Patents by Inventor Christophe N. Collins

Christophe N. Collins has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of trench sidewall enhancement
    Patent number: 6706586
    Abstract: A method of fabricating a high aspect ratio deep trench having smooth sidewalls in a semiconductor substrate comprising a first etching step of contacting the substrate in which the deep trench is to be etched with either NF3 gas or SF6 gas in the absence of the other, followed by a second etching step with the etching gas of either NF3 or SF6 which ever one was not used in the first etching step, and alternating the first and second etching steps until the desired high aspect ratio trench depth is reached.
    Type: Grant
    Filed: October 23, 2002
    Date of Patent: March 16, 2004
    Assignee: International Business Machines Corporation
    Inventors: Christophe N. Collins, Rajarao Jammy, Brian W. Messenger, Siddhartha Panda