Patents by Inventor Christoph Wilbertz

Christoph Wilbertz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9500620
    Abstract: A layer system having a layer region, whereby the layer region has a single-crystal silicon substrate with a front side and a back side, and whereby a textured surface is formed on the front side and the textured surface has a topography with different heights and a thin film layer of a metal oxide and/or an oxide ceramic is formed on the textured surface, whereby the thin film layer covers the textured surface only partially.
    Type: Grant
    Filed: October 6, 2014
    Date of Patent: November 22, 2016
    Assignee: Micronas GmbH
    Inventors: Christoph Wilbertz, Dominik Zimmermann
  • Patent number: 9437676
    Abstract: A layer system having a layer region whereby the layer region has a single-crystal silicon substrate with a front side and a back side, and whereby a textured surface is formed on the front side and the textured surface has a topography with different heights and a thin film layer of a metal oxide and/or an oxide ceramic is formed on the textured surface, whereby the thin film layer covers the textured surface.
    Type: Grant
    Filed: October 6, 2014
    Date of Patent: September 6, 2016
    Assignee: Micronas GmbH
    Inventors: Christoph Wilbertz, Dominik Zimmermann
  • Publication number: 20150096354
    Abstract: A layer system having a layer region, whereby the layer region has a single-crystal silicon substrate with a front side and a back side, and whereby a textured surface is formed on the front side and the textured surface has a topography with different heights and a thin film layer of a metal oxide and/or an oxide ceramic is formed on the textured surface, whereby the thin film layer covers the textured surface only partially.
    Type: Application
    Filed: October 6, 2014
    Publication date: April 9, 2015
    Inventors: Christoph WILBERTZ, Dominik ZIMMERMANN
  • Publication number: 20150096353
    Abstract: A layer system having a layer region whereby the layer region has a single-crystal silicon substrate with a front side and a back side, and whereby a textured surface is formed on the front side and the textured surface has a topography with different heights and a thin film layer of a metal oxide and/or an oxide ceramic is formed on the textured surface, whereby the thin film layer covers the textured surface.
    Type: Application
    Filed: October 6, 2014
    Publication date: April 9, 2015
    Inventors: Christoph WILBERTZ, Dominik ZIMMERMANN
  • Patent number: 8669662
    Abstract: A fastening device is provided that includes a semiconductor body with an integrated circuit, and a dielectric passivation layer formed on the surface of the semiconductor body, and a trace formed underneath the passivation layer, and an oxide layer formed beneath the trace, and a connecting component that forms a frictional connection between a component formed above the passivation layer and the semiconductor body, wherein a formation passing through the passivation layer and the oxide layer and having a bottom surface is formed, and a conductive layer is formed on the bottom surface and the connecting component forms an electrical connection between the conductive layer and the component.
    Type: Grant
    Filed: December 2, 2012
    Date of Patent: March 11, 2014
    Assignee: Micronas GmbH
    Inventors: Christoph Wilbertz, Heinz-Peter Frerichs, Tobias Kolleth
  • Patent number: 8592875
    Abstract: A semiconductor gas sensor is provided that includes a semiconductor body with a passivation layer formed on a surface of thereof. A gas-sensitive control electrode is separated from a channel region by a gap or a control electrode is arranged as a first plate of a capacitor with a gap and a second plate of the capacitor is connected to a gate of the field effect transistor implemented as a Capacitively Controlled Field Effect Transistor. The control electrode has is connected to a reference voltage. A support area is provided with a first support structure and a second support structure. A contact area is provided on the surface of the semiconductor body. A first contact region has a frictional connection and an electrical connection with the control electrode and the second contact region has at least a frictional connection with the control electrode.
    Type: Grant
    Filed: November 21, 2012
    Date of Patent: November 26, 2013
    Assignee: Micronas GmbH
    Inventors: Christoph Wilbertz, Heinz-Peter Frerichs, Tobias Kolleth
  • Patent number: 8242545
    Abstract: A device for detecting a gas or gas mixture has a first and a second gas sensor. The first gas sensor is a MOSFET, which comprises a first source, a first drain, a first channel zone disposed between the latter elements, and a first gas sensitive layer capacitively coupled to the first channel zone that contains palladium and reacts to a change in the concentration of the gas to be detected with a change in its work function. The second gas sensor has, in a semiconductor substrate, a second source, a second drain, and a second channel zone between the latter elements, which is capacitively coupled via an air gap to a suspended gate. The latter comprises a second gas sensitive layer that reacts to a change in the concentration of the gas to be detected with a change in its work function. The second gas sensitive layer is arranged on a support layer and faces the air gap.
