Abstract: The invention relates to a screen comprising transparent portions and retroreflective portions distributed over all or part of the surface thereof.

Abstract: An image projection device, including: at least one waveguide formed in a substrate; and at least one extraction device including a plurality of extraction cells coupled to different areas of the guide, each cell being capable of being electrically activated to extract light from the guide and project this light along a predetermined projection direction, wherein different extraction cells have projection directions with different orientations.

Abstract: The invention relates to a synthetic hologram (64A) comprising first elementary cells wherein first openings are respectively defined, said hologram being integrated into a first portion of a binary motif (60), said binary motif comprising at least one second portion wherein second elementary cells comprising second openings (66) are defined, said second openings having an average size equal to the average size of the first openings, with a 5% margin, and a random phase shift.

Abstract: The invention relates to a method for recording a source image, in which a reproduction of the source image is made in the form of a matrix of elementary patterns. The method comprises the following steps: deposition (401) of a first opaque layer (42) on a first substrate (41); etching (402) of the first opaque layer (42) so as to form a matrix of first cells (440) each having one from amongst several first predetermined patterns; deposition of at least one second opaque layer (45); and etching of the second opaque layer (45), so as to form a matrix of second cells (470) each having one from amongst several second pre-determined patterns, the elementary patterns being defined by the superimposition of a second pattern and a first pattern. The invention also relates to an image medium obtained by means of such a method.

Abstract: A light-emitting device comprising at least: a metal layer able to be heated and to propagate surface waves consecutive to the heating of the metal layer, with the metal layer being structured such that it comprises several diffraction patterns able to carry out a diffraction of the surface waves to free-space propagation modes, and wherein a synthetic hologram is encoded such that a phase image of each pixel of the hologram is encoded by an offset in the position of one of the diffraction patterns; a heater of the metal layer.

Abstract: A synthetic hologram of a first image consists of an array of coding cells each comprising light and dark portions. A second visible image is superposed to the synthetic hologram, where the light and dark portions of selected coding cells in the second visible image are inverted and have a phase modified by an offset value relative to other coding cells of the rest of the hologram.

Abstract: An installation and method for etching at least one wafer coated with an etch-ready, blank photosensitive layer is disclosed. In accordance with an embodiment, the wafer has thickness irregularities, wherein the wafer is arranged to be able to be submitted to irradiation-beam scanning, a sheet transparent to the radiation to which the photosensitive layer is sensitive covers the wafer, and a probe beam intended to reflect on the upper portion of the sheet perpendicularly to the irradiation beam spot on the photosensitive layer is provided.

Abstract: The present invention involves a device for reading the source image of a synthetic hologram constituting the Fourier transform of the source image formed on a support (40), comprising a lens (42) positioned for forming the Fourier transform of the hologram on an image detection system (44), the relative positions of said lens and of said support being selected so that a desired number of replicas of the image are displayed on a plane of the detection system, said device further comprising a processing system (48) capable of performing a combination of replicas of the image.

Abstract: The invention relates to a synthetic hologram (64A) comprising first elementary cells wherein first openings are respectively defined, said hologram being integrated into a first portion of a binary motif (60), said binary motif comprising at least one second portion wherein second elementary cells comprising second openings (66) are defined, said second openings having an average size equal to the average size of the first openings, with a 5% margin, and a random phase shift.

Abstract: The invention relates to an encrypted synthetic hologram formed from the Fourier transformation of an image (40) and consisting of a matrix of elementary cells. Half of the elementary cells, with a 10% margin, selected according to a motif (52), are dephased in relation to the elementary cells of a hologram directly produced by the Fourier transformation of the image.

Abstract: The invention relates to a method of storing images on a medium able to be etched on the basis of a writing procedure using a laser beam, in which a substrate, preferably flexible, comprises a multiplicity of expanses of lateral dimensions less than 10 millimeters, each reserved for an image, and an expanse reserved for an image comprises as many elementary zones as there are image pixels to be stored, the image stored in an expanse being able to be read by optical magnification means. Each elementary zone comprises an engraved pattern whose diameter represents one respective grey level out of n possible levels.

Abstract: The invention relates to a synthetic hologram consisting of an array of encoding cells, including a pattern in which the cells are inverted and have a phase modified by an offset value relative to the rest of the hologram.

Abstract: A pit is formed from a stack comprising at least one first layer formed by a material able to change physical state and a second layer made of the same material as that forming the first layer, but in a different physical state. An area of the first layer is treated to make said area go from its initial physical state to the physical state corresponding to that of the second layer. A selective etching step is then performed to eliminate said area of the first layer and the area of the second layer initially covered by the treated area of the first layer. Advantageously, said material is a phase transition material.

Abstract: The invention relates to a method of marking a batch of products, consisting in forming a synthetic hologram of an image (20) on each product, said hologram being furthermore encoded using a phase key, the image comprising a first portion (22) common to the various products of the batch and a second portion (24) that differs from one product to another.

Abstract: A method for producing an optical fiber element provided with several optical fibers disposed in a matrix, including: a) placing and maintaining the several optical fibers in grooves formed in a mould plate, said grooves being in different planes, b) injecting a hardenable material adhering to the several optical fibers, c) solidifying the hardenable material to maintain the several optical fibers in a position set by the grooves, and d) removing at least the mould plate.

Abstract: A method for producing an optical fiber element provided with several optical fibers disposed in a matrix, including: a) placing and maintaining the several optical fibers in grooves formed in a mould plate, said grooves being in different planes, b) injecting a hardenable material adhering to the several optical fibers, c) solidifying the hardenable material to maintain the several optical fibers in a position set by the grooves, and d) removing at least the mould plate to p.

Abstract: A method for producing an optical fiber element provided with several optical fibers disposed in a matrix, including: a) placing and maintaining the several optical fibers in grooves formed in a mould plate, said grooves being in different planes, b) injecting a hardenable material adhering to the several optical fibers, c) solidifying the hardenable material to maintain the several optical fibers in a position set by the grooves, and d) removing at least the mould plate.

Abstract: The invention relates to photolithography techniques and more particularly to maskless photolithography techniques in which a feature is written directly onto a substrate by means of a high-energy beam, typically a laser beam. According to the invention, the position of the beam is displaced by undergoing a continuous movement relative to the surface of the support, and the beam is switched on or off according to the feature to be written into the support. The feature is such that the smallest width of the zones to be illuminated is larger than the smallest width of the zones that have not to be illuminated. The active diameter of the illumination beam is greater than the latter. This diameter is defined according to the depth of photoresist to be irradiated and results from a compromise between the need for depthwise irradiation and the size of the features to be written.

Abstract: This assembly of an object and a support is achieved by using solder bumps. At least two wettability areas are made respectively on an object and on a support. Each solder bump ensures electrical contact and mechanical fixing firstly to one of the wettability areas of object and secondly to one of the wettability areas of support. The melting temperature of solder bumps is lower than the melting temperature of each of the wettability areas. Each wettability area of the object forms an angle of 70° to 110° with respect to each wettability area of the support and the object and the support are mutually distant from one another.

Abstract: This is a device for recording graphical data (34) on a medium (10), comprising a laser (9) producing a laser beam (14) to which the medium is sensitive, the laser beam projecting a spot (25) onto the medium (10), the laser (9) being driven in a relative sweeping movement with respect to the medium (10) during recording. It comprises means (32) of converting the grey level of each pixel into a pattern size (20) to be recorded on the medium (10), means (9a) for shaping the laser beam (14) so that the spot (25) projected onto the medium (10) is oblong and means of adjusting the size of the pattern (9b) acting on the switching on and off of the laser (9) and/or the power of the laser beam (14).