Patents by Inventor CHRISTOPHER A. LAURENT
CHRISTOPHER A. LAURENT has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11920234Abstract: Described herein is a protective coating composition that provides erosion and corrosion resistance to a coated article (such as a chamber component) upon the article's exposure to harsh chemical environment (such as hydrogen based and/or halogen based environment) and/or upon the article's exposure to high energy plasma. Also described herein is a method of coating an article with the protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits, on average, less than about 5 yttrium based particle defects per wafer.Type: GrantFiled: December 28, 2022Date of Patent: March 5, 2024Assignee: Applied Materials, Inc.Inventors: Vahid Firouzdor, Christopher Laurent Beaudry, Hyun-Ho Doh, Joseph Frederick Behnke, Joseph Frederick Sommers
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Publication number: 20230348290Abstract: Described herein is a plasma resistant protective coating composition and bulk composition that provides enhanced erosion and corrosion resistance upon the coating composition's or the bulk composition's exposure to harsh chemical environment (such as hydrogen based and/or halogen based chemistries) and/or upon the coating composition's or the bulk composition's exposure to high energy plasma. Also described herein is a method of coating an article with a plasma resistant protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits a reduced number of yttrium based particles.Type: ApplicationFiled: June 30, 2023Publication date: November 2, 2023Inventors: Christopher Laurent Beaudry, Vahid Firouzdor, Joseph Frederick Sommers, Trevor Edward Wilantewicz, Hyun-Ho Doh, Joseph Frederick Behnke
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Publication number: 20230323531Abstract: A method includes affixing a supply apparatus to inlets for one or more channels of a chamber component. The channels provide one or more gas flow paths between a first side of the chamber component that comprises the inlets and a second side of the chamber component comprising outlets of the one or more channels. The method further includes affixing an exhaust apparatus to the outlets of the one or more channels. The method further includes performing a plurality of atomic layer deposition cycles to deposit a corrosion resistant coating on interior surfaces of the one or more channels of the chamber component.Type: ApplicationFiled: December 27, 2022Publication date: October 12, 2023Inventors: Joseph Frederick Behnke, Carlaton Wong, Albert Barrett Hicks, III, Steven Darrell Marcus, Joseph Frederick Sommers, Christopher Laurent Beaudry, Timothy Joseph Franklin
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Patent number: 11661650Abstract: Described herein is a protective coating composition that provides erosion and corrosion resistance to a coated article (such as a chamber component) upon the article's exposure to harsh chemical environment (such as hydrogen based and/or halogen based environment) and/or upon the article's exposure to high energy plasma. Also described herein is a method of coating an article with the protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits, on average, less than about 5 yttrium based particle defects per wafer.Type: GrantFiled: April 10, 2020Date of Patent: May 30, 2023Assignee: Applied Materials, Inc.Inventors: Vahid Firouzdor, Christopher Laurent Beaudry, Hyun-Ho Doh, Joseph Frederick Behnke, Joseph Frederick Sommers
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Publication number: 20230160055Abstract: Described herein is a protective coating composition that provides erosion and corrosion resistance to a coated article (such as a chamber component) upon the article's exposure to harsh chemical environment (such as hydrogen based and/or halogen based environment) and/or upon the article's exposure to high energy plasma. Also described herein is a method of coating an article with the protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits, on average, less than about 5 yttrium based particle defects per wafer.Type: ApplicationFiled: December 28, 2022Publication date: May 25, 2023Inventors: Vahid Firouzdor, Christopher Laurent Beaudry, Hyun-Ho Doh, Joseph Frederick Behnke, Joseph Frederick Sommers
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Publication number: 20220199455Abstract: Embodiments of packaged chamber components and methods of packaging chamber components are provided herein. In some embodiments, a packaged chamber component for use in a process chamber includes: an insert having an annular trench disposed about a raised inner portion, wherein the annular trench is disposed between the raised inner portion and an outer lip, wherein a ledge couples the raised inner portion to the outer lip, wherein the ledge includes a first portion and a second portion disposed radially outward of the first portion, and wherein the second portion includes a resting surface that extends upward and radially outward of an upper surface of the first portion; and a chamber component disposed in the annular trench of the insert and supported by the resting surface such that one or more critical surfaces of the chamber component are spaced apart from the insert.Type: ApplicationFiled: December 22, 2020Publication date: June 23, 2022Inventors: Joseph Frederick BEHNKE, Trevor WILANTEWICZ, Christopher Laurent BEAUDRY, Timothy Douglas TOTH, Scott OSTERMAN
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Publication number: 20220181124Abstract: Embodiments of the disclosure relate to articles, coated chamber components, methods of coating chamber components and systems with a metal fluoride coating that includes at least one metal fluoride having a formula of M1xFw, M1xM2yFw or M1xM2yM3zFw, where at least one of M1, M2, or M3 is nickel. The metal fluoride coating can be formed directly on a substrate or on a coating of a substrate.Type: ApplicationFiled: December 3, 2020Publication date: June 9, 2022Inventors: Ren-Guan Duan, Christopher Laurent Beaudry, Glen T. Mori
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Publication number: 20210403337Abstract: Described herein is a plasma resistant protective coating composition and bulk composition that provides enhanced erosion and corrosion resistance upon the coating composition's or the bulk composition's exposure to harsh chemical environment (such as hydrogen based and/or halogen based chemistries) and/or upon the coating composition's or the bulk composition's exposure to high energy plasma. Also described herein is a method of coating an article with a plasma resistant protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits a reduced number of yttrium based particles.Type: ApplicationFiled: June 25, 2021Publication date: December 30, 2021Inventors: Christopher Laurent Beaudry, Vahid Firouzdor, Joseph Frederick Sommers, Trevor Edward Wilantewicz, Hyun-Ho Doh, Joseph Frederick Behnke
