Abstract: Various systems and methods for detecting design and process defects on a wafer, reviewing defects on a wafer, selecting one or more features within a design for use as process monitoring features, or some combination thereof are provided. One system is configured to detect design defects and process defects at locations on a wafer at which images are acquired by an electron beam review subsystem based on defects in a design, additional defects in the design, which are detected by comparing an image of a die in the design printed on the wafer acquired by the electron beam review subsystem to an image of the die stored in a database, and defects detected on the wafer by a wafer inspection system.

Abstract: A distributed metering platform virtualizes functions of a conventional metrology sensor and separates the virtualized functions from a metrology sensor. One or more virtual meters or applications may be instantiated at a network communication device that is remote from the metrology sensor and processes metrology data received from the metrology sensor. Each virtual meter may include multiple partitioned application spaces that are isolated from one another. In one example, a first application space includes a locked version of code and a second application space includes an unlocked version of code. Furthermore, each virtual meter may be isolated from other virtual meters such that each virtual meter is unable to affect operations and/or data associated with other virtual meters.

Abstract: Defects observed by imaging tools may be classified by automatic comparison of features observed in a defect image with design information relating to corresponding portions of the image. Defect information may be generated from a defect image from a defect imaging tool. Design information relating to one or more structures to be formed on the substrate in a vicinity of the defect may be retrieved. The defect may be classified based on a combination of the defect information from the defect image and design information relating to one or more structures to be formed on the substrate in the vicinity of the defect.

Abstract: Various systems and methods for detecting design and process defects on a wafer, reviewing defects on a wafer, selecting one or more features within a design for use as process monitoring features, or some combination thereof are provided.

Abstract: Various methods, designs, defect review tools, and systems for determining locations on a wafer to be reviewed during defect review are provided. One computer-implemented method includes acquiring coordinates of defects detected by two or more inspection systems. The defects do not include defects detected on the wafer. The method also includes determining coordinates of the locations on the wafer to be reviewed during the defect review by translating the coordinates of the defects into the coordinates on the wafer such that results of the defect review performed at the locations can be used to determine if the defects cause systematic defects on the wafer.

Abstract: Defects observed by imaging tools may be classified by automatic comparison of features observed in a defect image with design information relating to corresponding portions of the image. Defect information may be generated from a defect image from a defect imaging tool. Design information relating to one or more structures to be formed on the substrate in a vicinity of the defect may be retrieved. The defect may be classified based on a combination of the defect information from the defect image and design information relating to one or more structures to be formed on the substrate in the vicinity of the defect.

Abstract: Methods, defect review tools, and systems for locating a defect in a defect review process are provided. One method includes acquiring one or more images and data from an inspection tool. The one or more images illustrate an area on a specimen in which a defect to be reviewed is located. The data indicates a position and features of the defect within the area. The method also includes acquiring one or more additional images of the specimen proximate the position of the defect indicated in the data using an imaging subsystem of a defect review tool. In addition, the method includes identifying a portion of the one or more additional images that corresponds to the one or more images. The method further includes determining a position of the defect within the portion of the one or more additional images using the data.

Abstract: Various methods, designs, defect review tools, and systems for determining locations on a wafer to be reviewed during defect review are provided. One computer-implemented method includes acquiring coordinates of defects detected by two or more inspection systems. The defects do not include defects detected on the wafer. The method also includes determining coordinates of the locations on the wafer to be reviewed during the defect review by translating the coordinates of the defects into the coordinates on the wafer such that results of the defect review performed at the locations can be used to determine if the defects cause systematic defects on the wafer.

Abstract: An integral electronic revenue meter system diagnostics package including a microprocessor, storage memory, preselect series of system diagnostic tests, and recording any results which exceed predefined programmable thresholds, and display means for displaying error and/or diagnostic messages identifying selected diagnostic data and/or errors discovered in the meter tests during a predefined period is included as part of an electricity revenue meter of the type used for collecting metering data for a utility which uses such data for billing purposes. The system automatically senses the type of electrical service in which the revenue meter is installed when the revenue meter is installed in a socket at the customer's premises.

