Patents by Inventor Christophe Wouters
Christophe Wouters has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11892493Abstract: An apparatus, a method and a computer program product for defect detection in work pieces is disclosed. At least one light source is provided and the light source generates an illumination light of a wavelength range at which the work piece is transparent. A camera images the light from at least one face of the work piece on a detector of the camera by means of a lens. A stage is used for moving the work piece and for imaging the at least one face of the semiconductor device completely with the camera. The computer program product is disposed on a non-transitory, computer readable medium for defect detection in work pieces. A computer is used to execute the various process steps and to control the various means of the apparatus.Type: GrantFiled: October 7, 2020Date of Patent: February 6, 2024Assignee: KLA CorporationInventors: Tom Marivoet, Carl Truyens, Christophe Wouters
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Publication number: 20230393185Abstract: An apparatus, a method and a computer program product for defect detection in work pieces is disclosed. At least one light source is provided and the light source generates an illumination light of a wavelength range at which the work piece is transparent. A camera images the light from at least one face of the work piece on a detector of the camera by means of a lens. A stage is used for moving the work piece and for imaging the at least one face of the semiconductor device completely with the camera. The computer program product is disposed on a non-transitory, computer readable medium for defect detection in work pieces. A computer is used to execute the various process steps and to control the various means of the apparatus.Type: ApplicationFiled: August 14, 2023Publication date: December 7, 2023Inventors: Tom Marivoet, Carl Truyens, Christophe Wouters
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Patent number: 11726126Abstract: An apparatus, a method and a computer program product for defect detection in work pieces is disclosed. At least one light source is provided and the light source generates an illumination light of a wavelength range at which the work piece is transparent. A camera images the light from at least one face of the work piece on a detector of the camera by means of a lens. A stage is used for moving the work piece and for imaging the at least one face of the semiconductor device completely with the camera. The computer program product is disposed on a non-transitory, computer readable medium for defect detection in work pieces. A computer is used to execute the various process steps and to control the various means of the apparatus.Type: GrantFiled: December 10, 2021Date of Patent: August 15, 2023Assignee: KLA CorporationInventors: Tom Marivoet, Carl Truyens, Christophe Wouters
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Patent number: 11340284Abstract: A first light source is directed at an outer surface of a workpiece in an inspection module. The light from the first light source that is reflected from the outer surface of the workpiece is directed to the camera via a first pathway. The light from the first light source transmitted through the workpiece is directed to the camera via a second pathway. A second light source is directed at the outer surface of the workpiece 180° from that of the first light source. The light from the second light source that is reflected from the outer surface of the workpiece is directed to the camera via the second pathway. The light from the second light source transmitted through the workpiece is directed to the camera via the first pathway.Type: GrantFiled: July 12, 2020Date of Patent: May 24, 2022Assignee: KLA CorporationInventors: Kristiaan Van Rossen, Christophe Wouters
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Publication number: 20220099725Abstract: An apparatus, a method and a computer program product for defect detection in work pieces is disclosed. At least one light source is provided and the light source generates an illumination light of a wavelength range at which the work piece is transparent. A camera images the light from at least one face of the work piece on a detector of the camera by means of a lens. A stage is used for moving the work piece and for imaging the at least one face of the semiconductor device completely with the camera. The computer program product is disposed on a non-transitory, computer readable medium for defect detection in work pieces. A computer is used to execute the various process steps and to control the various means of the apparatus.Type: ApplicationFiled: December 10, 2021Publication date: March 31, 2022Inventors: Tom Marivoet, Carl Truyens, Christophe Wouters
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Patent number: 11105839Abstract: An apparatus, a method and a computer program product for defect detection in work pieces is disclosed. At least one light source is provided and the light source generates an illumination light of a wavelength range at which the work piece is transparent. A camera images the light from at least one face of the work piece on a detector of the camera by means of a lens. A stage is used for moving the work piece and for imaging the at least one face of the semiconductor device completely with the camera. The computer program product is disposed on a non-transitory, computer readable medium for defect detection in work pieces. A computer is used to execute the various process steps and to control the various means of the apparatus.Type: GrantFiled: November 2, 2020Date of Patent: August 31, 2021Assignee: KLA CorporationInventors: Tom Marivoet, Carl Truyens, Christophe Wouters
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Patent number: 10935503Abstract: An apparatus, a method and a computer program product for defect detection in work pieces is disclosed. At least one light source is provided and the light source generates an illumination light of a wavelength range at which the work piece is transparent. A camera images the light from at least one face of the work piece on a detector of the camera by means of a lens. A stage is used for moving the work piece and for imaging the at least one face of the semiconductor device completely with the camera. The computer program product is disposed on a non-transitory, computer readable medium for defect detection in work pieces. A computer is used to execute the various process steps and to control the various means of the apparatus.Type: GrantFiled: June 17, 2019Date of Patent: March 2, 2021Assignee: KLA CorporationInventors: Tom Marivoet, Carl Truyens, Christophe Wouters
