Abstract: The invention relates to a polishing machine (10) and to a method for polishing optical waveguides, the polishing machine comprising a polishing disk (13) having a plug socket (14) for holding a plug with an optical waveguide, a polishing platform (15) for receiving an abrasive, a positioning device (17) for relative positioning of the polishing disk and of the polishing platform between a polishing position and a set-up position (16), and a drive device for executing a relative polishing movement between the polishing platform and the polishing disk in the polishing position, wherein the polishing machine has a cleaning device for applying dry ice to the polishing platform and/or to the polishing disk.

Abstract: Methods of coating contacts to have a specific color. The color can be selected to match a color of a portion of a device enclosure for an electronic device housing the contacts. Examples can instead provide methods of coating contacts to have a color to contrast with a color of a portion of the device enclosure. These methods can provide electrical contacts having a low contact resistance and good corrosion and scratch resistance.

Abstract: The present invention relates to a chrome free etch for plating on plastic processes, wherein plastic surfaces are contacted in a first etching step with an etching solution at least comprising Mn(IV)-ions and, in a second etching step, with a solution at least comprising Mn(III)- and Mn(VII)-ions prior to the metal plating step.

Abstract: Contacts that can be highly corrosion resistant, can be readily manufactured, and can conserve precious materials. One example can provide contacts having a layer of a precious-metal alloy to improve corrosion resistance. The precious-metal-alloy layer can be plated with a hard, durable, wear and corrosion resistant plating stack for further corrosion resistance and wear improvement. The resources consumed by a contact can be reduced by forming a bulk or substrate region of the contact using a more readily available material, such as copper or a material that is primarily copper based.

Abstract: The invention relates to a polishing machine (10) and to a method for polishing optical waveguides, the polishing machine comprising a polishing disk (13) having a plug socket (14) for holding a plug with an optical waveguide, a polishing platform (15) for receiving an abrasive, a positioning device (17) for relative positioning of the polishing disk and of the polishing platform between a polishing position and a set-up position (16), and a drive device for executing a relative polishing movement between the polishing platform and the polishing disk in the polishing position, the positioning device having a holder (20) for detachably holding the polishing disk, wherein the polishing machine has a metering device for applying a rinsing liquid to the polishing platform, a passage opening through which the rinsing liquid is metered onto the polishing platform by means of the metering device being formed in the polishing disk.

Abstract: The invention relates to a polishing machine (10) and to a method for polishing optical waveguides, the polishing machine comprising a polishing disk (13) having a plug socket (14) for holding a plug with an optical waveguide, a polishing platform (15) for receiving an abrasive, a positioning device (17) for relative positioning of the polishing disk and of the polishing platform between a polishing position and a set-up position (16), and a drive device for executing a relative polishing movement between the polishing platform and the polishing disk in the polishing position, wherein the polishing machine has a cleaning device for applying dry ice to the polishing platform and/or to the polishing disk.

Abstract: A method for operating a photoelectric barrier as well as a photoelectric barrier with at least one first and one second optoelectronic machine guard. The first optoelectronic machine guard has a first transmitter and the second optoelectronic machine guard has a second transmitter and receiver unit. The transmitters of the first optoelectronic machine guard are successively activated during a run of a first cycle so as to emit a single light pulse, and the transmitters of the second optoelectronic machine guard are successively activated during a run of a second cycle so as to emit a single light pulse. The cycles occur substantially simultaneously. A duration of the first cycle is lengthened or shortened by the duration of a first phase offset ?A and that the duration of the second cycle is lengthened or shortened by the duration of a second phase offset ?B.

Abstract: The present invention relates to a chrome free etch for plating on plastic processes, wherein plastic surfaces are contacted in a first etching step with an etching solution at least comprising Mn(IV)-ions and, in a second etching step, with a solution at least comprising Mn(III)- and Mn(VII)-ions prior to the metal plating step.

Abstract: Methods of coating contacts to have a specific color. The color can be selected to match a color of a portion of a device enclosure for an electronic device housing the contacts. Examples can instead provide methods of coating contacts to have a color to contrast with a color of a portion of the device enclosure. These methods can provide electrical contacts having a low contact resistance and good corrosion and scratch resistance.

Abstract: Contacts that can be highly corrosion resistant, can be readily manufactured, and can conserve precious materials . One example can provide contacts having a layer of a precious-metal alloy to improve corrosion resistance. The precious-metal-alloy layer can be plated with a hard, durable, wear and corrosion resistant plating stack for further corrosion resistance and wear improvement. The resources consumed by a contact can be reduced by forming a bulk or substrate region of the contact using a more readily available material, such as copper or a material that is primarily copper based.

Abstract: A method for operating a photoelectric barrier as well as a photoelectric barrier with at least one first and one second optoelectronic machine guard. The first optoelectronic machine guard has a first transmitter and the second optoelectronic machine guard has a second transmitter and receiver unit. The transmitters of the first optoelectronic machine guard are successively activated during a run of a first cycle so as to emit a single light pulse, and the transmitters of the second optoelectronic machine guard are successively activated during a run of a second cycle so as to emit a single light pulse. The cycles occur substantially simultaneously. A duration of the first cycle is lengthened or shortened by the duration of a first phase offset ?A and that the duration of the second cycle is lengthened or shortened by the duration of a second phase offset ?B.