Abstract: An integral electronic revenue meter system diagnostics package including a microprocessor, storage memory, preselect series of system diagnostic tests, and recording any results which exceed predefined programmable thresholds, and display means for displaying error and/or diagnostic messages identifying selected diagnostic data and/or errors discovered in the meter tests during a predefined period is included as part of an electricity revenue meter of the type used for collecting metering data for a utility which uses such data for billing purposes. The system automatically senses the type of electrical service in which the revenue meter is installed when the revenue meter is installed in a socket at the customer's premises.

Abstract: An integral electronic revenue meter system diagnostics package including a microprocessor, storage memory, preselect series of system diagnostic tests, and recording any results which exceed predefined programmable thresholds, and display means for displaying error and/or diagnostic messages identifying selected diagnostic data and/or errors discovered in the meter tests during a predefined period is included as part of an electricity revenue meter of the type used for collecting metering data for a utility which uses such data for billing purposes. The system automatically senses the type of electrical service in which the revenue meter is installed when the revenue meter is installed in a socket at the customer's premises.

Abstract: Methods, defect review tools, and systems for locating a defect in a defect review process are provided. One method includes acquiring one or more images and data from an inspection tool. The one or more images illustrate an area on a specimen in which a defect to be reviewed is located. The data indicates a position and features of the defect within the area. The method also includes acquiring one or more additional images of the specimen proximate the position of the defect indicated in the data using an imaging subsystem of a defect review tool. In addition, the method includes identifying a portion of the one or more additional images that corresponds to the one or more images. The method further includes determining a position of the defect within the portion of the one or more additional images using the data.

Abstract: Users desire to normalize raw data from meter load profile acquisition systems against some attributes (i.e., properties) of a facility, such as the number of employees. The facility area, and the number of products produced would be additional potential attributes for consideration. Normalization involves dividing a load profile channel such as kiloWatt hours by a determined facility attribute to obtain a new data set, for example, such as “kWh/Employee.” The present modelization allows a user to define a set of attributes and manage their value over time to refine the facility model. Keeping track of the attributes over time provides increased accuracy in the resulting data. The model is managed by a user interface which can be refined over time as the facility evolves. Data comprising sets of attributes over time may persist within the system for later retrieval.

Abstract: Users desire to normalize raw data from meter load profile acquisition systems against some attributes (i.e., properties) of a facility, such as the number of employees. The facility area, and the number of products produced would be additional potential attributes for consideration. Normalization involves dividing a load profile channel such as kiloWatt hours by a determined facility attribute to obtain a new data set, for example, such as “kWh/Employee.” The present modelization allows a user to define a set of attributes and manage their value over time to refine the facility model. Keeping track of the attributes over time provides increased accuracy in the resulting data. The model is managed by a user interface which can be refined over time as the facility evolves. Data comprising sets of attributes over time may persist within the system for later retrieval.

Abstract: An integral electronic revenue meter system diagnostics package including a microprocessor, storage memory, preselect series of system diagnostic tests, and recording any results which exceed predefined programmable thresholds, and display means for displaying error and/or diagnostic messages identifying selected diagnostic data and/or errors discovered in the meter tests during a predefined period is included as part of an electricity revenue meter of the type used for collecting metering data for a utility which uses such data for billing purposes. The system automatically senses the type of electrical service in which the revenue meter is installed when the revenue meter is installed in a socket at the customer's premises.

Abstract: Users desire to normalize raw data from meter load profile acquisition systems against some attributes (i.e., properties) of a facility, such as the number of employees. The facility area, and the number of products produced would be additional potential attributes for consideration. Normalization involves dividing a load profile channel such as kilowatt hours by a determined facility attribute to obtain a new data set, for example, such as “kWh/Employee.” The present modelization allows a user to define a set of attributes and manage their value over time to refine the facility model. Keeping track of the attributes over time provides increased accuracy in the resulting data. The model is managed by a user interface which can be refined over time as the facility evolves. Data comprising sets of attributes over time may persist within the system for later retrieval.