Abstract: A process for electrochemically etching a layer with electric conduction properties, of the doped metal oxide type, on a transparent substrate of the glass type, fitted with a mask capable of being removed after etching. The process brings at least one region to be etched of the layer into contact with an electrically conducting solution, immerses an electrode in the solution and places the electrode facing and at a distance from the region, and applies an electrical voltage between the electrode and the layer to be etched. The electrode has an oblong shape such that the etching is carried out on several regions of the layer over a width of the substrate.

Abstract: Device for chemically etching a layer (2) having electrical conduction properties on a transparent substrate (1), which device comprises support means (4) for supporting the substrate (1) and spray means (5) for spraying a solution, characterized in that the spray means (5) consists of a multiplicity of nozzles (50) that are placed above the substrate and are intended to simultaneously spray onto the layer to be etched at least two solutions (7, 8) either independently of each other or as a mixture mixed at the nozzles.

Abstract: A process for electrochemically etching a layer (11) with electric conduction properties, of the doped metal oxide type, on a transparent substrate (10) of the glass type, fitted with a mask capable of being removed after etching, and the process consisting in: