Patents by Inventor Christopher C. Chang

Christopher C. Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100102644
    Abstract: A linear brushless DC motor uses a movable coil assembly, which includes at least one coil, an amplifier and a motor controller, that is configured to move relative to a stationary base assembly. The coil, the amplifier and the motor controller are assembled so that the coil, the amplifier and the motor controller are collectively displaced when the movable coil assembly is moved relative to the stationary base assembly.
    Type: Application
    Filed: October 23, 2009
    Publication date: April 29, 2010
    Inventor: Christopher C. Chang
  • Publication number: 20100003826
    Abstract: A corrosion resistant component of a plasma chamber includes a liquid crystalline polymer. In a preferred embodiment, the liquid crystalline polymer (LCP) is provided on an aluminum component having an anodized or non-anodized surface. The liquid crystalline polymer can also be provided on an alumina component. The liquid crystalline polymer can be deposited by a method such as plasma spraying. The liquid crystalline polymer may also be provided as a preformed sheet or other shape adapted to cover the exposed surfaces of the reaction chamber. Additionally, the reactor components may be made entirely from liquid crystalline polymer by machining the component from a solid block of liquid crystalline polymer or molding the component from the polymer. The liquid crystalline polymer may contain reinforcing fillers such as glass or mineral fillers.
    Type: Application
    Filed: September 14, 2009
    Publication date: January 7, 2010
    Applicant: Lam Research Corporation
    Inventors: ROBERT J. O'DONNELL, Christopher C. Chang, John E. Daugherty
  • Patent number: 7628574
    Abstract: An apparatus and method for processing substrates uses one or more vacuum transfer chamber units to transfer some of the substrates between at least one load lock chamber unit and at least one vacuum process chamber unit.
    Type: Grant
    Filed: March 28, 2007
    Date of Patent: December 8, 2009
    Assignee: Arcus Technology, Inc.
    Inventors: Samuel S. Pak, Christopher C. Chang
  • Patent number: 7605086
    Abstract: A corrosion resistant component of a plasma chamber includes a liquid crystalline polymer. In a preferred embodiment, the liquid crystalline polymer (LCP) is provided on an aluminum component having an anodized or non-anodized surface. The liquid crystalline polymer can also be provided on an alumina component. The liquid crystalline polymer can be deposited by a method such as plasma spraying. The liquid crystalline polymer may also be provided as a preformed sheet or other shape adapted to cover the exposed surfaces of the reaction chamber. Additionally, the reactor components may be made entirely from liquid crystalline polymer by machining the component from a solid block of liquid crystalline polymer or molding the component from the polymer. The liquid crystalline polymer may contain reinforcing fillers such as glass or mineral fillers.
    Type: Grant
    Filed: September 22, 2006
    Date of Patent: October 20, 2009
    Assignee: Lam Research Corporation
    Inventors: Robert J. O'Donnell, Christopher C. Chang, John E. Daugherty
  • Patent number: 7566863
    Abstract: An optical encoder uses an encoder member with a digital diffractive track to optically manipulate an incident beam of light into manipulated beams of light, which are detected as spots of light that represent a digital absolute position value of the encoder member.
    Type: Grant
    Filed: January 4, 2008
    Date of Patent: July 28, 2009
    Inventors: Christopher C. Chang, Bernard C. Kress
  • Publication number: 20090166519
    Abstract: An optical encoder and method for measuring displacement information using an optical encoder uses an encoder member with multiple digital diffractive optic regions to optically diffract an incident beam of light to produce output beams of light having intensity distribution patterns, which are used to generate electrical signals that provide relative displacement information of the encoder member.
    Type: Application
    Filed: January 2, 2009
    Publication date: July 2, 2009
    Inventors: Christopher C. Chang, Bernard C. Kress
  • Publication number: 20090085509
    Abstract: A stepper motor device uses compensating non-sinusoidal driving values to compensate for operational non-sinusoidal drive characteristics of a motor of the device due to at least design and manufacturing imperfections in the motor. The compensating non-sinusoidal driving values may be derived using back electromagnetic force produced from the motor or using measured rotational positions of the motor when the motor is driven using known driving values.