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Publication number: 20210048396Abstract: An apparatus, a method and a computer program product for defect detection in work pieces is disclosed. At least one light source is provided and the light source generates an illumination light of a wavelength range at which the work piece is transparent. A camera images the light from at least one face of the work piece on a detector of the camera by means of a lens. A stage is used for moving the work piece and for imaging the at least one face of the semiconductor device completely with the camera. The computer program product is disposed on a non-transitory, computer readable medium for defect detection in work pieces. A computer is used to execute the various process steps and to control the various means of the apparatus.Type: ApplicationFiled: November 2, 2020Publication date: February 18, 2021Inventors: Tom Marivoet, Carl Truyens, Christophe Wouters
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Publication number: 20210025934Abstract: A first light source is directed at an outer surface of a workpiece in an inspection module. The light from the first light source that is reflected from the outer surface of the workpiece is directed to the camera via a first pathway. The light from the first light source transmitted through the workpiece is directed to the camera via a second pathway. A second light source is directed at the outer surface of the workpiece 180° from that of the first light source. The light from the second light source that is reflected from the outer surface of the workpiece is directed to the camera via the second pathway. The light from the second light source transmitted through the workpiece is directed to the camera via the first pathway.Type: ApplicationFiled: July 12, 2020Publication date: January 28, 2021Inventors: Kristiaan Van Rossen, Christophe Wouters
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Publication number: 20210018450Abstract: An apparatus, a method and a computer program product for defect detection in work pieces is disclosed. At least one light source is provided and the light source generates an illumination light of a wavelength range at which the work piece is transparent. A camera images the light from at least one face of the work piece on a detector of the camera by means of a lens. A stage is used for moving the work piece and for imaging the at least one face of the semiconductor device completely with the camera. The computer program product is disposed on a non-transitory, computer readable medium for defect detection in work pieces. A computer is used to execute the various process steps and to control the various means of the apparatus.Type: ApplicationFiled: October 7, 2020Publication date: January 21, 2021Inventors: Tom Marivoet, Carl Truyens, Christophe Wouters
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Patent number: 10866092Abstract: 3D measurements of features on a workpiece, such as ball height, co-planarity, component thickness, or warpage, are determined. The system includes a broadband light source, a microlens array, a tunable color filter, a lens system, and a detector. The microlens array can focus a light beam to points in a focal plane of the microlens array. The tunable color filter can narrow the light beam to a band at a central wavelength. The lens system can provide longitudinal chromatic aberration whereby different wavelengths are imaged at different distances from the lens system.Type: GrantFiled: July 16, 2019Date of Patent: December 15, 2020Assignee: KLA-Tencor CorporationInventors: Christophe Wouters, Kristof Joris, Johan De Greeve
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Publication number: 20200033121Abstract: 3D measurements of features on a workpiece, such as ball height, co-planarity, component thickness, or warpage, are determined. The system includes a broadband light source, a microlens array, a tunable color filter, a lens system, and a detector. The microlens array can focus a light beam to a points in a focal plane of the microlens array. The tunable color filter can narrow the light beam to a band at a central wavelength. The lens system can provide longitudinal chromatic aberration whereby different wavelengths are imaged at different distances from the lens system.Type: ApplicationFiled: July 16, 2019Publication date: January 30, 2020Inventors: Christophe Wouters, Kristof Joris, Johan De Greeve
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Publication number: 20190302033Abstract: An apparatus, a method and a computer program product for defect detection in work pieces is disclosed. At least one light source is provided and the light source generates an illumination light of a wavelength range at which the work piece is transparent. A camera images the light from at least one face of the work piece on a detector of the camera by means of a lens. A stage is used for moving the work piece and for imaging the at least one face of the semiconductor device completely with the camera. The computer program product is disposed on a non-transitory, computer readable medium for defect detection in work pieces. A computer is used to execute the various process steps and to control the various means of the apparatus.Type: ApplicationFiled: June 17, 2019Publication date: October 3, 2019Inventors: Tom Marivoet, Carl Truyens, Christophe Wouters