    Type: Grant
    Filed: April 22, 2010
    Date of Patent: August 14, 2012
    Assignee: Micronas GmbH
    Inventors: Christoph Wilbertz, Heinz-Peter Frerichs, Ingo Freund
  • Patent number: 8226892
    Abstract: A gas sensor has a gas-sensitive layer with a surface area where the electron affinity depends on the concentration of a target gas brought in contact with the surface area. An electrical potential sensor is capacitively coupled to the surface area via an air gap. The surface area of the gas-sensitive layer is covered by an electric insulating layer that is inert to the target gas and is bonded to the gas-sensitive layer. The coating is designed in such a way that it is permeable for the target gas and a different, non-target gas that can be adsorbed on the surface area. The coating has different diffusion constants for the target gas and the non-target gas. The diffusion constants are coordinated with each other in such a way that the sensitivity of the gas sensor to the target gas increases when the target gas concentration exceeds a predetermined concentration threshold in the presence of the non-target gas.
    Type: Grant
    Filed: March 25, 2009
    Date of Patent: July 24, 2012
    Assignee: Micronas GmbH
    Inventors: Christoph Wilbertz, Heinz-Peter Frerichs, Christoph Senft
  • Patent number: 8056394
    Abstract: In a procedure for measuring the concentration of a target gas, a gas sensor is provided whose sensor signal at constant temperature is dependent on a target gas concentration and has a lower measurement sensitivity in a first modulation range than in a second modulation range. The position of the modulation ranges is dependent on the temperature. The temperature of the gas sensor is controlled so that the sensor signal is essentially independent of the target gas concentration and lies within the second modulation range. The temperature of the gas sensor is then a measurement for the target gas concentration.
    Type: Grant
    Filed: March 25, 2009
    Date of Patent: November 15, 2011
    Assignee: Micronas GmbH
    Inventors: Heinz-Peter Frerichs, Hans-Günter Zimmer, Tobias Kolleth, Christoph Wilbertz
  • Patent number: 7918123
    Abstract: A gas sensor has at least one gas sensitive layer, which has at least one surface area in which the work function is dependent upon the concentration of a target gas capable of being brought into contact with the surface zone. At least one electric potential sensor is capacitatively coupled to the surface zone over an air gap. The surface zone of the gas sensitive layer is covered with an electrically insulating coating which is inert to the target gas and which is adhesively bound to the gas sensitive layer. The coating is configured so that it is permeable to the target gas and so that when the target gas contacts the surface zone of the gas sensitive layer, it prevents or at least impedes an alteration of the bound state of atoms and/or molecules bound to the surface zone and differing from the target gas.
    Type: Grant
    Filed: June 19, 2008
    Date of Patent: April 5, 2011
    Assignee: Micronas GmbH
    Inventors: Christoph Wilbertz, Heinz-Peter Frerichs
  • Publication number: 20100270595
    Abstract: A device for detecting a gas or gas mixture has a first and a second gas sensor. The first gas sensor is a MOSFET, which comprises a first source, a first drain, a first channel zone disposed between the latter elements, and a first gas sensitive layer capacitively coupled to the first channel zone that contains palladium and reacts to a change in the concentration of the gas to be detected with a change in its work function. The second gas sensor has, in a semiconductor substrate, a second source, a second drain, and a second channel zone between the latter elements, which is capacitively coupled via an air gap to a suspended gate. The latter comprises a second gas sensitive layer that reacts to a change in the concentration of the gas to be detected with a change in its work function. The second gas sensitive layer is arranged on a support layer and faces the air gap.
    Type: Application
    Filed: April 22, 2010
    Publication date: October 28, 2010
    Applicant: MICRONAS GMBH
    Inventors: Christoph Wilbertz, Heinz-Peter Frerichs, Ingo Freund
  • Publication number: 20090272175
    Abstract: In a procedure for measuring the concentration of a target gas, a gas sensor is provided whose sensor signal at constant temperature is dependent on a target gas concentration and has a lower measurement sensitivity in a first modulation range than in a second modulation range. The position of the modulation ranges is dependent on the temperature. The temperature of the gas sensor is controlled so that the sensor signal is essentially independent of the target gas concentration and lies within the second modulation range. The temperature of the gas sensor is then a measurement for the target gas concentration.
    Type: Application
    Filed: March 25, 2009
    Publication date: November 5, 2009
    Applicant: MICRONAS GMBH
    Inventors: Heinz-Peter Frerichs, Hans-Günter Zimmer, Tobias Kolleth, Christoph Wilbertz
  • Publication number: 20090246084
    Abstract: A gas sensor has a gas-sensitive layer with a surface area where the electron affinity depends on the concentration of a target gas brought in contact with the surface area. An electrical potential sensor is capacitively coupled to the surface area via an air gap. The surface area of the gas-sensitive layer is covered by an electric insulating layer that is inert to the target gas and is bonded to the gas-sensitive layer. The coating is designed in such a way that it is permeable for the target gas and a different, non-target gas that can be adsorbed on the surface area. The coating has different diffusion constants for the target gas and the non-target gas. The diffusion constants are coordinated with each other in such a way that the sensitivity of the gas sensor to the target gas increases when the target gas concentration exceeds a predetermined concentration threshold in the presence of the non-target gas.