    Type: Application
    Filed: September 29, 2008
    Publication date: April 2, 2009
    Inventors: Christopher C. Chang, Edward Li, Thomas Judge
  • Patent number: 7417399
    Abstract: An integrated motor device with driver circuitry and method of setting and reading configuration parameters of the driver circuitry uses configuration data embedded in driver control signals to set at least one configuration parameter of the driver circuitry.
    Type: Grant
    Filed: September 21, 2006
    Date of Patent: August 26, 2008
    Assignee: Arcus Technology, Inc
    Inventor: Christopher C. Chang
  • Patent number: 7405532
    Abstract: A microstepper motor device and method of controlling the device uses a microcontroller that provides current sinusoidal values from at least one array of sinusoidal values to power circuitry of the device in response to control signals. The power circuitry is connected to a stepper motor of the device to supply power signals to the stepper motor using the current sinusoidal values. The microcontroller is configured to index the at least one array of sinusoidal values to the current sinusoidal values in response to the control signals as part of an interrupt service routine of the microcontroller. The microcontroller is further configured to transmit the current sinusoidal values to the power circuitry as part of a non-interrupt routine of the microcontroller.
    Type: Grant
    Filed: October 6, 2006
    Date of Patent: July 29, 2008
    Assignee: Arcus Technology, Inc.
    Inventor: Christopher C. Chang
  • Publication number: 20080084176
    Abstract: A microstepper motor device and method of controlling the device uses a microcontroller that provides current sinusoidal values from at least one array of sinusoidal values to power circuitry of the device in response to control signals. The power circuitry is connected to a stepper motor of the device to supply power signals to the stepper motor using the current sinusoidal values. The microcontroller is configured to index the at least one array of sinusoidal values to the current sinusoidal values in response to the control signals as part of an interrupt service routine of the microcontroller. The microcontroller is further configured to transmit the current sinusoidal values to the power circuitry as part of a non-interrupt routine of the microcontroller.
    Type: Application
    Filed: October 6, 2006
    Publication date: April 10, 2008
    Inventor: Christopher C. Chang
  • Publication number: 20080075438
    Abstract: An integrated motor device with driver circuitry and method of setting and reading configuration parameters of the driver circuitry uses configuration data embedded in driver control signals to set at least one configuration parameter of the driver circuitry.
    Type: Application
    Filed: September 21, 2006
    Publication date: March 27, 2008
    Inventor: Christopher C. Chang
  • Publication number: 20070231109
    Abstract: An apparatus and method for processing substrates uses one or more vacuum transfer chamber units to transfer some of the substrates between at least one load lock chamber unit and at least one vacuum process chamber unit.
    Type: Application
    Filed: March 28, 2007
    Publication date: October 4, 2007
    Inventors: Samuel S. Pak, Christopher C. Chang
  • Patent number: 7255898
    Abstract: A corrosion resistant component of semiconductor processing equipment such as a plasma chamber comprises zirconia toughened ceramic material as an outermost surface of the component. The component can be made entirely of the ceramic material or the ceramic material can be provided as a coating on a substrate such as aluminum or aluminum alloy, stainless steel, or refractory metal. The zirconia toughened ceramic can be tetragonal zirconia polycrystalline (TZP) material, partially-stabilized zirconia (PSZ), or a zirconia dispersion toughened ceramic (ZTC) such as zirconia-toughened alumina (tetragonal zirconia particles dispersed in Al2O3). In the case of a ceramic zirconia toughened coating, one or more intermediate layers may be provided between the component and the ceramic coating. To promote adhesion of the ceramic coating, the component surface or the intermediate layer surface may be subjected to a surface roughening treatment prior to depositing the ceramic coating.
    Type: Grant
    Filed: May 22, 2003
    Date of Patent: August 14, 2007
    Assignee: Lam Research Corporation
    Inventors: Robert J. O'Donnell, Christopher C. Chang, John E. Daugherty
  • Patent number: 7128804
    Abstract: A corrosion resistant component of a plasma chamber includes a liquid crystalline polymer. In a preferred embodiment, the liquid crystalline polymer (LCP) is provided on an aluminum component having an anodized or non-anodized surface. The liquid crystalline polymer can also be provided on an alumina component. The liquid crystalline polymer can be deposited by a method such as plasma spraying. The liquid crystalline polymer may also be provided as a preformed sheet or other shape adapted to cover the exposed surfaces of the reaction chamber. Additionally, the reactor components may be made entirely from liquid crystalline polymer by machining the component from a solid block of liquid crystalline polymer or molding the component from the polymer. The liquid crystalline polymer may contain reinforcing fillers such as glass or mineral fillers.
