Abstract: The invention relates to a device for connecting multi-lumen lines for the medical field, in particular for wound care in the field of vacuum therapy, having a preferably one-piece basic body, designed for tight and preferably releasable connection of at least two line lumens, wherein the basic body, for furnishing a distributor chamber for at least one, preferably two, three, or more lumens, opening into it, of the connected line and preferably at least one channel for removing a fluid from and introducing it into the distributor chamber, and when the line is connected, the distributor chamber is sealed off in fluid-tight fashion from at least one line lumen in such a way that a fluid exchange between the distributor chamber and this line lumen is prevented.

Abstract: The invention relates to a device for generating a plurality of clock signals or high-frequency signals. The devices includes a reference signal generator, which is connected to an oscillator and generates at its output a reference signal with a reference frequency fx. The device also includes at least one signal processor, for example, a DDS, which is connected to the reference frequency generator via a first signal line and to which the reference signal with the reference frequency fx is supplied, and which is configured to generate an output signal having a frequency less than fx.

Abstract: The invention relates to a device for connecting multi-lumen lines for the medical field, in particular for wound care in the field of vacuum therapy, having a preferably one-piece basic body, designed for tight and preferably releasable connection of at least two line lumens, wherein the basic body, for furnishing a distributor chamber for at least one, preferably two, three, or more lumens, opening into it, of the connected line and preferably at least one channel for removing a fluid from and introducing it into the distributor chamber, and when the line is connected, the distributor chamber is sealed off in fluid-tight fashion from at least one line lumen in such a way that a fluid exchange between the distributor chamber and this line lumen is prevented.

Abstract: The invention relates to a device for generating a plurality of clock signals or high-frequency signals. The devices includes a reference signal generator, which is connected to an oscillator and generates at its output a reference signal with a reference frequency fx. The device also includes at least one signal processor, for example, a DDS, which is connected to the reference frequency generator via a first signal line and to which the reference signal with the reference frequency fx is supplied, and which is configured to generate an output signal having a frequency less than fx.

Abstract: The invention relates to a device for connecting multi-lumen lines for the medical field, in particular for wound care in the field of vacuum therapy, having a preferably one-piece basic body, designed for tight and preferably releasable connection of at least two line lumens, wherein the basic body, for furnishing a distributor chamber for at least one, preferably two, three, or more lumens, opening into it, of the connected line and preferably at least one channel for removing a fluid from and introducing it into the distributor chamber, and when the line is connected, the distributor chamber is sealed off in fluid-tight fashion from at least one line lumen in such a way that a fluid exchange between the distributor chamber and this line lumen is prevented.

Abstract: In one aspect, operating a vacuum plasma process system including a plasma discharge chamber is accomplished by generating a main plasma in the discharge chamber in a first operating state, and generating an auxiliary plasma in the discharge chamber in a second operating state. Generating the main plasma includes generating a main plasma power with a first number of RF power generators, and generating an auxiliary plasma power with a second number of RF power generators, such that the second number is smaller than the first number.

Abstract: Workpieces in a vacuum chamber are treated by receiving a mains voltage from a voltage supply network; generating at least one intermediate circuit voltage; generating a first RF signal of a basic frequency, and of a first phase position, from the at least one intermediate circuit voltage; generating a second RF signal of the basic frequency, and of a second phase position, from the at least one intermediate circuit voltage; and coupling the first and the second signal and generating an output signal for the vacuum chamber using a 3 dB coupler.

Abstract: The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.

Abstract: Workpieces in a vacuum chamber are treated by receiving a mains voltage from a voltage supply network; generating at least one intermediate circuit voltage; generating a first RF signal of a basic frequency, and of a first phase position, from the at least one intermediate circuit voltage; generating a second RF signal of the basic frequency, and of a second phase position, from the at least one intermediate circuit voltage; and coupling the first and the second signal and generating an output signal for the vacuum chamber using a 3 dB coupler.

Abstract: A vacuum plasma generator is used for treating workpieces in a vacuum chamber. The vacuum plasma generator includes a mains connection for connection to a voltage supply network, and at least one mains rectifier. The at least one mains rectifier is connected to at least one first converter that generates at least one intermediate circuit voltage, a first RF signal generator, a second RF signal generator, and at least one 3 dB coupler. The first RF signal generator is connected to at least one intermediate circuit voltage, for generating a first signal of a basic frequency and of a first phase position. The second RF signal generator is connected to at least one intermediate circuit voltage, for generating a second signal of the basic frequency and of a second phase position. The least one 3 dB coupler couples the first and the second signal into an output signal of the generator.

Abstract: A method for operating vacuum plasma process system includes generating a main plasma in a first operating state and generating an auxiliary plasma in a second operating state. The main plasma is generated in that a first number of RF power generators generate a main plasma, and a second number of RF power generators generate an auxiliary plasma power. The second number is smaller than the first number. The auxiliary plasma facilitates ignition of the main plasma.

Abstract: The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.

Abstract: A vacuum plasma generator is used for treating workpieces in a vacuum chamber. The vacuum plasma generator includes a mains connection for connection to a voltage supply network, and at least one mains rectifier. The at least one mains rectifier is connected to at least one first converter that generates at least one intermediate circuit voltage, a first RF signal generator, a second RF signal generator, and at least one 3 dB coupler. The first RF signal generator is connected to at least one intermediate circuit voltage, for generating a first signal of a basic frequency and of a first phase position. The second RF signal generator is connected to at least one intermediate circuit voltage, for generating a second signal of the basic frequency and of a second phase position. The least one 3 dB coupler couples the first and the second signal into an output signal of the generator.

Abstract: The invention relates to a method for determining the loop resistance of a power supply network with a neutral conductor (called N), a phase or external conductor (called L1), a ground or protective earth conductor (called PE), and a fault current breaker (called FI) based on the differential quotient Ri=dU/dI≈(U1−U2)/(I1−I2); whereby U1 is the measured, unloaded network voltage, I1 is the zero current without load, U2 is the measured, loaded network voltage, and I2 is the calculated load current. According to one aspect of the invention, the following steps are provided: Loading of a L1-N loop and determining the resistance RL1 according to equation (1), loading of a N-PE loop with a measuring current IM under a measuring voltage UM which is small enough to avoid triggering of the fault current circuit breaker, and determining the resistance RPE according to the following equation (2): RPE=UM/IM  (2) and determining the loop resistance as RL1+RPE.

Abstract: The present invention pertains to a device and method for determining the sign of a phase angle of a first and second, essentially identical, periodic electric signals on corresponding first and second electrical conductors L1, L2, in particular, to determine the phase sequence in a three-phase power system. The device according to the present invention has a sensing device for sensing of the first signal from the first conductor L1 and of the second signal from the second conductor L2; a trigger device 25 for receiving the sensed first signal and specifying a time reference point and/or a time reference window within the signal period of the first signal and outputting a corresponding trigger signal; and a determination device 31, 32, 33 for receiving the trigger signal and the sensed second signal and determining the sign of the phase angle under consideration of at least the value of the second signal at the time reference point and/or the waveform of the second signal within the time reference window.