Abstract: A high-resolution positioning device has a stator and a rotor, a coil array, arranged on the stator, and having at least three groups of flat coils, wherein each group has at least two single coils and the coil array encloses a free space on the stator, also having permanent magnetically-excited circuits that are situated on, against or in the rotor and form a magnet array which likewise encloses a free space, wherein the free spaces accommodate a position measuring system which has a measuring head having sensors, and an area scale. The device is in the form of a freely suspended, magnetically controlled six-dimensional drive, wherein the measuring head is situated in the coil array free space and the area scale is situated in the magnet array free space, and the rotor is free of drive-related electrical or electronic and, in this regard, live parts.

Abstract: The invention relates to a high-resolution positioning device having a stator and a rotor, a coil array, arranged on the stator, having at least three groups of flat coils, wherein each group has at least two single coils and the coil array encloses a free space on the stator, also having permanent magnetically-excited circuits that are situated on, against or in the rotor and form a magnet array which likewise encloses a free space, wherein the free spaces accommodate a position measuring system which has a measuring head having sensors, and an area scale. According to the invention, the device is in the form of a freely suspended, magnetically controlled six-dimensional drive, wherein the measuring head is situated in the coil array free space and the area scale is situated in the magnet array free space, and the rotor is free of drive-related electrical or electronic and, in this regard, live parts.

Abstract: A device for injecting light into an optical wave guide orients a focused light beam using a manipulator. The manipulator includes an adjusting plate with an outer part, an inner part, and two spring arrangements between the outer part and the inner part that are independently adjustable along two co-ordinate axes, each spring arrangement having a parallel spring arrangement guiding parallel to a certain direction, and a preliminary spring mounted in series, a fixing screw, and an axially elastic fixing disk. The inner part can be moved in the X direction and in the Y direction, and the fixing disk can be pressed into the adjusting plate by the fixing screw screwed into the housing part, in the direction of the passage of the beam, such that the adjusted position of the inner part is fixed.

Abstract: A device for injecting light into an optical wave guide is provided, via which a focused light beam is oriented by a manipulator. A simple and precise adjustment of maximum injection efficiency during the injection of light into optical wave guides is facilitated, by a manipulator, and the permanent fixing of the adjusted positions obtained during the adjustment of the injection. The device can include: a manipulator having an adjusting plate comprising an outer part, an inner part, and two spring arrangements which are positioned between the outer part and the inner part and can be adjusted independently of each other along two co-ordinate axes, each spring arrangement having a parallel spring arrangement guiding parallel to a certain direction, and a preliminary spring mounted in series; a fixing screw that can be introduced into the fixed housing part by an axial threaded borehole; and an axially elastic fixing disk.

Abstract: The invention refers to an arrangement for positioning substrates, in particular for positioning wafers, within a device that is provided for exposure of the substrates and/or for measurement on the substrates by means of radiation under high-vacuum conditions. The following are provided according to the present invention: a retention system (4), displaceable on a linear guidance system (3), for receiving the substrate, the guidance direction of the linear guidance system (3) being oriented parallel or substantially parallel to the Y coordinate of an X, Y, Z spatial coordinate system; drives for limited modification of the inclination of the guidance direction relative to the Y coordinate; drives for limited rotation of the linear guidance system (3), including the retention system (4), about the guidance direction; and drives for parallel displacement of the linear guidance system (3), including the retention system (4), in the direction of the X coordinate, the Y coordinate, and/or the Z coordinate.

Abstract: The invention refers to an arrangement for positioning substrates, in particular for positioning wafers, within a device that is provided for exposure of the substrates and/or for measurement on the substrates by means of radiation under high-vacuum conditions.