Abstract: One aspect of the invention includes a directional coupler having a coupling factor in the forward direction determined from the equation Cf=Cf·ej?Cf, a coupling factor in the reverse direction determined from the equation Cr=Cr·ej?Cr, an isolation in the forward direction determined from the equation If=If·ej?If, and an isolation in the reverse direction determined from the equation Ir=Ir·ej?Ir, wherein at least one condition is met from among the group consisting of: (1) the absolute value of ??=?Cr+?Cf?(?Ir+?If) being less than or equal to 20°, K = C f C r * I r I f ( 2 ) is less than or equal to 1.6, and (3) Cf=Cr and If=Ir.

Abstract: An HF plasma process excitation configuration includes an HF generator that is connected to a plasma load through a directional coupler. The directional coupler includes a transmission line, a first coupling line for detecting reflected power from the plasma load, and a second coupling line for detecting forward power from the HF generator, is the first coupling line is spaced apart from the transmission line and is terminated at least at one end with a termination resistance. The second coupling line is spaced apart from the transmission line and is terminated at least at one end with a termination resistance. Each coupling line has a predetermined and adjusted characteristic impedance, and the termination resistances each have a resistance value that corresponds within a tolerance to the characteristic impedance of the associated coupling line with a tolerance.

Abstract: The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.

Abstract: One aspect of the invention includes a directional coupler having a coupling factor in the forward direction determined from the equation Cf=Cf·ej?Cf, a coupling factor in the reverse direction determined from the equation Cr=Cr·ej?Cr, an isolation in the forward direction determined from the equation If=If·ej?If, and an isolation in the reverse direction determined from the equation Ir=Ir·ej?Ir, wherein at least one condition is met from among the group consisting of: (1) the absolute value of ??=?Cr+?Cf?(?Ir+?If) being less than or equal to 20°, K = C f C r * I r I f ( 2 ) is less than or equal to 1.6, and (3) Cf=Cr and If=Ir.

Abstract: An HF plasma process excitation configuration includes an HF generator that is connected to a plasma load through a directional coupler. The directional coupler includes a transmission line, a first coupling line for detecting reflected power from the plasma load, and a second coupling line for detecting forward power from the HF generator, is the first coupling line is spaced apart from the transmission line and is terminated at least at one end with a termination resistance. The second coupling line is spaced apart from the transmission line and is terminated at least at one end with a termination resistance. Each coupling line has a predetermined and adjusted characteristic impedance, and the termination resistances each have a resistance value that corresponds within a tolerance to the characteristic impedance of the associated coupling line with a tolerance.

Abstract: A measuring device of an HF plasma system includes an uncoupling device for uncoupling one or a plurality of signals related to a power and at least one filter arrangement to which such a signal is transmitted. The filter arrangement is designed as a band pass filter arrangement and includes a first and a second filter element between which a decoupling device is arranged.

Abstract: The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.