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Publication number: 20210317564Abstract: Described herein is a protective coating composition that provides erosion and corrosion resistance to a coated article (such as a chamber component) upon the article's exposure to harsh chemical environment (such as hydrogen based and/or halogen based environment) and/or upon the article's exposure to high energy plasma. Also described herein is a method of coating an article with the protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits, on average, less than about 5 yttrium based particle defects per wafer.Type: ApplicationFiled: April 10, 2020Publication date: October 14, 2021Inventors: Vahid Firouzdor, Christopher Laurent Beaudry, Hyun-Ho Doh, Joseph Frederick Behnke, Joseph Frederick Sommers
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Publication number: 20190084357Abstract: Tire for a two-wheeled motorized vehicle of the motorcycle type, comprising a tread (2), of width L, joined by two sidewalls (3) to two beads (4), said tread comprising first and second elastomer compositions, crown reinforcement (5), radially inside tread (2) comprising a crown layer comprising mutually parallel circumferential reinforcers coated with an elastomer composition and forming a substantially zero angle and at most equal to 5° to the circumferential direction, a carcass reinforcement (6), radially inside crown reinforcement (5), comprising turnup (61) and having thickness M. Carcass reinforcement (61) comprises mutually parallel reinforcers coated with an elastomer composition, and wrapped, in each bead (4), from the inside to the outside of the tire, about bead wire (7) in order to form turnup (8) comprising free end E2.Type: ApplicationFiled: March 31, 2017Publication date: March 21, 2019Applicant: COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELINInventors: Charles GUICHERD, Mickaël PRECIGOUT, Romain BOUCHET, Christopher LAURENT
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Patent number: 8888639Abstract: A powertrain system includes an internal combustion engine, a first electric machine and an electro-mechanical transmission operative to transmit torque to a driveline. A method for controlling the powertrain system in the presence of a controlled neutral operation of the electro-mechanical transmission being selected includes monitoring vehicle speed, and only when the monitored vehicle speed is indicative of a low-speed zone restricting a transition from a current engine operating state.Type: GrantFiled: November 16, 2012Date of Patent: November 18, 2014Assignee: GM Global Technology Operations LLCInventors: Syed Naqi, Lawrence A. Kaminsky, Jy-Jen F. Sah, Shaun C. Bowman, Christopher A. Laurent, George Robison, Silva Hiti, Jonathan M. Bolenbaugh, Ali K. Naqvi, Sasa Lucic
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Publication number: 20140141915Abstract: A powertrain system includes an internal combustion engine, a first electric machine and an electro-mechanical transmission operative to transmit torque to a driveline. A method for controlling the powertrain system in the presence of a controlled neutral operation of the electro-mechanical transmission being selected includes monitoring vehicle speed, and only when the monitored vehicle speed is indicative of a low-speed zone restricting a transition from a current engine operating state.Type: ApplicationFiled: November 16, 2012Publication date: May 22, 2014Applicant: GM Global Technology Operations LLCInventors: SYED NAQI, LAWRENCE A. KAMINSKY, JY-JEN F. SAH, SHAUN C. BOWMAN, CHRISTOPHER A. LAURENT, GEORGE ROBISON, SILVA HITI, JONATHAN M. BOLENBAUGH, ALI K. NAQVI
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Patent number: 7341065Abstract: Methods of preventing air-liquid interfaces on the surface of a wafer in order to prevent the formation of particle defects on a wafer are presented. The air-liquid interfaces may be prevented by covering the entire surface of the wafer with liquid at all times during a cleaning process while the surface of the wafer is hydrophobic. Methods of preventing the formation of silica agglomerates in a liquid during a pH transition from an alkaline pH to a neutral pH are also presented, including minimizing the turbulence in the liquid solution and reducing the temperature of the liquid solution during the transition.Type: GrantFiled: July 31, 2006Date of Patent: March 11, 2008Assignee: Applied Materials, Inc.Inventors: Steven Verhaverbeke, Christopher Laurent Beaudry
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Patent number: 7163018Abstract: Methods of preventing air-liquid interfaces on the surface of a wafer in order to prevent the formation of particle defects on a wafer are presented. The air-liquid interfaces may be prevented by covering the entire surface of the wafer with liquid at all times during a cleaning process while the surface of the wafer is hydrophobic. Methods of preventing the formation of silica agglomerates in a liquid during a pH transition from an alkaline pH to a neutral pH are also presented, including minimizing the turbulence in the liquid solution and reducing the temperature of the liquid solution during the transition.Type: GrantFiled: December 15, 2003Date of Patent: January 16, 2007Assignee: Applied Materials, Inc.Inventors: Steven Verhaverbeke, Christopher Laurent Beaudry
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Publication number: 20040127044Abstract: Methods of preventing air-liquid interfaces on the surface of a wafer in order to prevent the formation of particle defects on a wafer are presented. The air-liquid interfaces may be prevented by covering the entire surface of the wafer with liquid at all times during a cleaning process while the surface of the wafer is hydrophobic. Methods of preventing the formation of silica agglomerates in a liquid during a pH transition from an alkaline pH to a neutral pH are also presented, including minimizing the turbulence in the liquid solution and reducing the temperature of the liquid solution during the transition.Type: ApplicationFiled: December 15, 2003Publication date: July 1, 2004Applicant: Applied Materials, Inc.Inventors: Steven Verhaverbeke, Christopher Laurent Beaudry
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Patent number: D984895Type: GrantFiled: December 22, 2020Date of Patent: May 2, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Joseph Frederick Behnke, Trevor Wilantewicz, Christopher Laurent Beaudry, Timothy Douglas Toth, Scott Osterman