Patents by Inventor Christoph Mundorf

Christoph Mundorf has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • VACUUM PROCESSING APPARATUS, VACUUM SYSTEM, GAS PARTIAL PRESSURE CONTROL ASSEMBLY, AND METHOD OF CONTROLLING PARTIAL PRESSURE OF A GAS IN A VACUUM PROCESSING CHAMBER
    Publication number: 20240102154
    Abstract: A vacuum processing apparatus (110) for deposition of a material on a substrate is provided. The vacuum processing apparatus (110) includes a vacuum chamber comprising a processing area (111); a deposition apparatus (112) within the processing area (111) of the vacuum chamber; a cooling surface (113) inside the vacuum chamber; and one or more movable shields (220) between the cooling surface (113) and the processing area (111).
    Type: Application
    Filed: February 24, 2020
    Publication date: March 28, 2024
    Inventors: Chun Cheng CHEN, Hung-Wen CHANG, Shin-Hung LIN, Chi-Chang YANG, Christoph MUNDORF, Thomas GEBELE, Jürgen GRILLMAYER
  • Sputtering cathode and device and method for coating a substrate with several layers
    Patent number: 7799179
    Abstract: The invention relates to a sputtering cathode (1) for coating a substrate (6), which comprises a device (5) for generating an external magnetic field with substantially parallel magnetic field lines (8) substantially in the plane of the substrate. The invention further relates to a device and a method for coating a substrate with several layers, whereby several sputtering cathodes are disposed in a circle with their target effective areas pointing radially outward.
    Type: Grant
    Filed: February 18, 2003
    Date of Patent: September 21, 2010
    Assignee: Singulus Technologies AG
    Inventors: Wolfram Maass, Roland Schneider, Uwe Mühlfeld, Christoph Mundorf, Berthold Ocker, Jürgen Langer, Dietmer Schneider, Helmut John, Rudi Spielvogel, Eric Claussen, Wolfgang Stern, Helmut Lausmann, Matthias Landmann, Reinhard Sommerfeld
  • Sputtering cathode and device and method for coating a substrate with several layers
    Publication number: 20050115822
    Abstract: The invention relates to a sputtering cathode (1) for coating a substrate (6), which comprises a device (5) for generating an external magnetic field with substantially parallel magnetic field lines (8) substantially in the plane of the substrate. The invention further relates to a device and a method for coating a substrate with several layers, whereby several sputtering cathodes are disposed in a circle with their target effective areas pointing radially outward.
    Type: Application
    Filed: February 18, 2003
    Publication date: June 2, 2005
    Inventors: Wolfram Maass, Roland Schneider, Uwe Muhlfeld, Christoph Mundorf, Berthold Ocker, Jurgen Langer, Dietmer Schneider, Helmut John, Rudi Spielvogel, Eric Claussen, Wolfgang Stern, Helmut Lausmann, Matthias Landmann, Reinhard Sommerfeld