    Type: Grant
    Filed: December 29, 2000
    Date of Patent: October 31, 2006
    Assignee: Lam Research Corporation
    Inventors: Robert J. O'Donnell, Christopher C. Chang, John E. Daugherty
  • Publication number: 20040224128
    Abstract: Components for use in plasma processing chambers having plasma exposed surfaces with surface roughness characteristics that promote polymer adhesion. The roughened surfaces are formed by plasma spraying a coating material such as a ceramic or high temperature polymer onto the surface of the component. The plasma sprayed components of the present invention can be used for plasma reactor components having surfaces exposed to the plasma during processing. Suitable components include chamber walls, chamber liners, baffle rings, gas distribution plates, plasma confinement rings, and liner supports. By improving polymer adhesion, the plasma sprayed component surfaces can reduce the levels of particle contamination in the process chamber thereby improving yields and reducing down-time required for cleaning and/or replacing chamber components.
    Type: Application
    Filed: June 18, 2004
    Publication date: November 11, 2004
    Applicant: Lam Research Corporation
    Inventors: Christopher C. Chang, Robert J. Steger
  • Patent number: 6805952
    Abstract: Components for use in plasma processing chambers having plasma exposed surfaces with surface roughness characteristics that promote polymer adhesion. The roughened surfaces are formed by plasma spraying a coating material such as a ceramic or high temperature polymer onto the surface of the component. The plasma sprayed components of the present invention can be used for plasma reactor components having surfaces exposed to the plasma during processing. Suitable components include chamber walls, chamber liners, baffle rings, gas distribution plates, plasma confinement rings, and liner supports. By improving polymer adhesion, the plasma sprayed component surfaces can reduce the levels of particle contamination in the process chamber thereby improving yields and reducing down-time required for cleaning and/or replacing chamber components.
    Type: Grant
    Filed: December 29, 2000
    Date of Patent: October 19, 2004
    Assignee: Lam Research Corporation
    Inventors: Christopher C. Chang, Robert J. Steger
  • Patent number: 6790242
    Abstract: A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a fullerene containing surface and process for manufacturing thereof.
    Type: Grant
    Filed: December 29, 2000
    Date of Patent: September 14, 2004
    Assignee: LAM Research Corporation
    Inventors: Robert J. O'Donnell, Christopher C. Chang, John E. Daugherty
  • Patent number: 6773751
    Abstract: A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a boron nitride/yttria composite containing surface and process for manufacture thereof.
    Type: Grant
    Filed: March 21, 2003
    Date of Patent: August 10, 2004
    Assignee: Lam Research Corporation
    Inventors: Robert J. O'Donnell, John E. Daugherty, Christopher C. Chang
  • Publication number: 20040137147
    Abstract: A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a boron nitride/yttria composite containing surface and process for manufacture thereof.
    Type: Application
    Filed: March 21, 2003
    Publication date: July 15, 2004
    Inventors: Robert J. O'Donnell, John E. Daugherty, Christopher C. Chang
  • Publication number: 20040023047
    Abstract: A corrosion resistant component of semiconductor processing equipment such as a plasma chamber comprises zirconia toughened ceramic material as an outermost surface of the component. The component can be made entirely of the ceramic material or the ceramic material can be provided as a coating on a substrate such as aluminum or aluminum alloy, stainless steel, or refractory metal. The zirconia toughened ceramic can be tetragonal zirconia polycrystalline (TZP) material, partially-stabilized zirconia (PSZ), or a zirconia dispersion toughened ceramic (ZTC) such as zirconia-toughened alumina (tetragonal zirconia particles dispersed in Al2O3). In the case of a ceramic zirconia toughened coating, one or more intermediate layers may be provided between the component and the ceramic coating. To promote adhesion of the ceramic coating, the component surface or the intermediate layer surface may be subjected to a surface roughening treatment prior to depositing the ceramic coating.
    Type: Application
    Filed: May 22, 2003
    Publication date: February 5, 2004
    Inventors: Robert J. O'Donnell, Christopher C. Chang, John E. Daugherty