Abstract: Electrical contacts having good corrosion resistance. These contacts may include a set of three layers. The three layers may include a first or top layer and two layers below the top layer. The second or middle layer may be more electrochemically active than either the first layer or the third layer. The first layer may include cracks, pores, or other discontinuities. Corrosive substances may pass through these cracks, pores, and other discontinuities and corrode the second, more electrochemically active layer below the first layer. The cracks, pores, and other discontinuities may spread the corrosion homogenously and laterally across the surface of the contact, thereby protecting the remainder of the contact.

Abstract: The invention concerns an evaluation apparatus (50) for evaluating gamma radiation events detected by a gamma camera (10) and identifying valid gamma radiation events, said (gamma camera (10) including a scintillator (12) for emitting scintillation photons (42) at photo conversion positions (44) in the scintillator (12) in response to incident gamma rays (22) and resulting gamma radiation events and a position-sensitive photodetector(14) for detecting emitted scintillation photons (42) and obtaining therefrom a spatial signal distribution (24). The invention further concerns a calibration apparatus (56) for in-situ calibrating a position-sensitive photodetector (14) of a gamma camera (10) for the detection of gamma radiation events.

Abstract: A method for synchronizing a light grid comprising a transmitting unit having a plurality of transmitters and a receiving unit having a plurality of receivers. A transmitter control unit activates the transmitters one after another in a cycle, and a receiver control unit evaluates the receivers. Each transmitter is associated with a receiver, and an activated transmitter transmits a transmission beam to its associated receiver. At least two transmission beams in the cycle are synchronization transmission beams which are emitted at a time offset from one another. The receiver control unit measures the time offset, and the synchronization transmission beams are uniquely associated with the totality of the transmission beams in the cycle on the basis of the time offset.

Abstract: The invention relates to an aqueous inhibition composition for the inhibition of electrochemical metal plating on polymer surfaces, said inhibition composition comprising an inhibition agent selected from the group of compounds having at least one sulfur and at least one nitrogen atom as well as to a method for the inhibition of an insulated surface of a rack area. The inventive inhibition composition is capable to provide a solution for prohibiting unintended metallization on insulated areas of the racks when non-chromic etching is utilized for plating on plastics processes.

Abstract: Spatial intensity distributions of scintillation photons emitted by the scintillator array (5) in response to multiple incident gamma rays in record are recorded (S10). Sets of coincidently emitted scintillation photons from the recorded spatial intensity distributions are determined (S22). The sets of coincidently emitted scintillation photons center-of-gravity positions (S24) and cumulative energies are determined (S26). A clustering analysis based on the determined center-of-gravity positions and cumulative energies to obtain clusters (26a, 26b, 33) of gamma ray events attributed to a scintillator array element is performed (15). A cluster (26a, 26b, 33) of the spatial intensity distributions is cumulated (S29) to determine a cumulative spatial intensity distribution of scintillation photons emitted in response to incident gamma rays in the scintillator array element.

Abstract: A pickling solution for the surface pre-treatment of plastic surfaces in preparation for metallization, the solution comprising a source of Mn(VII) ions; and an inorganic acid; wherein the pickling solution is substantially free of chromium (VI) ions, alkali ions, and alkaline-earth ions.

Abstract: The present invention relates to a calibration method (100) for a gamma ray detector (3, 51) including a scintillator array (5) for emitting scintillation photons at photo conversion positions in response to incident gamma rays and a photodetector array (7) coupled thereto in light-sharing mode for determining a spatial intensity distribution of scintillation photons.

Abstract: A method for synchronizing a light grid comprising a transmitting unit having a plurality of transmitters and a receiving unit having a plurality of receivers. A transmitter control unit activates the transmitters one after another in a cycle, and a receiver control unit evaluates the receivers. Each transmitter is associated with a receiver, and an activated transmitter transmits a transmission beam to its associated receiver. At least two transmission beams in the cycle are synchronization transmission beams which are emitted at a time offset from one another. The receiver control unit measures the time offset, and the synchronization transmission beams are uniquely associated with the totality of the transmission beams in the cycle on the basis of the time offset.

Abstract: The invention concerns an evaluation apparatus (50) for evaluating gamma radiation events detected by a gamma camera (10) and identifying valid gamma radiation events, said (gamma camera (10) including a scintillator (12) for emitting scintillation photons (42) at photo conversion positions (44) in the scintillator (12) in response to incident gamma rays (22) and resulting gamma radiation events and a position-sensitive photodetector(14) for detecting emitted scintillation photons (42) and obtaining therefrom a spatial signal distribution (24). The invention further concerns a calibration apparatus (56) for in-situ calibrating a position-sensitive photodetector (14) of a gamma camera (10) for the detection of gamma radiation events.