Patents by Inventor Christoph Fetzer

Christoph Fetzer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11175595
    Abstract: A method localizes assembly errors during the arrangement and/or the assembly of in particular vibration-isolated structural elements, in particular of components of optical arrangements, preferably of microlithographic projection exposure apparatuses.
    Type: Grant
    Filed: September 19, 2019
    Date of Patent: November 16, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Thomas Niederhausen, Christoph Fetzer
  • Patent number: 11163239
    Abstract: A method for localizing an abnormality in a travel path of an optical component in or for a lithography apparatus includes: a) moving the optical component in at least one first degree of freedom; b) detecting a movement (Rz) of the optical component and/or a force acting on the optical component in at least one second degree of freedom; and c) localizing the abnormality as a function of the movement detected in b) and/or the force detected in b).
    Type: Grant
    Filed: October 8, 2020
    Date of Patent: November 2, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Frank Treubel, Christoph Fetzer
  • Publication number: 20210026252
    Abstract: A method for localizing an abnormality in a travel path of an optical component in or for a lithography apparatus includes: a) moving the optical component in at least one first degree of freedom; b) detecting a movement (Rz) of the optical component and/or a force acting on the optical component in at least one second degree of freedom; and c) localizing the abnormality as a function of the movement detected in b) and/or the force detected in b).
    Type: Application
    Filed: October 8, 2020
    Publication date: January 28, 2021
    Inventors: Frank Treubel, Christoph Fetzer
  • Publication number: 20200012197
    Abstract: A method localizes assembly errors during the arrangement and/or the assembly of in particular vibration-isolated structural elements, in particular of components of optical arrangements, preferably of microlithographic projection exposure apparatuses.
    Type: Application
    Filed: September 19, 2019
    Publication date: January 9, 2020
    Inventors: Thomas Niederhausen, Christoph Fetzer