    Type: Application
    Filed: March 25, 2009
    Publication date: October 1, 2009
    Applicant: Micronas GmbH
    Inventors: Christoph Wilbertz, Heinz-Peter Frerichs, Christoph Senft
  • Patent number: 7554135
    Abstract: A device for detecting a gas or gas mixture having at least one first gas sensor designed as an SGFET and at least—one second, additional gas sensor designed as a Lundström-FET. The gas sensors are connected to a processing device designed to analyze the measurement signals from both types of gas sensors in order to detect the gas or gas mixture.
    Type: Grant
    Filed: March 4, 2005
    Date of Patent: June 30, 2009
    Assignee: Micronas GmbH
    Inventors: Mirko Lehmann, Heinz-Peter Frerichs, Christoph Wilbertz
  • Publication number: 20090078026
    Abstract: A gas sensor has at least one gas sensitive layer, which has at least one surface area in which the work function is dependent upon the concentration of a target gas capable of being brought into contact with the surface zone. At least one electric potential sensor is capacitatively coupled to the surface zone over an air gap. The surface zone of the gas sensitive layer is covered with an electrically insulating coating which is inert to the target gas and which is adhesively bound to the gas sensitive layer. The coating is configured so that it is permeable to the target gas and so that when the target gas contacts the surface zone of the gas sensitive layer, it prevents or at least impedes an alteration of the bound state of atoms and/or molecules bound to the surface zone and differing from the target gas.
    Type: Application
    Filed: June 19, 2008
    Publication date: March 26, 2009
    Applicant: MICRONAS GMBH
    Inventors: Christoph Wilbertz, Heinz-Peter Frerichs
  • Publication number: 20080237654
    Abstract: A device for detecting a gas or gas mixture having at least one first gas sensor designed as an SGFET and at least—one second, additional gas sensor designed as a Lundström-FET. The gas sensors are connected to a processing device designed to analyze the measurement signals from both types of gas sensors in order to detect the gas or gas mixture.
    Type: Application
    Filed: March 4, 2005
    Publication date: October 2, 2008
    Applicant: Micronas GmbH
    Inventors: Mirko Lehmann, Heinz-Peter Frerichs, Christoph Wilbertz
  • Publication number: 20070047172
    Abstract: The invention relates to a monolithic arrangement, especially an integrated circuit (IC), with a floating electrode (FE), at least one conductor track (ML) for connecting the floating electrode (FE) to a system component (MS) inside the monolithic arrangement, a plurality of other conductor tracks (L) at least temporarily conducting potential in order to carry signals or currents between components (MS, GND), structures and/or contacts (K), and an insulator (IS) for electrical insulating of the conductor track (ML) and the other conductor tracks (L) from each other, wherein one layout of the conductor track (ML) and of the other conductor tracks (L) is such that the path of the conductor track (ML) does not cross the path of any of the conductor tracks (L). It is advisable to maintain a minimum distance between the measuring conductor track and the other conductor tracks.
    Type: Application
    Filed: August 9, 2006
    Publication date: March 1, 2007
    Inventors: Christoph Wilbertz, Heinz-Peter Frerichs
  • Patent number: 7091083
    Abstract: A method for producing a capacitor comprises providing a raw structure having a substrate and at least one dielectric layer, wherein a first area and a second area of the substrate are separated by an isolating layer. Above the first and second areas, an electrically conductive layer is arranged on the at least one dielectric layer. Further, a mask layer is deposited on the electrically conductive layer, wherein it is structured for generating a first mask above the first area. The method further comprises etching away the electrically conductive layer and at least one of the dielectric layers in the second area by means of the first mask and completing an active device in the second area.
    Type: Grant
    Filed: July 9, 2004
    Date of Patent: August 15, 2006
    Assignee: Infineon Technologies AG
    Inventors: Claus Dahl, Knut Stahrenberg, Christoph Wilbertz
  • Publication number: 20050037591
    Abstract: A method for producing a capacitor comprises providing a raw structure having a substrate and at least one dielectric layer, wherein a first area and a second area of the substrate are separated by an isolating layer. Above the first and second areas, an electrically conductive layer is arranged on the at least one dielectric layer. Further, a mask layer is deposited on the electrically conductive layer, wherein it is structured for generating a first mask above the first area. The method further comprises etching away the electrically conductive layer and at least one of the dielectric layers in the second area by means of the first mask and completing an active device in the second area.
    Type: Application
    Filed: July 9, 2004
    Publication date: February 17, 2005
    Applicant: Infineoon Technologies AG
    Inventors: Claus Dahl, Knut Stahrenberg, Christoph Wilbertz