m, particularly 50 to 500 nm. The micropattern is produced preferably by the effect of a laser beam interference pattern.