Abstract: An optical encoder and method for measuring displacement information uses an encoder member that includes multiple optical tracks of diffractive optical regions having different periodicities with respect to consecutive identical diffractive optical regions to produce diffracted beams of light from at least one beam of light emitted from a light source. The diffracted beams of light are received at photodetectors, which produce electrical signals in response to the received beams of light. The electrical signals are related to the displacement information being measured.

Abstract: A linear brushless DC motor uses a movable coil assembly, which includes at least one coil, an amplifier and a motor controller, that is configured to move relative to a stationary base assembly. The coil, the amplifier and the motor controller are assembled so that the coil, the amplifier and the motor controller are collectively displaced when the movable coil assembly is moved relative to the stationary base assembly.

Abstract: A corrosion resistant component of a plasma chamber includes a liquid crystalline polymer. In a preferred embodiment, the liquid crystalline polymer (LCP) is provided on an aluminum component having an anodized or non-anodized surface. The liquid crystalline polymer can also be provided on an alumina component. The liquid crystalline polymer can be deposited by a method such as plasma spraying. The liquid crystalline polymer may also be provided as a preformed sheet or other shape adapted to cover the exposed surfaces of the reaction chamber. Additionally, the reactor components may be made entirely from liquid crystalline polymer by machining the component from a solid block of liquid crystalline polymer or molding the component from the polymer. The liquid crystalline polymer may contain reinforcing fillers such as glass or mineral fillers.

Abstract: An apparatus and method for processing substrates uses one or more vacuum transfer chamber units to transfer some of the substrates between at least one load lock chamber unit and at least one vacuum process chamber unit.

Abstract: A corrosion resistant component of a plasma chamber includes a liquid crystalline polymer. In a preferred embodiment, the liquid crystalline polymer (LCP) is provided on an aluminum component having an anodized or non-anodized surface. The liquid crystalline polymer can also be provided on an alumina component. The liquid crystalline polymer can be deposited by a method such as plasma spraying. The liquid crystalline polymer may also be provided as a preformed sheet or other shape adapted to cover the exposed surfaces of the reaction chamber. Additionally, the reactor components may be made entirely from liquid crystalline polymer by machining the component from a solid block of liquid crystalline polymer or molding the component from the polymer. The liquid crystalline polymer may contain reinforcing fillers such as glass or mineral fillers.

Abstract: An optical encoder uses an encoder member with a digital diffractive track to optically manipulate an incident beam of light into manipulated beams of light, which are detected as spots of light that represent a digital absolute position value of the encoder member.

Abstract: An optical encoder and method for measuring displacement information using an optical encoder uses an encoder member with multiple digital diffractive optic regions to optically diffract an incident beam of light to produce output beams of light having intensity distribution patterns, which are used to generate electrical signals that provide relative displacement information of the encoder member.

Abstract: A stepper motor device uses compensating non-sinusoidal driving values to compensate for operational non-sinusoidal drive characteristics of a motor of the device due to at least design and manufacturing imperfections in the motor. The compensating non-sinusoidal driving values may be derived using back electromagnetic force produced from the motor or using measured rotational positions of the motor when the motor is driven using known driving values.

Abstract: An integrated motor device with driver circuitry and method of setting and reading configuration parameters of the driver circuitry uses configuration data embedded in driver control signals to set at least one configuration parameter of the driver circuitry.

Abstract: A microstepper motor device and method of controlling the device uses a microcontroller that provides current sinusoidal values from at least one array of sinusoidal values to power circuitry of the device in response to control signals. The power circuitry is connected to a stepper motor of the device to supply power signals to the stepper motor using the current sinusoidal values. The microcontroller is configured to index the at least one array of sinusoidal values to the current sinusoidal values in response to the control signals as part of an interrupt service routine of the microcontroller. The microcontroller is further configured to transmit the current sinusoidal values to the power circuitry as part of a non-interrupt routine of the microcontroller.