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Patent number: 10324044Abstract: An apparatus, a method and a computer program product for defect detection in work pieces is disclosed. At least one light source is provided and the light source generates an illumination light of a wavelength range at which the work piece is transparent. A camera images the light from at least one face of the work piece on a detector of the camera by means of a lens. A stage is used for moving the work piece and for imaging the at least one face of the semiconductor device completely with the camera. The computer program product is disposed on a non-transitory, computer readable medium for defect detection in work pieces. A computer is used to execute the various process steps and to control the various means of the apparatus.Type: GrantFiled: July 1, 2016Date of Patent: June 18, 2019Assignee: KLA-Tencor CorporationInventors: Tom Marivoet, Carl Truyens, Christophe Wouters
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Patent number: 9778192Abstract: An object carrier, a system and a method is disclosed for the back light inspection of transparent or semitransparent objects. The carrier has a carrier base layer with photo luminescent properties which carries the transparent or semitransparent object on top of the layer. The transparent or semitransparent object could be a wafer and the object carrier could be a wafer chuck. At least one light source being arranged above the object carrier such that excitation light emitted from the at least one light source is directed through the transparent or semitransparent object to the layer with photo luminescent properties. The light returned from the layer with photo luminescent properties is collected by an objective and registered by a sensor.Type: GrantFiled: February 26, 2015Date of Patent: October 3, 2017Assignee: KLA-Tencor CorporationInventors: Christophe Wouters, Steven Boeykens, Carl Smets
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Publication number: 20160313257Abstract: An apparatus, a method and a computer program product for defect detection in work pieces is disclosed. At least one light source is provided and the light source generates an illumination light of a wavelength range at which the work piece is transparent. A camera images the light from at least one face of the work piece on a detector of the camera by means of a lens. A stage is used for moving the work piece and for imaging the at least one face of the semiconductor device completely with the camera. The computer program product is disposed on a non-transitory, computer readable medium for defect detection in work pieces. A computer is used to execute the various process steps and to control the various means of the apparatus.Type: ApplicationFiled: July 1, 2016Publication date: October 27, 2016Inventors: Tom Marivoet, Carl Truyens, Christophe Wouters
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Patent number: 9140546Abstract: An apparatus (1) and a method for the three dimensional inspection of saw marks (2) on at least one surface (3) of a wafer (4) are disclosed. At least one camera (6) is required to capture an image of the entire surface (3) of the wafer (4). At least one line projector (8) provides a light bundle (5), centered about a central beam axis (9). The line projector (8) is arranged such that the central beam axis (9) is at an acute angle (?) with regard to the plane (P) of the wafer (4). A line shifter (12) is positioned in the light bundle (5) between each line projector (8) and the surface (3) of the wafer (4). A frame grabber (14) and an image processor (16) are used to synchronize and coordinate the image capture and the position of the pattern (20) of lines (22) on the front side (3F) and/or the back side (3B) of the wafer (4).Type: GrantFiled: April 12, 2011Date of Patent: September 22, 2015Assignee: KLA-Tencor CorporationInventors: Benoit Maison, Andy Hill, Laurent Hermans, Frans Nijs, Karel Van Gils, Christophe Wouters
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Patent number: 9103665Abstract: An apparatus (1) and a method for the three dimensional inspection of saw marks (2) on at least one surface (3) of a wafer (4) are disclosed. At least one camera (6) is required to capture an image of the entire surface (3) of the wafer (4). At least one line projector (8) provides a light bundle (5), centered about a central beam axis (9). The line projector (8) is arranged such that the central beam axis (9) is at an acute angle (?) with regard to the plane (P) of the wafer (4). A line shifter (12) is positioned in the light bundle (5) between each line projector (8) and the surface (3) of the wafer (4). A frame grabber (14) and an image processor (16) are used to synchronize and coordinate the image capture and the position of the pattern (20) of lines (22) on the front side (3F) and/or the back side (3B) of the wafer (4).Type: GrantFiled: April 12, 2011Date of Patent: August 11, 2015Assignee: KLA-Tencor CorporationInventors: Benoit Maison, Andy Hill, Laurent Hermans, Frans Nijs, Karel Van Gils, Christophe Wouters
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Publication number: 20150168304Abstract: An object carrier, a system and a method is disclosed for the back light inspection of transparent or semitransparent objects. The carrier has a carrier base layer with photo luminescent properties which carries the transparent or semitransparent object on top of the layer. The transparent or semitransparent object could be a wafer and the object carrier could be a wafer chuck. At least one light source being arranged above the object carrier such that excitation light emitted from the at least one light source is directed through the transparent or semitransparent object to the layer with photo luminescent properties. The light returned from the layer with photo luminescent properties is collected by an objective and registered by a sensor.Type: ApplicationFiled: February 26, 2015Publication date: June 18, 2015Inventors: Christophe Wouters, Steven Boeykens, Carl Smets
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Publication number: 20140185136Abstract: A dome illumination for a microscope and a microscope are disclosed. At least one objective lens carries a dome at a free end, wherein the free end of the objective lens is facing a surface of the object. At least one light source is arranged such that an illumination is provided to the dome when the objective lens is positioned in an optical axis or working position of the microscope.Type: ApplicationFiled: March 6, 2014Publication date: July 3, 2014Applicant: KLA-Tencor CorporationInventors: Christophe WOUTERS, Steven M.W. BOEYKENS, Paul M.J. VERSTREKEN