Patents by Inventor Christoph SCHLICHENMAIER

Christoph SCHLICHENMAIER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reflective Optical Element for the EUV Wavelength Range, Method for Producing and for Correcting Such an Element, Projection Lens for Microlithography Comprising Such an Element, and Projection Exposure Apparatus for Microlithography Comprising Such a Projection Lens
    Publication number: 20140307308
    Abstract: A reflective optical element 39 for EUV wavelengths having a layer arrangement on the surface of a substrate, wherein the layer arrangement includes at least one layer subsystem 37 consisting of a periodic sequence of at least one period of individual layers. The period includes two individual layers having different refractive indices in the EUV wavelength range. The substrate has a variation of the density of more than 1% by volume at least along an imaginary surface 30 at a fixed distance of between 0 ?m and 100 ?m from the surface. Also, the substrate is protected against long-term aging or densification by EUV radiation either with a protective layer, with a protective layer subsystem of the layer arrangement, or with a correspondingly densified surface region 35 of the substrate.
    Type: Application
    Filed: April 7, 2014
    Publication date: October 16, 2014
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Markus WEISS, Norbert KERWIEN, Martin WEISER, Boris BITTNER, Norbert WABRA, Christoph SCHLICHENMAIER, Wilfried CLAUSS