Abstract: A microstepper motor device and method of controlling the device uses a microcontroller that provides current sinusoidal values from at least one array of sinusoidal values to power circuitry of the device in response to control signals. The power circuitry is connected to a stepper motor of the device to supply power signals to the stepper motor using the current sinusoidal values. The microcontroller is configured to index the at least one array of sinusoidal values to the current sinusoidal values in response to the control signals as part of an interrupt service routine of the microcontroller. The microcontroller is further configured to transmit the current sinusoidal values to the power circuitry as part of a non-interrupt routine of the microcontroller.

Abstract: An integrated motor device with driver circuitry and method of setting and reading configuration parameters of the driver circuitry uses configuration data embedded in driver control signals to set at least one configuration parameter of the driver circuitry.

Abstract: An apparatus and method for processing substrates uses one or more vacuum transfer chamber units to transfer some of the substrates between at least one load lock chamber unit and at least one vacuum process chamber unit.

Abstract: A corrosion resistant component of semiconductor processing equipment such as a plasma chamber comprises zirconia toughened ceramic material as an outermost surface of the component. The component can be made entirely of the ceramic material or the ceramic material can be provided as a coating on a substrate such as aluminum or aluminum alloy, stainless steel, or refractory metal. The zirconia toughened ceramic can be tetragonal zirconia polycrystalline (TZP) material, partially-stabilized zirconia (PSZ), or a zirconia dispersion toughened ceramic (ZTC) such as zirconia-toughened alumina (tetragonal zirconia particles dispersed in Al2O3). In the case of a ceramic zirconia toughened coating, one or more intermediate layers may be provided between the component and the ceramic coating. To promote adhesion of the ceramic coating, the component surface or the intermediate layer surface may be subjected to a surface roughening treatment prior to depositing the ceramic coating.

Abstract: A corrosion resistant component of a plasma chamber includes a liquid crystalline polymer. In a preferred embodiment, the liquid crystalline polymer (LCP) is provided on an aluminum component having an anodized or non-anodized surface. The liquid crystalline polymer can also be provided on an alumina component. The liquid crystalline polymer can be deposited by a method such as plasma spraying. The liquid crystalline polymer may also be provided as a preformed sheet or other shape adapted to cover the exposed surfaces of the reaction chamber. Additionally, the reactor components may be made entirely from liquid crystalline polymer by machining the component from a solid block of liquid crystalline polymer or molding the component from the polymer. The liquid crystalline polymer may contain reinforcing fillers such as glass or mineral fillers.

Abstract: Components for use in plasma processing chambers having plasma exposed surfaces with surface roughness characteristics that promote polymer adhesion. The roughened surfaces are formed by plasma spraying a coating material such as a ceramic or high temperature polymer onto the surface of the component. The plasma sprayed components of the present invention can be used for plasma reactor components having surfaces exposed to the plasma during processing. Suitable components include chamber walls, chamber liners, baffle rings, gas distribution plates, plasma confinement rings, and liner supports. By improving polymer adhesion, the plasma sprayed component surfaces can reduce the levels of particle contamination in the process chamber thereby improving yields and reducing down-time required for cleaning and/or replacing chamber components.

Abstract: Components for use in plasma processing chambers having plasma exposed surfaces with surface roughness characteristics that promote polymer adhesion. The roughened surfaces are formed by plasma spraying a coating material such as a ceramic or high temperature polymer onto the surface of the component. The plasma sprayed components of the present invention can be used for plasma reactor components having surfaces exposed to the plasma during processing. Suitable components include chamber walls, chamber liners, baffle rings, gas distribution plates, plasma confinement rings, and liner supports. By improving polymer adhesion, the plasma sprayed component surfaces can reduce the levels of particle contamination in the process chamber thereby improving yields and reducing down-time required for cleaning and/or replacing chamber components.

Abstract: A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a fullerene containing surface and process for manufacturing thereof.

Abstract: A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a boron nitride/yttria composite containing surface and process for manufacture thereof.

Abstract: A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a boron nitride/yttria composite containing surface and process for manufacture thereof.